Dynamics in lithographic projection objectives

High-performance optical systems like lithography objectives are very sensitive to external dynamic excitations, which may occur both during operation and out of operation, i.e., during handling and transport. Lithography objectives are typical opto-mechanical systems. For the non-operating state, the focus of dynamical investigations is on avoiding damage, whereas during operation, the preservation of a good imaging behavior is of interest. In the first part, some out-of-operation situations are introduced, namely handling, transport, and earthquakes. In this context, excitation models are discussed and also applied to a nonlinear model. In the second part, an overview of techniques for modeling interfaces between dynamics and optics is given regarding lens systems. The interfaces are summarized in the lens kinematics. Lens kinematics is comprised of rigid lens motion, surface deformations, and refraction index variations due to stresses. According to these issues, some examples are provided.