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排序方式: 共有1807条查询结果,搜索用时 15 毫秒
11.
Satoshi Takeuchi Ryo Sugihara 《Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment》1998,410(3):104-508
The longitudinal electric field of single and double Gaussian laser beams are used to accelerate electrons. The longitudinal field of the single beam is concentrated on the axis and is favourable for acceleration. A set of two beams is considered. Beams run parallel, collinearly, overlap partially and have a phase difference iπ in between. As a result, the transverse components of fields cancel each other while the longitudinal components are double-fold. In both schemes, the electrons are accelerated in lengths of the Rayleigh range, which is common to the plasma-based accelerators. 相似文献
12.
S Fukumoto M Suzawa Y Takeuchi Y Kodama K Nakayama E Ogata T Matsumoto T Fujita 《Canadian Metallurgical Quarterly》1996,81(7):2554-2558
13.
Y. Nakamura Ichiro Tanaka N. Takeuchi S. Koshiba H. Sakaki 《Journal of Electronic Materials》1998,27(11):1240-1243
We studied morphology of GaAs surfaces and the transport properties of two-dimensional electron gas (2DEG) on vicinal (111)B
planes. Multi-atomic steps (MASs) are found on the vicinal (111)B facet grown by molecular beam epitaxy, which will affect
electron transport on the facet. We also studied how the morphology of GaAs epilayers on vicinal (111)B substrates depends
on growth conditions, especially on the As4 flux. The uniformity of MASs on the substrates have been improved and smooth surfaces were obtained when the GaAs was grown
with high As4 flux, providing step periodicity of 20 nm. The channel resistance of the 2DEG perpendicular to the MASs is reduced drastically
with this smooth morphology. These findings are valuable not only for fabricating quantum devices on the (111)B facets but
also those on the vicinal (111)B substrates. 相似文献
14.
Development of accurate schemes is a technical issue related to calculation of electromagnetic fields. This study uses constrained interpolation profile (CIP) method to analyze electromagnetic fields created by line current. This is a novel method proposed by Yabe. Comparison of results obtained using finite difference time domain (FDTD) analysis and CIP analysis indicates that CIP analysis provides higher accuracy using identical discretization. In addition, given the same level of accuracy, CIP analysis requires less memory and less calculation time 相似文献
15.
Wakabayashi H. Ueki M. Narihiro M. Fukai T. Ikezawa N. Matsuda T. Yoshida K. Takeuchi K. Ochiai Y. Mogami T. Kunio T. 《Electron Devices, IEEE Transactions on》2002,49(1):89-95
Sub-50-nm CMOS devices are investigated using steep halo and shallow source/drain extensions. By using a high-ramp-rate spike annealing (HRR-SA) process and high-dose halo, 45-nm CMOS devices are fabricated with drive currents of 650 and 300 μA/μm for an off current of less than 10 nA/μm at 1.2 V with Toxinv =2.5 nm. For an off current less than 300 nA/μm, 33-nm pMOSFETs have a high drive current of 400 uA/μm. Short-channel effect and reverse short-channel effect are suppressed simultaneously by using the HRR-SA process to activate a source/drain extension (SDE) after forming a deep source/drain (S/D). This process sequence is defined as a reverse-order S/D (R-S/D) formation. By using this formation, 24-nm nMOSFETs are achieved with a high drive current of 800 μA/μm for an off current of less than 300 μA/μm at 1.2 V. This high drive current might be a result of a steep halo structure reducing the spreading resistance of source/drain extensions 相似文献
16.
Cooperative behavior of various agents in dynamic environment 总被引:5,自引:0,他引:5
Akihide Hiura Toshiya Kuroda Nobuhiro Inuzuka Ken-ichi Itoh Masashi Yamada Hirohisa Seki Hidenori Itoh 《Computers & Industrial Engineering》1997,33(3-4):601-604
The multi-agent model is a model in which agents with limited ability cooperate each other to accomplish a goal. In this paper, we introduce a multi-agent model in which agents are created to imitate real ants. There are two different type of agents, each type of which has a particular task. We designed agents to communicate each other by using pheromone considering noise. On this model, we observed cooperative behavior of agents and evaluated conditions to make an order of behavior in the model. 相似文献
17.
T Yoshida M Satoh Y Nakagaito H Kuno M Takeuchi 《Canadian Metallurgical Quarterly》1993,76(1):147-150
The effects of various cytokines on survival and differentiation of an astrocyte progenitor cell line (AP-16) were examined. Epidermal growth factor (EGF) deprivation caused death of AP-16 cells by apoptosis. Transforming growth factor-alpha (TGF-alpha) and basic fibroblast growth factor (bFGF) prevented the apoptosis occurring in the absence of EGF. Leukemia inhibitory factor (LIF) and ciliary neurotrophic factor (CNTF) induced glial fibrillary acidic protein (GFAP) and decreased A2B5 antigen in AP-16 cells, indicating that these cytokines induced AP-16 cells to differentiate into astrocytes. 相似文献
18.
H. Azuma A. Takeuchi T. Ito H. Fukushima T. Motohiro M. Yamaguchi 《Solar Energy Materials & Solar Cells》2002,74(1-4)
The pulsed KrF excimer laser annealing of silicon films for solar cell with EBEP-CVD and LP-CVD was studied theoretically and experimentally. Three-dimensional thermal diffusion equation for microcrystalline and amorphous silicon was solved by using the finite difference methods. The results of our heat-flow simulation of laser re-crystallization in a laser irradiation with 50 ns pulse duration almost agree with the experimental results in re-crystallization depth of 0.7 μm for microcrystalline silicon (EBEP-CVD) and 0.4 μm for amorphous silicon (LP-CVD) in a single pulse excimer laser annealing. 相似文献
19.
A simple, accurate and universal relationship between MOSFET drain current in saturation, effective channel length, and gate drive has been found. It can be explained by a simple analytical model, whose validity is supported by numerical simulation. The model shows that the length of a velocity saturated region is a crucial parameter for describing MOSFET performance, particularly for short channel devices. The shrinkage of the length deteriorates the merit of channel length scaling 相似文献
20.