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1.
设计了目标探测波长为320nm的AlGaN基共振腔增强的p-i-n型紫外光电探测器,共振腔由分别作为底镜和顶镜的AlN/Al0.3Ga0.7 N布拉格反射镜和空气/GaN界面组成,有源区p-GaN/i-GaN/n-Al0.38Ga0.62 N被置于腔内,该结构采用金属有机物化学气相淀积(MOCVD)方法在蓝宝石衬底和GaN模板上外延生长得到,光谱响应测试显示了正入射时该器件在波长313nm处出现响应的选择增强,零偏压下响应度为14mA/W。 相似文献
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设计了目标探测波长为320nm的AlGaN基共振腔增强的p-i-n型紫外光电探测器,共振腔由分别作为底镜和顶镜的AlN/Al0.3Ga0.7N布拉格反射镜和空气/GaN界面组成,有源区p-GaN/i-GaN/n-Al0.38Ga0.62N被置于腔内.该结构采用金属有机物化学气相淀积(MOCVD)方法在蓝宝石衬底和GaN模板上外延生长得到.光谱响应测试显示了正入射时该器件在波长313nm处出现响应的选择增强,零偏压下响应度为14mA/W. 相似文献
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An AlGaN-based back-illuminated ultra- violet p-i-n detector is designed and its performance is analysed both simulately and experimentally. The width of p- and i-regions has been optimized to the best theoretic values. It is indicated that the changing of responsivity with increase of bias can not be attributed to the expansion of depletion layer as it is believed, but to two reasons: 1) the effect of GaN/AlGaN heterojunction barrier to block the electrons decreases with higher bias and 2) the recombination rate of excess carriers decreases due to the building up of an electric field in depletion region. At zero bias, the simulated responsivity reaches its maximum of 0.12 A/W with quantum efficiency of 55.1%. The measured peak responsivity is more than 0.09 A/W with quantum efficiency greater than 41.6%. The experimental data are almost consistent with the results of the simulation. 相似文献
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研究了GaN/AlGaN异质结背照式p-i-n结构可见盲紫外探测器的制备与性能。GaN/AlGaN外延材料采用金属有机化学气相沉积(MOCVD)方法生长,衬底为双面抛光的蓝宝石,缓冲层为AlN,n型层采用厚度为0.8 μm的Si掺杂Al0.3Ga0.7N形成窗口层,i型层为0.18 μm的非故意掺杂的GaN,p型层为0.15 μm的Mg掺杂GaN。采用Cl2、Ar和BCl3感应耦合等离子体刻蚀定义台面,光敏面面积为1.96×10-3 cm2。可见盲紫外探测器展示了窄的紫外响应波段,响应区域为310~365 nm,在360 nm处响应率最大,为0.21 A/W,在考虑表面反射时,内量子效率达到82%;优质因子R0A为2.00×108 Ω·cm2,对应的探测率D*=2.31×1013 cm·Hz1/2·W-1;且零偏压下的暗电流为5.20×10-13 A。 相似文献
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第一次报道了以高温AlN为模板层的AlGaN基p-i-n背照式日光盲探测器的制作和器件特性.利用MOCVD方法在(0001)面的蓝宝石衬底上生长了探测器的AlxGa1-xN多层外延材料.在无需核化层的高温AlN模板上生长了p-i-n背照式日光盲探测器的无裂纹高Al组分(0.7)AlGaN多层外延结构.利用在线反射监测仪、三轴X射线衍射及原子力显微镜表征了外延材料的晶体质量.在1.8V的反向偏压下,制作的探测器表现出了日光盲响应特性,在270nm处最大响应度为0.0864A/W.具有约3.5V的正向开启电压,大于20V的反向击穿电压,在2V的反向偏压下暗电流小于20pA. 相似文献
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研究了GaN/AlGaN异质结背照式P-i-n结构可见盲紫外探测器的制备与性能.GaN/MGaN外延材料采用金属有机化学气相沉积(MOCVD)方法生长,衬底为双面抛光的蓝宝石,缓冲层为AiN,n型层采用厚度为0.8 μm的Si掺杂Al0.3Ga0.7形成窗口层,i型层为0.18 μm的非故意掺杂的GaN,P型层为0.15 μm的Mg掺杂GaN.采用C12、Ar和BCl3感应耦合等离子体刻蚀定义台面,光敏面面积为1.96×10-3cm2.可见盲紫外探测器展示了窄的紫外响应波段,响应区域为310-365 nm,在360 nm处响应率最大,为0.21 A/W,在考虑表面反射时,内量子效率达到82%;优质因子R0A为2.00×108 Ω·cm2,对应的探测率D*=2.31×1013·Hz1/2·W-1;且零偏压下的暗电流为5.20×10-13A. 相似文献
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第一次报道了以高温AlN为模板层的AlGaN基p-i-n背照式日光盲探测器的制作和器件特性.利用MOCVD方法在(0001)面的蓝宝石衬底上生长了探测器的AlxGa1-xN多层外延材料.在无需核化层的高温AlN模板上生长了p-i-n背照式日光盲探测器的无裂纹高Al组分(0.7)AlGaN多层外延结构.利用在线反射监测仪、三轴X射线衍射及原子力显微镜表征了外延材料的晶体质量.在1.8V的反向偏压下,制作的探测器表现出了日光盲响应特性,在270nm处最大响应度为0.0864A/W.具有约3.5V的正向开启电压,大于20V的反向击穿电压,在2V的反向偏压下暗电流小于20pA. 相似文献
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Epitaxial growth of a thick heavily doped silicon layer on a highly resistive silicon wafer by the yo-yo solute feeding method and its application to p-i-n photodiodes are discussed. An abrupt transition of the impurity profile is obtained between the n+ layer (1.95×1019 cm-3, 450 μm) and the n- layer (7.0×1011 cm-3, 80 μm). It is possible to use the thick intrinsic layers as the active region of power devices 相似文献
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硅基波导共振增强型光电探测器的设计与模拟 总被引:4,自引:0,他引:4
SiGe是间接带隙材料,吸收系数非常小,因而SiGe探测器在红外波段的量子效率很低.本文提出一种新型的探测器结构,即波导共振增强型光电探测器,该器件主要由两个介质布拉格反射镜和波导吸收区构成,器件尺寸较传统波导型探测器大为减小,吸收区的长度不受SiGe临界厚度的限制,实现了量子效率和响应速度的优化.本文在数值模拟的基础上,对器件结构进行了优化设计,结果表明7.6μm长的波导探测器可以得到20%以上的量子效率. 相似文献
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SiGe是间接带隙材料,吸收系数非常小,因而SiGe探测器在红外波段的量子效率很低.本文提出一种新型的探测器结构,即波导共振增强型光电探测器,该器件主要由两个介质布拉格反射镜和波导吸收区构成,器件尺寸较传统波导型探测器大为减小,吸收区的长度不受SiGe临界厚度的限制,实现了量子效率和响应速度的优化.本文在数值模拟的基础上,对器件结构进行了优化设计,结果表明7.6μm长的波导探测器可以得到20%以上的量子效率. 相似文献
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Ponnusamy Arivazhagan Raju Ramesh Mathaiyan Jayasakthi Ravi Loganathan Manavaimaran Balaji Krishnan Baskar 《Journal of Electronic Materials》2013,42(8):2486-2491
Aluminum gallium nitride-based double heterostructures with two different active layer widths have been grown on GaN templates by metalorganic chemical vapor deposition. Crystalline quality has been investigated using high-resolution x-ray diffraction analysis, and screw, edge, as well as total dislocation densities in the GaN epilayer have been calculated. The dislocation density of GaN has been found to be on the order of 108 cm?2. The nominal Al composition and in-plane strain ε xx for the AlGaN layer grown on the GaN layer have been measured by asymmetric reciprocal-space mapping. Surface properties and cross-sectional views of the samples have been analyzed using atomic force microscopy (AFM) and field-emission scanning electron microscopy (FESEM), respectively. Room-temperature time-resolved photoluminescence and photoluminescence measurements have been performed on Al0.18Ga0.82N/Al0.45Ga0.55N double heterostructures and the GaN template. The interface recombination velocity (S) of AlGaN-based double heterostructures has been calculated using carrier decay time measurement, increasing from 8.7 × 103 cm/s to 13.4 × 103 cm/s with varying active layer thickness. 相似文献
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钝化层膜系的选择及其工艺的优化对降低GaN基紫外探测器的漏电流和提升其可靠性是至关重要的。文章采用多种钝化层:等离子体增强化学气相沉积生长的Si3N4(PECVD-Si3N4)、电感耦合等离子体化学气相沉积生长的Si3N4(ICPCVD-Si3N4)和SiO2(ICPCVD-SiO2)以及等离子原子层沉积生长的Al2O3(PEALD-Al2O3),分别制备了GaN基金属-绝缘体-半导体(MIS)器件,并对MIS器件的电流-电压(I-V)和电容-电压(C-V)特性进行了对比研究。采用PECVD-Si3N4作为钝化层的GaN基MIS器件具有较低的漏电流;在双层PECVD-Si3N4钝化层中插入PEAL... 相似文献
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用能量为0.8 MeV的电子对非故意掺杂的GaN材料进行了辐照,光致发光谱(PL谱)表明,辐照使PL谱的强度随电子注量依次降低,且主发光峰蓝移,在注量较高时,在3.36 eV附近,出现新的发光峰。制备了SiN/GaN的MIS结构,并对其进行电子辐照,通过测量C-V曲线计算得到SiN/GaN之间的界面态随着电子辐照注量的增加而增加。制备了GaN基p-i-n 结构可见盲正照射紫外探测器并进行电子辐照,测量了辐照前后器件的I-V曲线和光谱响应曲线。实验表明,小注量的电子辐照对器件的反向暗电流影响不大,当电子注量≥5×1016 n/cm2时才使器件的暗电流增大一个数量级。辐照前后器件的光谱响应曲线表明,电子辐照对器件的响应率没有产生明显的影响。利用GaN材料和MIS结构的辐照效应分析了器件的辐照失效机理。 相似文献
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Design considerations for p-i-n thyristor structures 总被引:1,自引:0,他引:1
An analysis of a high-voltage gate turn-off (GTO) thyristor structure with a double-layered n base (p-i-n structure) is presented. From integration of Poisson's equation, an expression for the forward-blocking voltage at the onset of avalanche breakdown is obtained. Simple design criteria are developed to calculate the optimal thickness and doping density of the n base of a conventional pnpn structure designed for a specific voltage-blocking capability. The same principle is applied to design for the doping densities and thicknesses of the high-resistivity region and the buffer layer of the p-i-n GTO structure. The forward-blocking voltage, as well as the on-state voltage (at a current density of 300 A cm-2) is predicted for a wide range of base layer thicknesses and doping densities to illustrate the available tradeoff options. Lowest on-state power dissipation for high blocking voltages (>6000 V) is predicted for a doping level of 5×1012 cm-3 in the high-resistivity layer 相似文献
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An AIGaN-based back-illuminated ultraviolet p-i-n detector is designed and its performance is analysed both simulately and experimentally. The width of p- and i-regions has been optimized to the best theoretic values. It is indicated that the changing of responsivity with increase of bias can not be attributed to the expansion of depletion layer as it is believed, but to two reasons: 1) the effect of GaN/AlGaN heterojunction barrier to block the electrons decreases with higher bias and 2) the recombination rate of excess carriers decreases due to the building up of an electric field in depletion region. At zero bias, the simulated responsivity reaches its maximum of 0.12 A/W with quantum efficiency of 55.1%. The measured peak responsivity is more than 0.09 A/W with quantum efficiency greater than 41.6%. The experimental data are almost consistent with the results of the simulation. 相似文献