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Thin films of incompatible block copolymers self‐assemble into highly regular supramolecular structures with characteristic dimensions in the 10–100 nm regime. There is increasing interest in controlling the resulting structures and utilizing them, for instance in the area of nanotechnology. So far, research has concentrated mainly on exploiting the melt structure of diblock copolymers. Recent work on block copolymer solutions and more complex co‐ and terpolymer architectures has revealed a rich variety of novel thin‐film structures, some of which exhibit high complexity and order. In addition, by use of mean field dynamic density functional theory along with well‐controlled experiments, the fundamentals of thin film structure formation have been elucidated. We highlight some aspects of these studies and point to future directions in this lively field of materials science. 相似文献
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J.Y. Cheng C.A. Ross H.I. Smith E.L. Thomas 《Advanced materials (Deerfield Beach, Fla.)》2006,18(19):2505-2521
One of the key challenges in nanotechnology is to control a self‐assembling system to create a specific structure. Self‐organizing block copolymers offer a rich variety of periodic nanoscale patterns, and researchers have succeeded in finding conditions that lead to very long range order of the domains. However, the array of microdomains typically still contains some uncontrolled defects and lacks global registration and orientation. Recent efforts in templated self‐assembly of block copolymers have demonstrated a promising route to control bottom‐up self‐organization processes through top‐down lithographic templates. The orientation and placement of block‐copolymer domains can be directed by topographically or chemically patterned templates. This templated self‐assembly method provides a path towards the rational design of hierarchical device structures with periodic features that cover several length scales. 相似文献