全文获取类型
收费全文 | 60篇 |
免费 | 0篇 |
专业分类
电工技术 | 8篇 |
化学工业 | 12篇 |
金属工艺 | 1篇 |
建筑科学 | 1篇 |
轻工业 | 4篇 |
无线电 | 10篇 |
一般工业技术 | 16篇 |
冶金工业 | 4篇 |
原子能技术 | 1篇 |
自动化技术 | 3篇 |
出版年
2022年 | 2篇 |
2021年 | 2篇 |
2018年 | 1篇 |
2015年 | 1篇 |
2013年 | 5篇 |
2011年 | 2篇 |
2010年 | 2篇 |
2009年 | 4篇 |
2008年 | 5篇 |
2006年 | 3篇 |
2004年 | 3篇 |
2003年 | 2篇 |
2002年 | 3篇 |
2001年 | 3篇 |
2000年 | 1篇 |
1999年 | 3篇 |
1998年 | 2篇 |
1996年 | 1篇 |
1994年 | 3篇 |
1993年 | 5篇 |
1992年 | 2篇 |
1986年 | 1篇 |
1984年 | 1篇 |
1983年 | 1篇 |
1981年 | 1篇 |
1977年 | 1篇 |
排序方式: 共有60条查询结果,搜索用时 0 毫秒
51.
52.
A field-effect transistor with a 2 ?m Au gate was fabricated on a selectively doped InP/GaInAs heterostructure grown using chloride transport vapour-phase epitaxy. Complete pinch-off was observed, and transconductance of 90 and 160 mS/mm were measured at 295 and 77 K, respectively. From analysis of the drain I/V characteristic, two-dimensional electron gas at the interface was revealed to be the dominant factor for the channel current. This is the first report of a successful preparation of an n+ InP/n? GaInAs heterostructure for the selectively doped field-effect transistor. 相似文献
53.
Hirofumi Takikawa Masanori Imamura Masaru Kouchi Tateki Sakakibara 《Fullerenes, Nanotubes and Carbon Nanostructures》1998,6(2):339-349
Fullerene productivity was investigated in the carbon arc discharge method when air was deliberately introduced into He-filled arc apparatus. Values of fullerene yield and production rate did not vary until the air leakage rate, denned as an increase in the ratio of air partial pressure relative to He pressure, was 0.2%/min. Fullerene productivity drastically decreased when the air leakage rate increased above 0.2%/min. Emission spectroscopic measurement of the arc plasma suggested the possibility that this decrease in productivity was related to an increase in the formation of carbon-air combined molecular species, e.g., CN, in the plasma. 相似文献
54.
The effects of incorporated nano/micro‐diamond (NMD) on the physical properties, crystallization, thermal/hydrolytic degradation of poly(L ‐lactic acid) (PLLA) were investigated for a wide NMD concentration range of 0–10 wt.‐%. Incorporated NMD increased the tensile modulus and strength of PLLA films but decreased the elongation at break of PLLA films. Incorporated NMD accelerated the crystallization of PLLA during heating and cooling and increased the absolute crystallization enthalpy of PLLA films (except for an NMD concentration of 10 wt.‐% during cooling) but did not alter the crystallization mechanism. Incorporated NMD increased and decreased the thermal stability of PLLA films for NMD concentrations of 1–5 and 10 wt.‐%, respectively, and increased the hydrolytic degradation resistance of PLLA films.
55.
56.
Shinichiro Oke Yoshishige Kemmoku Hirofumi Takikawa Tateki Sakakibara 《Electrical Engineering in Japan》2008,164(2):54-63
A PV/solar heat/cogeneration system is assumed to be installed in a hotel. The system is operated with various operation methods: CO2 minimum operation, fees minimum operation, seasonal operation, daytime operation, and heat demand following operation. Of these five operations, the former two are virtual operations that are operated with the dynamic programming method, and the latter three are actual operations. Computer simulation is implemented using hourly data of solar radiation intensity, atmospheric temperature, electric, cooling, heating, and hot water supply demands for one year, and the life‐cycle CO2 emission and the total cost are calculated for every operation. The calculation results show that the two virtual and the three actual operations reduce the life‐cycle CO2 emission by 21% and 13% compared with the conventional system, respectively. In regard to both the CO2 emission and the cost, there is no significant difference between the two virtual operation methods or among the three actual operation methods. © 2008 Wiley Periodicals, Inc. Electr Eng Jpn, 164(2): 54–63, 2008; Published online in Wiley InterScience ( www.interscience.wiley.com ). DOI 10.1002/eej.20414 相似文献
57.
Masako Takikawa Yasuto Akiyama Dr. Tadashi Ashizawa Akifumi Yamamoto Naoya Yamazaki Yoshio Kiyohara Naoto Oku Ken Yamaguchi 《Proteomics. Clinical applications》2009,3(5):552-562
The discovery of novel melanoma markers for not only early detection but also monitoring disease status is promising to improve the clinical outcome of patients. In the present study, we performed proteomic comparative analysis of plasma proteins between healthy volunteers and melanoma patients using NanoLC and MALDI‐TOF‐MS. As a result, we were successful in identifying nine proteins that were specifically expressed in melanoma plasma compared with healthy plasma, most of which had not previously been identified as plasma markers of melanoma. The mRNA expression levels of four proteins [pro‐platelet basic protein precursor (PPBP), serum amyloid A2 (SAA2), complement factor H‐related protein 1 precursor (FHR1), inter‐alpha‐trypsin inhibitor heavy chain H4 precursor (IAIH4)] were prominently up‐regulated in several melanoma cell lines compared with melanocytes. Moreover, two proteins (PPBP, SAA) were shown to be expressed in tumor specimens from melanoma patients. In the survival time analysis regarding melanoma patients, the semi‐quantified plasma PPBP levels were statistically negatively correlated with the survival time. Most interestingly, the significant survival benefit was seen in low PBPP level group (< index 20) versus high level (≥ index 20) group. The results suggest that PPBP might be a novel promising serological marker and a prognostic factor specific to melanomas. 相似文献
58.
Hiroshi Fujita Mikio Ishikawa Masaharu Fukuda Tadahiko Takikawa Morihisa Hoga 《Microelectronic Engineering》2008,85(7):1514-1517
A new technique of hybrid use of a 100 kV-SB (spot beam) EB writer and a 50 kV-VSB (variable shaped beam) EB writer, based on an outline-and-body method, is proposed and examined for making nano-imprint molds. Here an original layer is split into an outline layer and a body layer, which the 100 kV writer and the 50 kV writer, respectively, take care of. This outline-and-body method is compared with a normal method (using only the 100 kV writer) in terms of CD linearity, pattern fidelity, and writing time. The CD linearity is similar. The pattern fidelity is satisfactory because no disconnected, shortened, or largely distorted features of the resist pattern are observed. A silicon mold with two layers of a 36 nm-rule logic/gate circuit was fabricated. The writing time for the 100 kV writer was reduced by 34%-64%. In conclusion, the outline-and-body method is effective to reduce the writing time without sacrificing fidelity. 相似文献
59.
Yokota M Suda Y Takikawa H Ue H Shimizu K Umeda Y 《Journal of nanoscience and nanotechnology》2011,11(3):2344-2348
Thin carbon nanocoil (CNC) with a fiber diameter of less than 50 nm was synthesized by catalytic chemical vapor deposition using Fe-Sn catalyst supported on zeolite. The chemical vapor deposition parameters of reaction temperature, gas flow rate of N2 as dilute gas and C2H2 as source gas were 650-750 degrees C, 1000 ml/min and 50-300 ml/min respectively. Transmission electron microscopic observation revealed that thin CNCs had a hollow and multi-walled structure with cylindrical graphitic layers. More than 90% of the CNCs obtained were multi-walled CNCs (MWCNCs), and the remainder was columnar CNCs without a hollow structure. Three-dimensional images of an MWCNC with Au nanoparticles on its surface were reconstructed by electron tomography and confirmed that the MWCNC had a three-dimensional helical shape. 相似文献
60.
Hideto Tanoue Shinichiro Oke Hirofumi Takikawa Yushi Hasegawa Nobuhiro Tsuji Haruyuki Yasui Hideo Takahashi 《Thin solid films》2010,518(13):3546-3550
Substrate etching by means of Ar-mixed graphite-cathodic-arc plasma beam was investigated in a newly-developed compact-type μT-FAD. The surface level and roughness change were measured as a function of the Ar gas flow rate, when Ar gas was introduced into the arc generation zone and in the vicinity of the substrate. When Ar gas was introduced to the arc generation zone, the etching rate was lower but the surface was relatively not roughened. When Ar gas was introduced in the vicinity of the substrate, the etching rate was higher but the surface was roughened. At the same gas flow rate (and pressure), the substrate was etched more than three times faster when Ar gas was introduced into the arc generation zone than to the vicinity of the substrate. After measuring the discharge and plasma conditions, the results were considered to be caused by the difference in the amount of plasma transported to the substrate. 相似文献