首页 | 本学科首页   官方微博 | 高级检索  
相似文献
 共查询到20条相似文献,搜索用时 828 毫秒
1.
《中国新通信》2006,(23):86-86
北电完成了业界首例采用上行链路协同MIMO技术进行的无线传输,向运营商展示了当前无线技术所允许实现的网络能力,使一个蜂窝站点上能够支持的移动宽带用户数量增加一倍。对于4G无线运营商而言,采用上行链路协同MIMO技术,能够使他们在相同资本投入的情况下提高业务收入。协同MIMO技术由北电开发,是WiMAX行业标准的组成部分,也是专为3GPP WCDMA长期演进(LTE)和3GPP2 cdma EV—DO版本C标准而设计的。北电在渥太华高级无线实验室进行的演示采用了多输入多输出(MIMO)的无线天线技术,此项技术将奠定了北电4G移动宽带解决方案的基础。  相似文献   

2.
作为ITU于2010年10月通过的4G标准之一,LTE-Advanced是3GPP长期演进(LTE)标准的增强版。文章给出了3GPP LTE-Advanced标准化时间表和关键性能,分析了上行链路多天线参考信号结构,描述了物理上行共享信道(PUSCH)中的MIMO、控制信道的上行链路MI-MO和上行链路多用户MIMO的工作原理,验证了上行链路多天线增强方案的系统性能。最后,文章还预测了LTE-Advanced R11中LTE-Ad-vanced上行链路多天线增强方案发展趋势。  相似文献   

3.
针对超可靠低时延通信短包传输特征,在大规模多输入多输出( Multiple-Input Multiple-Output,MIMO)上行链路系统中,利用较低导频开销来设计相移键控( Phase Shift Keying,PSK)调制方案,并对该方案进行优化兼顾无线链路传输的可靠性.首先,在接收端构建基于最小欧式距离的非相...  相似文献   

4.
多用户MIMO调度方法无法达到预期的调度效果,为此,文章提出面向5G网络的多用户MIMO调度方法。建立5G网络MIMO信道模型,根据用户调度优先级对用户分组,根据用户信道之间的相关性,确定调度候选组中的用户调度顺序,以此完成面向5G网络的多用户MIMO调度。实验结果表明,应用此方法5G网络MIMO信道平均吞吐量、速率均有明显的提升,具有良好的应用前景。  相似文献   

5.
大规模MIMO多小区TDD系统中的预编码策略和导频调度   总被引:1,自引:0,他引:1  
上行导频污染是大规模MIMO多小区多用户TDD系统的主要性能瓶颈。本文推导了下行链路中MF,ZF单小区预编码,基于MMSE的多小区预编码以及基于最大化SLNR准则的预编码策略在有导频污染的大规模MIMO下的系统可达和速率渐近性能,发现当基站天线数趋向无穷时,各个策略的等效信干比均收敛到仅与大尺度衰落因子相关的一个比值,由此可以得到一个系统可达和速率的渐近结果。基于此渐近结果,以最大化系统可达和速率为目标,获得了一个导频调度方案,即使得小区间相互干扰较小的用户采用相同的导频而相互干扰较大的用户采用正交的导频,从而在存在导频污染的情况下,可以提升系统的整体性能。理论分析和数值仿真结果都验证了以上结论。   相似文献   

6.
多输入多输出(MIMO)技术是4G LTE和5G系统的重要技术之一.随着5G通信频率以及通信带宽的的提升,宽带信号在传播链路中幅度和相位不平坦度将引入更大的MIMO空口(OTA)测量不确定性;另外大尺寸无线终端也面临MIMO测量方法选择的问题.为解决这两个问题,文章介绍了MIMO信道模型以及MIMO吞吐率的OTA测试方法:混响室法(RC)、多探头法(MPAC)、辐射两步法(RTS),并比较了不同方法的物理原理和应用差异,提出了基于RTS方法的小耦合箱宽带MIMO测试方法和基于机械臂的大型被测件MIMO测量方法,以指导工程师选择适合的方法进行无线终端的MIMO评估.  相似文献   

7.
针对5G网络技术大规模建设的背景下,室外主流3.5 GHz频段难以穿透建筑物以实现较好室内覆盖效果的问题,提出室内分布系统移频MIMO(多输入多输出)改造方案。选取两处场景,经方案改造后分析现场测试的上下行速率等数据,结果显示移频MIMO改造方案可获得较好经济性、较优覆盖性。  相似文献   

8.
为应对移动通信业务量的迅猛增长,以及对信息传输的速率、时延、可靠性等各方面都提出了更高的要求,大规模多进多出(Massive MIMO,m MIMO)因其空间资源挖掘的独特优势而获得青睐与重视,可实现系统频谱和能量效率的极大化,已成为5G的关键技术之一。文章介绍了m MIMO的关键技术原理,提出了针对不同TR数的设备进行差异性部署的方法,同时介绍了m MIMO最关键的波束赋形技术的优化思路和详细案例,为后续打造低成本优质5G精品网络具有重要意义。  相似文献   

9.
2.1 GHz频段重耕是城区5G网络部署需要研究的重要课题。分析了仿真预测网络覆盖存在的缺陷。考虑绝大部分5G基站与LTE同址并采用相同或相似工参的情况,提出了基于LTE测量报告的2.1 GHz和3.5 GHz 5G SA覆盖评估方法。该方法首先建立同址2.1 GHz和3.5 GHz 5G SA覆盖差异模型并通过测试验证其准确性,然后根据LTE测量报告、覆盖差异模型及速率与链路损耗关系评估两个频段的覆盖质量。评估实例表明,因城区LTE网络覆盖具有10 dB余量,同址20 MHz带宽内的2.1 GHz 5G重耕仅在1~10 Mbit/s上行速率覆盖率较3.5 GHz有1.3~5.2个百分点的增益。  相似文献   

10.
秦钰莹  孙长印 《电讯技术》2019,59(11):1351-1356
在5G超密集网络场景下,通过用户双/多连接技术可提高用户吞吐量,降低频繁切换带来的链路失效率。但是,随着链接数的增加,链路管理和资源分配带来的控制信令开销将增加,多链路带来的边际效益递减。为此,提出了多连接链路效率的概念,据此设计了基于链路效率的小区选择算法。该算法基于最大化用户和平均链路速率问题,在基站端及用户端采用变量松弛和拉格朗日对偶分解法来求解。仿真结果表明,多连接的小区选择问题能提高系统吞吐量,在获得更大的用户和速率的同时,也带来链路使用效率的提升。  相似文献   

11.
Waveguide multilayer optical card (WMOC) is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling & processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic (VB) language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.  相似文献   

12.
IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…  相似文献   

13.
The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.  相似文献   

14.
Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.  相似文献   

15.
A doping system consisting of NPB and PVK is employed as a composite hole transporting layer (CHTL). By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK : NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK : NPB at 1:3.  相似文献   

16.
An insert layer structure organic electroluminescent device(OLED) based on a new luminescent material (Zn(salen)) is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn(salen)/Liq/LiF/A1/CuPc/NPD/Zn(salen)/Liq/LiF/A1. Effective insert electrode layers comprising LiF(1nm)/Al(5 nm) are used as a single semitransparent mirror, and bilayer cathode LiF(1 nm)/A1(100 nm) is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.  相似文献   

17.
Due to variable symbol length of digital pulse interval modulation(DPIM), it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation(FDPIM) method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.  相似文献   

18.
It is a key problem to accurately calculate beam spots' center of measuring the warp by using a collimated laser. A new method, named double geometrical center method (DGCM), is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device (CCD) is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What's more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.  相似文献   

19.
DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.  相似文献   

20.
From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.  相似文献   

设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号