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41.
A radio frequency (RF) telemetry system with a shape memory alloy microelectrode was designed and fabricated. The total size and weight are 15 mm x 8 mm and 0.1 g, respectively. Since the telemeter is small and light enough to be loaded on a small animal such as an insect, the system can be used for the neural recording of a freely moving insect. The RF-telemeter can transmit signals by frequency modulation transmission at 80-90 MHz. The transmitted signals can be received up to about 16 meters away from the telemeter with a high signal-to-noise ratio. The neural activity can be detected without attenuation by using an instrumentation amplifier with its input impedance set to 2 Mohms at 1 kHz. The telemeter was loaded on a cockroach and the neural activity during a free-walk was successfully measured through this telemetry system. 相似文献
42.
Takeshi Terayama Susumu Nagata Yohei Tanaka Akihiko Momma Tohru Kato Masaru Kunii Atsushi Yamamoto 《Journal of Electronic Materials》2013,42(7):2306-2313
Solid oxide fuel cells (SOFCs) are being researched around the world. In Japan, a compact SOFC system with rated alternative current (AC) power of 700 W has become available on the market, since the base load electricity demand for a standard home is said to be less than 700 W AC. To improve the generating efficiency of SOFC systems in the 700-W class, we focused on thermoelectric generation (TEG) technology, since there are a lot of temperature gradients in the system. Analysis based on simulations indicated the possibility of introducing thermoelectric generation at the air preheater, steam generator, and exhaust outlet. Among these options, incorporating a TEG heat exchanger comprising multiple CoSb3/SiGe-based TEG modules into the air preheater had potential to produce additional output of 37.5 W and an improvement in generating efficiency from 46% to 48.5%. Furthermore, by introducing thermoelectric generation at the other two locations, an increase in maximum output of more than 50 W and generating efficiency of 50% can be anticipated. 相似文献
43.
Hara T. Fukuda K. Kanazawa K. Shibata N. Hosono K. Maejima H. Nakagawa M. Abe T. Kojima M. Fujiu M. Takeuchi Y. Amemiya K. Morooka M. Kamei T. Nasu H. Chi-Ming Wang Sakurai K. Tokiwa N. Waki H. Maruyama T. Yoshikawa S. Higashitani M. Pham T.D. Yupin Fong Watanabe T. 《Solid-State Circuits, IEEE Journal of》2006,41(1):161-169
An 8-Gb multi-level NAND Flash memory with 4-level programmed cells has been developed successfully. The cost-effective small chip has been fabricated in 70-nm CMOS technology. To decrease the chip size, a one-sided pad arrangement with compacted core architecture and a block address expansion scheme without block redundancy replacement have been introduced. With these methods, the chip size has been reduced to 146 mm/sup 2/, which is 4.9% smaller than the conventional chip. In terms of performance, the program throughput reaches 6 MB/s at 4-KB page operation, which is significantly faster than previously reported and very competitive with binary Flash memories. This high performance has been achieved by the combination of the multi-level cell (MLC) programming with write caches and with the program voltage compensation technique for neighboring select transistors. The read throughput reaches 60 MB/s using 16I/O configuration. 相似文献
44.
Tada M. Tamura T. Ito F. Ohtake H. Narihiro M. Tagami M. Ueki M. Hijioka K. Abe M. Inoue N. Takeuchi T. Saito S. Onodera T. Furutake N. Arai K. Sekine M. Suzuki M. Hayashi Y. 《Electron Devices, IEEE Transactions on》2006,53(5):1169-1179
Robust porous low-k/Cu interconnects have been developed for 65-nm-node ultralarge-scale integrations (ULSIs) with 180-nm/200-nm pitched lines and 100-nm diameter vias in a single damascene architecture. A porous plasma-enhanced chemical vapor deposition (PECVD)-SiOCH film (k=2.6) with subnanometer pores is introduced into the intermetal dielectrics on the interlayer dielectrics of a rigid PECVD-SiOCH film (k=2.9). This porous-on-rigid hybrid SiOCH structure achieves a 35% reduction in interline capacitance per grid in the 65-nm-node interconnect compared to that in a 90-nm-node interconnect with a fully rigid SiOCH. A via resistance of 9.7 /spl Omega/ was obtained in 100-nm diameter vias. Interconnect reliability, such as electromigration, and stress-induced voiding were retained with interface modification technologies. One of the key breakthroughs was a special liner technique to maintain dielectric reliability between the narrow-pitched lines. The porous surface on the trench-etched sidewall was covered with an ultrathin plasma-polymerized benzocyclobuten liner (k=2.7), thus enhancing interline time-dependent dielectric breakdown reliability. The introduction of a porous material and the control of the sidewall are essential for 65-nm-node and beyond scaled-down ULSIs to ensure high levels of reliability. 相似文献
45.
Nishioka T. Soujaeff A. Hasegawa T. Tsurumaru T. Abe J. Takeuchi S. 《Photonics Technology Letters, IEEE》2008,20(5):354-356
We have conducted a single-photon interference experiment over an 80-km optical fiber using a pulse-driven heralded single-photon source (HSPS). To the best of our knowledge, this is, thus far, the longest distance over which a single-photon interference experiment has been conducted using HSPSs (continuous-wave-pumped or pulse-driven). The effect of the 80-km transmission on the dispersion and fluctuation of polarization are more severe than those in our previous 40-km quantum key distribution (QKD) experiment. We have overcome the difficulties by some fine tunings and low-jitter controlling. By conducting ten consecutive transmission experiments over a total time of 30 min, an average quantum bit-error rate (QBER) of 7.9 plusmn 1.2% has been obtained. This QBER is lower than the threshold QBER of 10.55% which is considered as a limit for unconditional security for the QKD under negligible multiphoton emission. 相似文献
46.
Yuichi Terazawa Masashi Mikami Takashi Itoh Tsunehiro Takeuchi 《Journal of Electronic Materials》2012,41(6):1348-1353
By using first-principles cluster calculations, we identified that Ta or W substitution for V is useful for decreasing the lattice thermal conductivity of the Fe2VAl Heusler alloy without greatly affecting the electron transport properties. It was clearly confirmed that the Fe2(V1?x Ta x )Al0.95Si0.05 (x?=?0, 0.025, 0.05), Fe2(V0.9?x Ta x Ti0.1)Al (x?=?0, 0.10, 0.20), and Fe2(V0.9?2x W x Ti0.1+x )Al (x?=?0, 0.05, 0.10) alloys indeed possessed large Seebeck coefficient regardless of the amounts of substituted elements, while their lattice thermal conductivity was effectively reduced. As a result of partial substitution of Ta for V, we succeeded in increasing the magnitude of the dimensionless figure of merit of the Heusler phase up to 0.2, which is five times as large as the Ta-free compound. 相似文献
47.
Takeshi Fujita Hideki Abe Toyokazu Tanabe Yoshikazu Ito Tomoharu Tokunaga Shigeo Arai Yuta Yamamoto Akihiko Hirata Mingwei Chen 《Advanced functional materials》2016,26(10):1609-1616
Precious metals (Pt and Pd) and rare earth elements (Ce in the form of CeO2) are typical materials for heterogeneous exhaust‐gas catalysts in automotive systems. However, their limited resources and high market‐driven prices are principal issues in realizing the path toward a more sustainable society. In this regard, herein, a nanoporous NiCuMnO catalyst, which is both abundant and durable, is synthesized by one‐step free dealloying. The catalyst thus developed exhibits catalytic activity and durability for NO reduction and CO oxidation. Microstructure characterization indicates a distinct structural feature: catalytically active Cu/CuO regions are tangled with a stable nanoporous NiMnO network after activation. The results obtained by in situ transmission electron microscopy during NO reduction clearly capture the unique reaction‐induced self‐transformation of the nanostructure. This finding can possibly pave the way for the design of new catalysts for the conversion of exhaust gas based on the element strategy. 相似文献
48.
49.
A GaAs/AlGaAs directional coupler switch, for the first time with a device length shorter than 1 mm, has been fabricated by utilising the good controllability of molecular beam epitaxy and reactive ion beam etching. The switching voltage is as low as 5V. The extinction ratio is 17dB for a crossover state and 14dB for a straight-through state. 相似文献