Cathodoluminescence from dilute GaN<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>As<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript> solutions (<Emphasis Type="Italic">x</Emphasis> ≤ 0.03)

Cathodoluminescence from GaN _x As_1?x layers (0 ≤ x ≤ 0.03) was measured at photon energies ranging from the intrinsic absorption edge to 3 eV at room temperature. An additional emission band was visible in the visible range of the cathodoluminescence spectra. The intensity of this band is two orders of magnitude lower than the edge-emission intensity. The photon energy corresponding to the peak of this band and its FWHM are virtually independent of x and equal to ～2.1 and 0.6–0.7 eV, respectively. This emission is related to indirect optical transitions of electrons from the L _6c and Δ conduction-band minimums to the Γ₁₅ valence-band maximum.     

Low-temperature microwave magnetoresistance of lightly doped <Emphasis Type="Italic">p</Emphasis>-Ge and <Emphasis Type="Italic">p</Emphasis>-Ge<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Si<Subscript>x</Subscript>

The magnetoresistance of a lightly doped p-Ge_1?xSi_x alloy is studied in the range of compositions x = 1–2 at %. The results are compared with the available data for lightly doped p-Ge. The studies have been carried out using ESR measurements at a frequency of 10 GHz in the temperature range 10–120 K. It is established that micrononuniformity in the distribution of Si in the Ge lattice (Si clusters) suppresses the interference part of the anomalous magnetoresistance and, in addition, results in an averaging of the effects of light and heavy holes. This observation suggests a sharp decrease in the inelastic scattering time in the case of a Ge_1?xSi_x solid solution as compared to that of Ge.     

Quantum Oscillations of Photoconductivity Relaxation in <Emphasis Type="Italic">p</Emphasis>–<Emphasis Type="Italic">i</Emphasis>–<Emphasis Type="Italic">n</Emphasis> GaAs/InAs/AlAs Heterodiodes

The photoconductivity and its relaxation characteristics in tunneling p–i–n GaAs/AlAs heterostructures under pulsed illumination is studied. Quantum oscillations in the photoconductivity are detected depending on the bias voltage with the period independent of the light wavelength, as well as an oscillating component of the relaxation curves caused by modulation of the recombination rate at the edge of a triangular quantum well in the undoped i layer, as in the case of photoconductivity oscillations. The common nature of oscillations of the steady-state photoconductivity and relaxation curves under pulsed illumination is directly confirmed by the lack of an oscillating component in both types of dependences of some studied p–i–n heterostructures. Simultaneous suppression of the observed oscillations of dependences of both types as the temperature increases to 80 K also confirms the proposed mechanism of their formation. The dependences of these oscillations on the magnetic field and light flux power are studied. Oscillation-amplitude suppression in a magnetic field of ~2 T perpendicular to the current is caused by the effect of the Lorentz force on the ballistic motion of carriers in the triangular-quantum-well region.     

Chemical Vapor Deposition of <Emphasis Type="Italic">α</Emphasis>-Boron Layers on Silicon for Controlled Nanometer-Deep <Emphasis Type="Italic">p</Emphasis><Superscript>+</Superscript><Emphasis Type="Italic">n</Emphasis> Junction Formation

Nanometer-thick amorphous boron (α-B) layers were formed on (100) Si during exposure to diborane (B₂H₆) in a chemical vapor deposition (CVD) system, either at atmospheric or reduced pressures, at temperatures down to 500°C. The dependence of the growth mechanism on processing parameters was investigated by analytical techniques, such as transmission electron microscopy (TEM) and secondary ion mass spectrometry (SIMS), in conjunction with extensive electrical characterization. In particular, devices fabricated by B deposition effectively demonstrated that p ⁺ doping of the silicon substrate can be achieved within 10 nm from the surface in a manner that is finely controlled by the B₂H₆ exposure conditions. High-quality, extremely ultrashallow, p ⁺ n junctions were fabricated, and their saturation current was tuned from high Schottky-like values to low deep pn junction-like values by the increasing of the deposited B layer thickness. This junction formation exhibited high selectivity, isotropy, spatial homogeneity, and compatibility with standard Si device fabrication.     

Intersegment resistance in silicon <Emphasis Type="Italic">p</Emphasis>—<Emphasis Type="Italic">n</Emphasis>-Junction position-sensitive detectors

Intersegment insulation in p—n-junction arrays based on high-resistivity silicon, which controls the interaction of neighboring elements of position-sensitive detectors, was studied. It was shown that current-voltage characteristics of the intersegment gap of the p—n junction deeply depleted due to an applied reverse voltage contain a portion of a step change in the current, which controls the intersegment insulation resistance. This feature is caused by the effect of switching of a small fraction of the bulk current between neighboring segments. In this case, the effect of the ohmic conductance between segments on the intersegment insulation resistance is ten times weaker than the effect of bulk current switching.     

Analysis of Carrier Transport in <Emphasis Type="Italic">n</Emphasis>-Type Hg<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Cd<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Te with Ultra-Low Doping Concentration

Mercury cadmium telluride (HgCdTe, or MCT) with low n-type indium doping concentration offers a means for obtaining high performance infrared detectors. Characterizing carrier transport in materials with ultra low doping (N_D?=?10¹⁴ cm^?3 and lower), and multi-layer material structures designed for infrared detector devices, is particularly challenging using traditional methods. In this work, Hall effect measurements with a swept B-field were used in conjunction with a multi-carrier fitting procedure and Fourier-domain mobility spectrum analysis to analyze multi-layered MCT samples. Low temperature measurements (77 K) were able to identify multiple carrier species, including an epitaxial layer (x?=?0.2195) with n-type carrier concentration of n?=?1?×?10¹⁴ cm^?3 and electron mobility of μ?=?280000 cm²/Vs. The extracted electron mobility matches or exceeds prior empirical models for MCT, illustrating the outstanding material quality achievable using current epitaxial growth methods, and motivating further study to revisit previously published material parameters for MCT carrier transport. The high material quality is further demonstrated via observation of the quantum Hall effect at low temperature (5 K and below).     

Pb<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Sn<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Te Alloys: Application Considerations

The search for alternative energy sources is at the forefront of applied research. In this context, thermoelectricity, i.e., direct conversion of thermal into electrical energy, plays an important role, particularly for exploitation of waste heat. Materials for such applications should exhibit thermoelectric potential and mechanical stability. PbTe-based compounds include well-known n-type and p-type compounds for thermoelectric applications in the 50°C to 600°C temperature range. This paper is concerned with the mechanical and transport properties of p-type Pb_0.5Sn_0.5Te:Te and PbTe<Na> samples, both of which have a hole concentration of ∼1 × 10²⁰ cm⁻³. The ZT values of PbTe<Na> were found to be higher than those of Pb_0.5Sn_0.5Te:Te, and they exhibited a maximal value of 0.8 compared with 0.5 for Pb_0.5Sn_0.5Te:Te at 450°C. However, the microhardness value of 49 H_V found for Pb_0.5Sn_0.5Te:Te was closer to that of the mechanically stable n-type PbTe (30 H_V) than to that of PbTe<Na> (71 H_V). Thus, although lower ZT values were obtained, from a mechanical point of view Pb_0.5Sn_0.5Te:Te is preferable over PbTe<Na> for practical applications.     

Photosensitive thin-film In/<Emphasis Type="Italic">p</Emphasis>-Pb<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Sn<Subscript>1 − <Emphasis Type="Italic">x</Emphasis></Subscript>S Schottky barriers: Fabrication and properties

Thin Pb _x Sn_{1 − x} S films are obtained by the “hot-wall” method at substrate temperatures of 210–330°C. The microstructure, composition, morphology, and electrical characteristics of films are investigated. On the basis of the obtained films, photosensitive In/p-Pb _x Sn_{1 − x} S Schottky barriers are fabricated for the first time. The photosensivity spectra of these structures are investigated, and the character of interband transitions and the band-gap values are determined from them. The conclusion is drawn that Pb _x Sn_{1 − x} S thin polycrystalline films may be used in solar-energy converters.     

Electrodeposition of Bi<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Sb<Subscript>2−<Emphasis Type="Italic">x</Emphasis></Subscript>Te<Subscript><Emphasis Type="Italic">y</Emphasis></Subscript> Thermoelectric Films from DMSO Solution

The electrochemical behavior of nonaqueous dimethyl sulfoxide solutions of Bi^III, Te^IV, and Sb^III was investigated using cyclic voltammetry. On this basis, Bi _x Sb_2−x Te _y thermoelectric films were prepared by the potentiodynamic electrodeposition technique in nonaqueous dimethyl sulfoxide solution, and the composition, structure, morphology, and thermoelectric properties of the films were analyzed. Bi _x Sb_2−x Te _y thermoelectric films prepared under different potential ranges all possessed a smooth morphology. After annealing treatment at 200°C under N₂ protection for 4 h, all deposited films showed p-type semiconductor properties, and their resistances all decreased to 0.04 Ω to 0.05 Ω. The Bi_0.49Sb_1.53Te_2.98 thermoelectric film, which most closely approaches the stoichiometry of Bi_0.5Sb_1.5Te₃, possessed the highest Seebeck coefficient (85 μV/K) and can be obtained under potentials of −200 mV to −400 mV.     

Type II broken-gap GaSb<Subscript>1 − <Emphasis Type="Italic">x</Emphasis></Subscript>As<Emphasis Type="Italic">x</Emphasis>/InAs heterojunction (<Emphasis Type="Italic">x</Emphasis> < 0.15): Evolution of the band diagram for the ternary solid solution

Layers of the GaSb_{1 ? x} As _x alloy with arsenic content in the range x = 0.06–0.15 have been grown for the first time on InAs (100) substrates by metal-organic vapor-phase epitaxy. A new approach to the calculation of the band diagram of the GaSbAs alloy is suggested. It is demonstrated on the basis of magnetotransport measurements in p-GaSbAs/p-InAs heterostructures and with the method suggested by the authors for the calculation of band diagrams for alloys in the GaSbAs system that, in the composition range under study, the GaSbAs/InAs heterojunction is a type II broken-gap heterojunction.     

Optical Properties of Epitaxial Al<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>In<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Sb Alloy Layers

Optical studies of unstrained narrow-gap Al _x In_{1 − x} Sb semiconductor alloy layers are carried out. The layers are grown by molecular-beam epitaxy on semi-insulating GaAs substrates with an AlSb buffer. The composition of the alloys is varied within the range of x = 0–0.52 and monitored by electron probe microanalysis. The band gap E _g is determined from the fundamental absorption edge with consideration for the nonparabolicity of the conduction band. The refined bowing parameter in the experimental dependence E _g (x) for the Al _x In_{1 − x} Sb alloys is 0.32 eV. This value is by 0.11 eV smaller than the commonly referred one.     

Metal-insulator transition in chromium-doped Pb<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Ge<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Te alloys

The electrical properties of chromium-doped n-Pb_1?x Ge _x Te alloys (x = 0.02–0.13) have been studied. A decrease in the free-electron concentration and a metal-insulator transition are observed as the germanium content of alloys increases. This is due to the Fermi level pinning by the chromium impurity level and to the flow of electrons from the conduction band to the impurity level. The experimental data obtained are used to calculate, in terms of the two-band Kane dispersion law, the dependences of the electron concentration and Fermi energy on the germanium content in the alloy. The motion rate of the chromium-related level with respect to the conduction band bottom is determined and a model of variation of the electronic structure with the matrix composition is suggested.     

Highly Efficient Ge-Rich Ge<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Pb<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Te Thermoelectric Alloys

The search for alternative energy sources is presently at the forefront of applied research. In this context, thermoelectricity for direct energy conversion from thermal to electrical energy plays an important role. This paper is concerned with the development of highly efficient p-type Ge _x Pb_1−x Te alloys for thermoelectric applications, using spark plasma sintering. The carrier concentration of GeTe was varied by alloying of PbTe and/or by Bi₂Te₃ doping. Very high ZT values up to ~1.8 at 500°C were obtained by doping Pb_0.13Ge_0.87Te with 3 mol% Bi₂Te₃.     

Pb<Subscript>1 − <Emphasis Type="Italic">x</Emphasis></Subscript>Sn<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Te epitaxial films for terahertz detectors

Liquid-phase epitaxy is used to fabricate Pb_0.8Sn_0.2Te films, undoped or doped with indium to different levels. The depth profiles of the carrier density and dopant concentration in the films are measured and examined. A uniform dopant concentration to a depth of 15 μm is obtained. Electrical-conduction inversion is observed at a temperature of 77.3 K as the doping level is varied. The liquid-phase epitaxial method is shown to be a more suitable technology for the reproducible manufacture of epitaxial films with a given carrier density, such as the ones used in terahertz detectors.     

Radiative recombination channels in Si/Si<Subscript>1 − <Emphasis Type="Italic">x</Emphasis></Subscript>Ge<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript> nanostructures

Using the solution of the 2D Schrödinger equation, systematic features of distribution of charge carriers in the Si/Si_{1 ? x} Ge _x nanostructures and variations in the efficiency of radiative recombination when pyramidal 2D clusters are transformed into 3D dome clusters with increasing thickness of nanolayers are established. The effect of the composition of the layers on the efficiency of the elastic stress in the structure and, as a consequence, the variation in conduction bands and valence band of the Si_{1 ? x} Ge _x nanostructures is taken into account. On realization of the suggested kinetics model, which describes recombination processes in crystalline structures, saturation of radiation intensity with increasing the pump intensity caused by an increase in the contribution of the Auger recombination is observed. A decrease in the contribution of the nonradiative Auger recombination is attained by decreasing the injection rate of carriers into the clusters, and more precisely, by an increase in the cluster concentration and an increase in the rate of radiative recombination.     

Investigation of MBE-Growth of Mid-Wave Infrared Hg<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Cd<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Se

Undoped mid-wave infrared Hg_1?xCd_xSe epitaxial layers have been grown to a nominal thickness of 8–14 μm on GaSb (211)B substrates by molecular beam epitaxy (MBE) using constant beam equivalent pressure ratios. The effects of growth temperature from 70°C to 120°C on epilayer quality and its electronic parameters has been examined using x-ray diffraction (XRD) rocking curves, atomic force microscopy, Nomarski optical imaging, photoconductive decay measurements, and variable magnetic field Hall effect analysis. For samples grown at 70°C, the measured values of XRD rocking curve full width at half maximum (FWHM) (116 arcsec), root mean square (RMS) surface roughness (2.7 nm), electron mobility (6.6?×?10⁴ cm² V^?1 s^?1 at 130 K), minority carrier lifetime (～?2 μs at 130 K), and background n-type doping (～?3?×?10¹⁶ cm^?3 at 130 K), indicate device-grade material quality that is significantly superior to that previously published in the open literature. All of these parameters were found to degrade monotonically with increasing growth temperature, although a reasonably wide growth window exists from 70°C to 90°C, within which good quality HgCdSe can be grown via MBE.     

Performance of Dual Branch SSC Receiver in Correlated <Emphasis Type="Italic">α</Emphasis>-<Emphasis Type="Italic">μ</Emphasis> Fading Channels

In this paper, the performance analysis of dual branch switch and stay combining (SSC) receivers operating over correlated and identically distributed (i.d.) α-μ fading channels is presented. Assuming this diversity technique, infinite series expressions with fast converging properties are derived for the probability density function (pdf), cumulative distribution function (cdf) and the moments of the output envelope. The proposed analysis is used for evaluating the important performance criteria, such as the outage probability, the mean square output envelope, the amount of fading and the average bit error probability (ABEP). The effects of fading severity, branch correlation and optimum choice of switching threshold are considered and numerically presented. Monte Carlo simulations confirm the validity and accuracy of the derived analytical expressions.     

Mechanisms of formation of <Emphasis Type="Italic">N–S</Emphasis> transition in nonisothermal <Emphasis Type="Italic">I–V</Emphasis> characteristics of a <Emphasis Type="Italic">p–i–n</Emphasis> diode

On the basis of the self-consistent model of transport processes in the semiconductor p–i–n diode during its self-heating under conditions of limited heat sink, the mechanisms of unusual effect—the formations of N–S transition in nonisothermal I–V characteristics of the device were numerically analyzed. It is established that such an effect is caused by a pronounced temperature reduction of the mobility of carriers in the high-resistivity base and the injection-level saturation at the current densities J > 300–500 A/cm². The saturation is attained due to the Auger recombination or the leakage of carriers from plasma into heavily doped emitter layers, the integrated current of which, as a rule, exceeds the recombination integrated current in the base under these conditions. The Auger recombination in the anode emitter also starts to play an appreciable role in the injection-level restriction in the base if the impurity concentration becomes higher than 10¹⁸ cm⁻³ in there.     

The influence of the magnetic field on the effect of drag of electrons by phonons in <Emphasis Type="Italic">n</Emphasis>-Cd<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Hg<Subscript>1 − <Emphasis Type="Italic">x</Emphasis></Subscript>Te

Thermopower in n-Cd_0.2Hg_0.8Te (6–100 K) is studied. A large effect of drag of the charge carriers by phonons α_ph is found. The influence of the magnetic field H on the drag thermopower is considered. It is established that the magnetic field exerts the effect mainly on the electron component of α_ph. The data are interpreted in the context of the theory taking into account the effect of H on thermopower α_ph, in which parameter A(ɛ) proportional to the static force of the drag effect is introduced. By the experimental data α_ph(T, H), T, and H dependences A(ɛ) are determined. It is shown that, as H increases, A(ɛ) sharply decreases. This explains a decrease in α_ph in the magnetic field, power index k in dependence α_ph ∝ T ^−κ, and narrowing the region of manifestation of the drag effect. It is established that at classically high fields, the drag effect in n-Cd_0.2Hg_0.8Te does not vanish.     

Optical properties of AgGa<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>In<Subscript>1 − <Emphasis Type="Italic">x</Emphasis></Subscript>Se<Subscript>2</Subscript> alloys

Coarse-grained crystals of AgGaSe₂ and AgInSe₂ ternary compounds and their alloys are grown by planar crystallization of the melts. For the crystals produced in this way, the transmittance spectra near the fundamental absorption edge are studied. From the experimental spectra, the band gap (E _g) and its variation with composition are determined. It is established that E _g is a nonlinear function of the composition parameter x. The dependence E _g (x) is calculated theoretically in the context of the Van Vechten-Bergstresser model and Hill-Richardson pseudopotential model.