电沉积Ni-W合金镀层的X射线光电子能谱分析

采用X射线光电子能谱（XPS）对电沉积Ni-W合金镀层表面膜进行了分析。研究结果表明，Ni-W合金镀层表面存在一层薄的氧化膜，而钨的氧化作用远大于镍，Ni-W合金镀层中W含量的提高对耐蚀性起决定作用。     

磨损自补偿添加剂在成品油中的摩擦学效应

利用四球试验机考察了二聚酸－3－氯－2－羟基丙单酯（DAE）在4种成品油中的摩擦学性能。试验结果表明，DAE添加剂在L－HM68液压油和L－DAB100空压机油中具有良好的适应性，使其承载能力增强，摩擦系数降低及耐磨性增强；DAE在L－CKE涡轮蜗杆油中使耐磨性增强；DAE在L－CKC150齿轮油中虽使承载能力提高，减磨性增强，但有使耐磨性减小的趋势，说明DAE在不同的油中有不同的性能。     

Alkali-metal Na Adsorption and Promoted Oxidation on Si(100)2×1 Surface

The alkali-metal Na adsorption on Si(100)2×1 surface and its promoted oxidation and Si oxidegrowth have been investigated by means of thermal desorption,work function,Auger electronspectroscopy and photoemission electron spectroscopy.The experimental data showed that therewas a new state,interface electron state,near the Fermi level after the deposition of Na atoms.It wasfound that the presence of Na always caused an increase of the oxygen initial uptake whereas thepromotion of Si oxide growth was observed only at the coverage of Na greater than 0.5 ML.A newmechanism of Na-promoted Si oxide growth is suggested in this paper.     

转炉炼钢静态模型的初步探讨

根据转炉炼钢的物理化学反应机理，从质量平衡和能量平衡的计算出发，通过小参数变动，导出了增量式静态模型中矿石方程和供氧方程的系数。所得结论与新日铁资料基本相符。同时，还进行了炉料和产物的计算，分析了改变废钢比对生产的影响。     

浅谈程序设计中一题多解的教学方法

中等职业学校一般开设VB、VC及数据库等涉及程序设计的计算机课程。本文拟就程序设计中一题多解的教学方法进行探讨。     

Kinetics of Folacin Destruction in Swiss Chard During Storage

The folacin activities in fresh Swiss chard leaves stored in open air at 4, 21, 35 and 40°C were determined by a microbiological assay using Lactobacillus casei. At 21°C the leaves were also stored in plastic bags and under moist conditions. Folacin was most stable when the vegetable was stored in plastic bags, followed by the moist condition, and least stable in open air at 21°C. The degradation of folacin in Swiss chard under all conditions followed firstorder kinetics. The temperature dependent folate degradation conformed to the Arrhenius equation and the activation energy was 24 kcal/mole.     

中频反应溅射SiO2膜与直流溅射ITO膜的在线联镀

多数ITO透明导电玻璃生产线在实现SiO2膜与ITO膜在线联镀时，应用SiO2靶射频溅射沉积SiO2膜工艺和ITO靶直流溅射沉积ITO膜工艺，如果SiO2膜应用硅靶反应磁控溅射工艺，存在这种工艺是否可以与ITO靶直流溅射沉积ITO膜工艺在线联用以及如何实现联用的问题。作者对现有的生产线进行了改造设计、加工，做了大量实验、质谱分析和多项测试研究，成功地实现反应溅射SiO2膜与ITO膜在线联镀，做到SiO2镀膜室的工作状态的变化基本上不影响ITO镀膜室的工艺条件。