Boundary knot method for 2D and 3D Helmholtz and convection–diffusion problems under complicated geometry

The boundary knot method (BKM) of very recent origin is an inherently meshless, integration‐free, boundary‐type, radial basis function collocation technique for the numerical discretization of general partial differential equation systems. Unlike the method of fundamental solutions, the use of non‐singular general solution in the BKM avoids the unnecessary requirement of constructing a controversial artificial boundary outside the physical domain. The purpose of this paper is to extend the BKM to solve 2D Helmholtz and convection–diffusion problems under rather complicated irregular geometry. The method is also first applied to 3D problems. Numerical experiments validate that the BKM can produce highly accurate solutions using a relatively small number of knots. For inhomogeneous cases, some inner knots are found necessary to guarantee accuracy and stability. The stability and convergence of the BKM are numerically illustrated and the completeness issue is also discussed. Copyright © 2003 John Wiley & Sons, Ltd.     

电力光通信网浅谈

介绍了电力通信中SDH光传输网在业务分布、光缆连接结构方面的特点,并结合这些特点探讨了网络合理组织、保护技术和设备选择的方案。     

Self-Consistent Effects on the Starting Current of Gyrotron Oscillators

Self-consistent effects on the starting current of gyrotron oscillators are examined. Field profiles in the open cavity are shown to be sensitive to the interaction dynamics. This can either significantly raise or lower the oscillation threshold, particularly for the low-Q modes. The transition from resonant-mode oscillations at the low magnetic field to backward-wave oscillations at the high magnetic field is demonstrated.     

减少地下工程支护喷射混凝土回弹量的措施

介绍了水布垭地下厂房喷射混凝土室内试验结果和施工实践,总结了降低喷射混凝土回弹率的主要措施。     

陶瓷行业推行ISO14000探析

大力推行ISO14000系列标准已成为我国陶瓷企业适应加入WTO后新的竞争形式，参与国际绿色贸易的有力武器。本文根据我国陶瓷企业的现状，分析了在陶瓷行业推行ISO14000系列标准工作中所存在的问题，提出了在我国陶瓷行业广泛推行ISO14000系列标准的对策和建议。     

Deep‐UV Photochemistry and Patterning of (Aminoethylaminomethyl)phenethylsiloxane Self‐Assembled Monolayers

The 193 nm photochemistry of (aminoethylaminomethyl)phenethylsiloxane (PEDA) self‐assembled monolayers (SAMs) under ambient conditions is described. The primary photodegradation pathways at low exposure doses (< 100 mJ cm^–2) are benzylic C–N bond cleavage (ca. 68 %), with oxidation of the benzyl C to the aldehyde, and Si–C bond cleavage (ca. 32 %). Amine‐containing photoproducts released from the SAM during exposure remain physisorbed on the surface, where they undergo secondary photolysis leading to their complete degradation and removal after ca. 1200 mJ cm^–2. NaCl(aq) post‐exposure rinsing removes the physisorbed materials, showing that degradation of the original PEDA species (leaving Si–OH) is substantially complete after ca. 450 mJ cm^–2. Consequently, patterned, rinsed PEDA SAMs function as efficient templates for fabrication of high‐resolution, negative‐tone, electroless metal and DNA features with good selectivity at low dose (i.e., ca. 400 mJ cm^–2) via materials grafting to the intact amines remaining in the unirradiated PEDA SAM regions.     

SSJ-3060计算机监控系统在宝珠寺电厂的应用

系统地介绍了SSJ-3060计算机监控系统,说明了系统的结构、功能、特点,并着重介绍了该系统在宝珠寺电站运行情况及使用效果。     

Compact broadband photonic crystal filters with reduced back-reflections for monolithic InP-based photonic integrated circuits

A photonic crystal grating filter with an extremely wide rejection band and reduced modal back-reflections is proposed and demonstrated with a stopband extinction of 20 dB and insertion loss of less than 5 dB. The reflection-mitigation technique is shown to provide 10-15-dB reduction in reflected power. Guidelines for performance improvement are presented.