共查询到19条相似文献,搜索用时 62 毫秒
1.
2.
硅纳米晶非挥发存储器由于其卓越的性能以及与传统工艺的高度兼容性,近来引起高度关注。采用两步低压化学气相淀积(LPCVD)生长方式制备硅纳米晶(Si-NC),该方法所制备的硅纳米晶具有密度高、可控性好的特点,且完全兼容于传统CMOS工艺。在此基础上制作四端硅纳米晶非挥发存储器,该器件展示出良好的存储特性,包括10 V操作电压下快速地擦写,数据保持特性的显著提高,以及在105次擦写周期以后阈值电压(Vt)飘移低于10%的良好耐受性。该器件在未来高性能非挥发存储器应用上极具潜质。 相似文献
3.
介绍了在纳米晶浮栅存储器数据保持特性方面的研究工作,重点介绍了纳米晶材料的选择与制备和遂穿介质层工程。研究证明,金属纳米晶浮栅存储器比半导体纳米晶浮栅存储器具有更好的电荷保持特性。并且金属纳米晶制备方法简单,通过电子束蒸发热退火的方法就能够得到质量较好的金属纳米晶,密度约4×1011cm-2,纳米晶尺寸约6~7nm。实验证明,高介电常数隧穿介质能够明显改善浮栅存储器的电荷保持特性,所以在引入金属纳米晶和高介电常数遂穿介质之后,纳米晶浮栅存储器可能成为下一代非挥发性存储器的候选者。 相似文献
4.
5.
6.
7.
8.
9.
10.
优化了Ni纳米晶的制备工艺参数,得到了分布均匀,形状为球形,平均尺寸5nm,密度2×1012/cm2的Ni纳米晶。在此基础上,制备了包含Ni纳米晶的MOS电容结构。利用高频电容-电压(C-V)和电导-电压(G-V)测试研究了其电学性能,证明该MOS电容结构的存储效应主要源于金属纳米晶的限制态。电容-时间(C-t)测试曲线呈指数衰减趋势,保留时间600s,具有较好的保留性能。 相似文献
11.
12.
Nonvolatile Charge Injection Memory Based on Black Phosphorous 2D Nanosheets for Charge Trapping and Active Channel Layers
下载免费PDF全文
![点击此处可从《Advanced functional materials》网站下载免费的PDF全文](/ch/ext_images/free.gif)
Young Tack Lee Junyeong Lee Hyunsu Ju Jung Ah Lim Yeonjin Yi Won Kook Choi Do Kyung Hwang Seongil Im 《Advanced functional materials》2016,26(31):5701-5707
2D van der Waals atomic crystal materials have great potential for use in future nanoscale electronic and optoelectronic applications owing to their unique properties such as a tunable energy band gap according to their thickness or number of layers. Recently, black phosphorous (BP) has attracted significant interest because it is a single‐component material like graphene and has high mobility, a direct band gap, and exhibits ambipolar transition behavior. This study reports on a charge injection memory field‐effect transistor on a glass substrate, where few‐layer BPs act as the active channel and charge trapping layers, and Al2O3 films grown by atomic layer deposition act as the tunneling and blocking layers. Because of the ambipolar properties of BP nanosheets, both electrons and holes are involved in the charge trapping process, resulting in bilateral threshold voltage shifts with a large memory window of 22 V. Finally, a memory circuit of a resistive‐load inverter is implemented that converts analog signals (current) to digital signals (voltage). Such a memory inverter also shows a clear memory window and distinct memory on/off switching characteristics. 相似文献
13.
Kun Zhai Da‐Shan Shang Yi‐Sheng Chai Gang Li Jian‐Wang Cai Bao‐Gen Shen Young Sun 《Advanced functional materials》2018,28(9)
The cross‐coupling between electric polarization and magnetization in multiferroic materials provides a great potential for creating next‐generation memory devices. Current studies on magnetoelectric (ME) applications mainly focus on ferromagnetic/ferroelectric heterostructures because single‐phase multiferroics with strong magnetoelectric coupling at room temperature are still very rare. Here a type of nonvolatile memory device is presented solely based on a single‐phase multiferroic hexaferrite Sr3Co2Fe24O41 which exhibits nonlinear magnetoelectric effects at room temperature. The principle is to store binary information by employing the states (magnitude and sign) of the first‐order and the second‐order magnetoelectric coefficients (α and β), instead of using magnetization, electric polarization, and resistance. The experiments demonstrate repeatable nonvolatile switch of α and β by applying pulsed electric fields at room temperature, respectively. Such kind of memory device using single‐phase multiferroics paves a pathway toward practical applications of spin‐driven multiferroics. 相似文献
14.
Low‐Power Nonvolatile Charge Storage Memory Based on MoS2 and an Ultrathin Polymer Tunneling Dielectric
下载免费PDF全文
![点击此处可从《Advanced functional materials》网站下载免费的PDF全文](/ch/ext_images/free.gif)
Myung Hun Woo Byung Chul Jang Junhwan Choi Khang June Lee Gwang Hyuk Shin Hyejeong Seong Sung Gap Im Sung‐Yool Choi 《Advanced functional materials》2017,27(43)
Low‐power, nonvolatile memory is an essential electronic component to store and process the unprecedented data flood arising from the oncoming Internet of Things era. Molybdenum disulfide (MoS2) is a 2D material that is increasingly regarded as a promising semiconductor material in electronic device applications because of its unique physical characteristics. However, dielectric formation of an ultrathin low‐k tunneling on the dangling bond‐free surface of MoS2 is a challenging task. Here, MoS2‐based low‐power nonvolatile charge storage memory devices are reported with a poly(1,3,5‐trimethyl‐1,3,5‐trivinyl cyclotrisiloxane) (pV3D3) tunneling dielectric layer formed via a solvent‐free initiated chemical vapor deposition (iCVD) process. The surface‐growing polymerization and low‐temperature nature of the iCVD process enable the conformal growing of low‐k (≈2.2) pV3D3 insulating films on MoS2. The fabricated memory devices exhibit a tunable memory window with high on/off ratio (≈106), excellent retention times of 105 s with an extrapolated time of possibly years, and an excellent cycling endurance of more than 103 cycles, which are much higher than those reported previously for MoS2‐based memory devices. By leveraging the inherent flexibility of both MoS2 and polymer dielectric films, this research presents an important milestone in the development of low‐power flexible nonvolatile memory devices. 相似文献
15.
16.
17.
18.
Soon‐Won Jung Bock Soon Na Kang‐Jun Baeg Minseok Kim Sung‐Min Yoon Juhwan Kim Dong‐Yu Kim In‐Kyu You 《ETRI Journal》2013,35(4):734-737
Nonvolatile ferroelectric poly(vinylidene fluoride‐co‐trifluoroethylene) memory based on an organic thin‐film transistor with inkjet‐printed dodecyl‐substituted thienylenevinylene‐thiophene copolymer (PC12TV12T) as the active layer is developed. The memory window is 4.5 V with a gate voltage sweep of ?12.5 V to 12.5 V. The field effect mobility, on/off ratio, and gate leakage current are 0.1 cm2/Vs, 105, and 10?10 A, respectively. Although the retention behaviors should be improved and optimized, the obtained characteristics are very promising for future flexible electronics. 相似文献
19.
Hsuan‐Chun Chang Cheng‐Liang Liu Wen‐Chang Chen 《Advanced functional materials》2013,23(39):4960-4968
A novel flexible nonvolatile flash transistor memory devices on polyethylene naphthalate (PEN) substrate using 1D electrospun nanofiber of poly(3‐hexylthiophene) (P3HT):gold nanoparticles (Au NPs) hybrid as the channel is presented. The Au NPs are functionalized with self‐assembled monolayer (SAM) of para‐substituted amino (Au‐NH2), methyl (Au‐CH3) or trifluoromethyl (Au‐CF3) tail groups on the benzenethiol moiety. They are employed as localized charge traps across the nanofiber channel and program/erase the device towards low conductance (OFF)/high conductance (ON) states under the applied electrical field. With the low operation voltage of ±5 V, the hybrid nanofiber transistor memories exhibit a 3.5–10.6 V threshold voltage shifting and at least 104 s data retention, with a minimum effect on ≈100 programmed/erased stress endurances. The dipoles of the SAM probably modify the work function of the Au NPs associated with the P3HT nanofiber channel and manifest the degree of negative threshold voltage shifting in an order of Au‐NH2 > Au‐CH3 > Au‐CF3. The devices remain reliable and stable even under the bending conditions (radius: 5–30 mm) or 1000 repetitive bending cycles. The hybrid nanofiber can be used to obtain high‐performance digital nanoscale memories for flexible high density data storage devices. 相似文献