Model of Primary Austenite Dendrite Structure in Hypoeutectic Cast Iron

Ｉｔｗａｓｒｅｐｏｒｔｅｄ[1] ｔｈａｔｔｈｅｍｉｃｒｏ ｓｔｅｒｅｏｓｔｒｕｃｔｕｒｅｏｆｐｒｉｍａｒｙａｕｓｔｅｎｉｔｅｉｎｃａｓｔｉｒｏｎｃｏｎｓｉｓｔｓｏｆｐｒｉｍａｒｙｓｔｅｍｓａｎｄｓｅｃｏｎｄａｒｙａｒｍｓｔｈａｔ ｇｒｏｗａｃｃｏｒｄｉｎｇｔｏｄｅｎｄｒｉｔｅｃｒｙｓｔａｌｓｂｒａｎｃｈｒｕｌｅ ,ａｎｄｓｏｍｅｏｆｐｒｉｍａｒｙａｕｓｔｅｎｉｔｅｅｖｅｎｈａｖｅｔｈｉｒｄａｒｍｓ .ＭｉｙａｋｅＨｅｔａｌ[2 ]ｐｒｏｐｏｓｅｄａｃｏｎｃｅｐｔｏｆｒｅｇｉｏｎｍｏｄｅｌｂｙｓｔｕｄｙｉｎｇ…     

四川马海毛钢花呢的试制

根据四川马海毛原料资源的品质特性，运用精纺粗做的方法，成功地试制出手感滑糯而富有弹性、光泽明亮悦目，各项物理指标符合FZ/T24002-93标准的四川马海毛纯毛钢花呢，达到了马海毛产品的特殊风格。同时指出四川马海毛制成率偏低。     

Hydrogen Permeation and Diffusion in Amorphous Alloy Ni_(68)Cr7_Si_8B_(14)Fe_3 at Elevated Temperature

The behaviour of hydrogen permeation and diffusion in amorphous alloy Ni68Cr7Si8B14Fe3 hasbeen investigated by an ultrahigh vacuum gas permeation technique. A comparison experimentwas carried out between the as-quenched and annealed States (400℃/2h) of the amorphousalloy. The results show that, for both states of the amorphous alloy in the temperature rangeof 200～350℃, the diffusivity and permeability of hydrogen are in agreement with Arrheniusrelationship, there does not exist H-trapping effect, and the activation energies of diffusion andpermeation almost keep the same.     

机械合金化过程中Fe70B30粉末晶粒尺寸和微观应变的研究

用Ｘ射线和电镜研究了Ｆｅ＿（７０）Ｂ＿（３０）粉末经不同时间高能球磨后晶粒尺寸和微观应力的变化。在机械合金化过程中，粉末的Ｘ射线衍射谱的宽度随球磨时间的增加逐渐加宽，这是晶粒细化和内部微观应力共同作用的结果。Ｘ射线衍射结果表明：随着机械合金化的进行，粉末的晶粒尺寸逐渐减小，球磨初期晶粒尺寸下降较快，经１５ｈ球磨，晶粒尺寸为２５ｎｍ，机械合金化进行到一定时间后晶粒尺寸下降缓慢，８０ｈ球磨后晶粒尺寸可达５ｎｍ。在机械合金化过程中球磨所造成的微观应变不大，球磨初期粉末的内应力随球磨时间增加而增加，当粉末粒子尺寸很小时，随球磨的进行粉末中的微观应变显著下降。     

Enhanced electron emission from phosphorus-doped diamond-cladsilicon field emitter arrays

Undoped and phosphorus (P)-doped diamond-clad Si field emitter arrays have been successfully fabricated using microwave plasma chemical vapor deposition (MPCVD) technology. The electron emission from the blunt diamond-clad microtips are much higher than those for the pure Si tips with sharp curvature due to a lower work function. Furthermore, the characteristics of emission current against applied voltage for the P-doped diamond-clad tips show superior emission at lower field to the undoped ones. After the examination of Auger electron spectroscopy (AES) and electrical characteristics of as-grown diamond, such a significant enhancement of the electron emission from the P-doped diamond-clad tips is attributed to a higher electron conductivity and defect densities     

Multiple negative-differential-resistance (MNDR) phenomena of ametal-insulator-semiconductor-insulator-metal (MISIM)-like structurewith step-compositioned InxGa1-xAs quantum wells

In this paper, a new multiple negative-differential-resistance (MNDR) device based on a metal-insulator-semiconductor-insulator-metal (MISIM)-like structure with step-compositional In_xGa_1-x As quantum wells has been fabricated and demonstrated. The interesting MNDR phenomena are found in the current-voltage (I-V) characteristics of this device. At room temperature, the triple switching behaviours and quadruple stable operation states are obtained. In addition, the sixfold switching behaviors and a staircase-shaped I-V characteristic are observed at -105°C. A sequential carrier accumulation at InGaAs subwells and the potential lowering process are used to qualitatively explain the interesting MNDR phenomena. From the experimental results, it is shown that the studied device has good potential in multiple-valued logic applications     

1-methyl-4-phenyl-1,2,3,6-tetrahydropyridine as a substrate of cytochrome P450 2D6: allosteric effects of NADPH-cytochrome P450 reductase

1-Methyl-4-phenyl-1,2,3,6-tetrahydropyridine (MPTP), a neurotoxin that produces Parkinsonism symptoms in man, has been examined as a substrate of recombinant human cytochrome P450 2D6. When cumene hydroperoxide is used as an oxygen and electron donor, a single product is formed, identified as 4-phenyl-1,2,3,6-tetrahydropyridine. The K(m) for formation of this product (130 microM) is in agreement with the dissociation constants for MPTP binding to the enzyme determined by optical and nuclear magnetic resonance (NMR) spectroscopy. When the reaction is carried out with nicotinamide adenine dinucleotide phosphate (reduced) (NADPH) and recombinant human NADPH-cytochrome P450 reductase, a second product, identified as 1-methyl-4-(4'-hydroxyphenyl)-1,2,3,6-tetrahydropyridine, is formed in addition to 4-phenyl-1,2,3,6-tetrahydropyridine. The K(m) values for formation of these two products are 19 microM and 120 microM, respectively. Paramagnetic relaxation experiments have been used to measure distances between the protons of bound MPTP and the heme iron, and these have been used to construct models for the position and orientation of MPTP in the active site. For the cytochrome alone, a single mode of binding was observed, with the N-methyl close to the heme iron in a position appropriate for the observed N-demethylation reaction. In the presence of the reductase, the data were not consistent with a single mode of binding but could be explained by the existence of two alternative orientations of MPTP in the active site. One of these, characterized by a dissociation constant of 150 microM, is essentially identical to that observed in the absence of the reductase. In the second, which has a K(d) of 25 microM, the MPTP is oriented so that the aromatic ring is close to the heme iron, in a position appropriate for p-hydroxylation leading to the formation of the product seen only in the presence of the reductase. In the case of codeine, another substrate for cytochrome P450 2D6, the addition of reductase had no effect on the nature of the product formed, the dissociation constant, or the orientation in the binding site. These observations show that NADPH-cytochrome P450 reductase has an allosteric effect on the active site of cytochrome P450 2D6 that affects the binding of some substrates but not others.     

聚合物复合材料填充剂的改性

在前人研究的基础之上，归纳总结了聚合物复合材料填充剂的种类，综述了对其进行表面改性的目的、条件、方法、工艺以及对改性结果的表征等。文章还分析了影响填充聚合物复合材料性能的因素，指出了今后发展的方向。     

激光辐照制备搪瓷涂层

激光辐照制备的搪瓷涂层表面粗糙,与金属基材结合牢固。一般由 Si,Al,Na,K,B,F,O等元素组成。在激光辐照过程中 K,Na 明显地挥发,从而在涂层中的含量明显减少;Co,Ni,主要分布在界面附近;Fe 元素也由基材进入涂层,呈梯度状分布,在界面过渡区含量很高,在涂层内含量很低。搪瓷涂层的形成与激光辐照参数,特别与激光功率间存在极为密切的关系;只有选用合理的参数,才能制得搪瓷涂层。