Molecular Imaging of Apoptosis: The Case of Caspase-3 Radiotracers

The molecular imaging of apoptosis remains an important method for the diagnosis and monitoring of the progression of certain diseases and the evaluation of the efficacy of anticancer apoptosis-inducing therapies. Among the multiple biomarkers involved in apoptosis, activated caspase-3 is an attractive target, as it is the most abundant of the executioner caspases. Nuclear imaging is a good candidate, as it combines a high depth of tissue penetration and high sensitivity, features necessary to detect small changes in levels of apoptosis. However, designing a caspase-3 radiotracer comes with challenges, such as selectivity, cell permeability and transient caspase-3 activation. In this review, we discuss the different caspase-3 radiotracers for the imaging of apoptosis together with the challenges of the translation of various apoptosis-imaging strategies in clinical trials.     

Obsessive-compulsive disorder and depression. A retrospective study on course and interaction

In a retrospective study 62 patients, who fulfilled the ICD-8/9 criteria for obsessive-compulsive disorder (OCD), were followed up. Besides an assessment of the cross-sectional symptomatology of OCD and depression, the long-term course of OCD and its relationship to depression were investigated. Five courses of OCD could be differentiated: continuous and unchanging (27.4%); continuous with deterioration (9.7%); continuous with improvement (24.4%); episodic with partial remission (24.2%), and episodic with full remission (11.3%). There was no difference between primary or secondary depression on the prognosis of OCD, and there was also no difference between the continuous or episodic course with regard to primary or secondary depression. Our results may be biased by the fact that we selected a sample of OCD and not primarily major depressive patients.     

Kaffee, Kakao, Thee

Ohne Zusammenfassung     

Derivation of a new analytical solution for a general two-dimensional finite-part integral applicable in fracture mechanics

An exact expression is derived for the general finite-part integral over an inclined ellipticaldomain Ω. r denotes the distance of a point in Ω to the singular point $\left({x,y} \right).f = x_{^0 }^i y_0^j \sqrt {Z\left({x_{0,} y_0 }\right)}$ is a general function of the Cartesian co-ordinates x₀,y₀. The boundary of the region Ω represents the equation Z(x₀, y₀)=O. These integrals appear during the numerical solution of plane crack problems in three-dimensional elasticity where they are the dominant part of a hypersingular integral equation. The availability of exact expressions for the integrals with arbitrary integers i and j will increase the accuracy of the numerical results and, simultaneously, lead to quicker numerical results. The considered finite-part integral can be expressed in closed form as function of complete elliptical integrals or Gauss hypergeometric functions, respectively. Formuias for special cases and some i, j values and their numerical verification are given in Appendices II and III.     

Hard and superhard TiAlBN coatings deposited by twin electron-beam evaporation

Superhard nanostructured coatings, prepared by plasma-assisted chemical vapour deposition (PACVD) and physical vapour deposition (PAPVD) techniques, such as vacuum arc evaporation and magnetron sputtering, are receiving increasing attention due to their potential applications for wear protection. In this study nanocomposite (TiAl)B_xN_y (0.09 ≤ x ≤ 1.35; 1.07 ≤ y ≤ 2.30) coatings, consisting of nanocrystalline (Ti,Al)N and amorphous BN, were deposited onto Si (100), AISI 316 stainless steel and AISI M2 tool steel substrates by co-evaporation of Ti and hot isostatically pressed (HIPped) Ti-Al-B-N material from a thermionically enhanced twin crucible electron-beam (EB) evaporation source in an Ar plasma at 450 °C. The coating stoichiometry, relative phase composition, nanostructure and mechanical properties were determined using X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD), in combination with nanoindentation measurements. Aluminium (∼ 10 at.% in coatings) was found to substitute for titanium in the cubic TiN based structure. (Ti,Al)B_0.14N_1.12 and (Ti,Al)B_0.45N_1.37 coatings with average (Ti,Al)N grain sizes of 5-6 nm and either ∼ 70, or ∼ 90, mol% (Ti,Al)N showed hardness and elastic modulus values of ∼ 40 and ∼ 340 GPa, respectively. (Ti,Al)B_0.14N_1.12 coatings retained their ‘as-deposited’ mechanical properties for more than 90 months at room temperature in air, comparing results gathered from eight different nanoindentation systems. During vacuum annealing, all coatings examined exhibited structural stability to temperatures in excess of 900 °C, and revealed a moderate, but significant, increase in hardness. For (Ti,Al)B_0.14N_1.12 coatings the hardness increased from ∼ 40 to ∼ 45 GPa.     

Thermal stability of superhard Ti-B-N coatings

Ternary transition-metal boron nitride Ti-B-N offers outstanding hardness and thermal stability, which are increasingly required for wear resistant applications, as the protective coatings are subjected to high temperature, causing thermal fatigue. Ti-B-N coatings with chemical compositions close to the quasibinary TiN-TiB₂ tie line and boron contents below ∼ 18 at.% contain a crystalline supersaturated NaCl structure phase, where B substitutes for N. Annealing above the deposition temperature causes precipitation of TiB₂, which influence dislocation mobility and hence the hardness of TiB_0.40N_0.83 remains at a very high level of ∼ 43 GPa with annealing temperature T_a up to 900 °C. Growth of Ti-B-N coatings with B contents above ∼ 18 at.% results in the formation of nm sized TiN and TiB₂ crystallites embedded in a high volume fraction of disordered boundary layer. The compaction of this disordered phase during annealing results in a hardness increase of TiB_0.80N_0.83 coatings from the as-deposited value of ∼ 37 GPa to ∼ 42 GPa at T_a = 800 °C. Excess B during growth of TiB_2.4 coatings causes the formation of bundles of ∼ 5 nm wide TiB₂ subcolumns encapsulated in a B-rich tissue phase. This nanocolumnar structure is thermally stable up to temperatures of ∼ 900 °C, and consequently the hardness remains at the very high level of ~ 48 GPa, as nucleation and growth of dislocations is inhibited by the nm sized columns. Furthermore, the high cohesive strength of the B-rich tissue phase prevents grain boundary sliding.     

Incorporation of an unnatural amino acid in the active site of porcine pancreatic phospholipase A2. Substitution of histidine by l,2,4-triazole-3-alanine yields an enzyme with high activity at acidic pH

The effect of the substitution of the active site histidine48 by the unnatural 1,2,4-triazole-3-alanine (TAA) amino acidanalogue in porcine pancreas phospholipase A₂ (PLA₂) was studied.TAA was introduced biosynthetically using a his-auxotrophicEscherichia coli strain. To study solely the effect of the substitutionof the active site histidine, two nonessential histidines (i.e.His17 and His 115) were replaced by asparagines, resulting ina fully active mutant enzyme (His-PLA₂). In this His-PLA₂ thesingle histidine at position 48 was substituted by TAA withan incorporation efficiency of about 90%, giving a mixture ofHis-PLA₂ and TAA-PLA₂. Based on the charge difference at acidicpH, both forms could be separated by FPLC, allowing for thepurification of TAA-PLA₂ free from His-PLA₂. At pH 6, TAA-PLA₂has a fivefold reduced activity compared with His-PLA₂. Thisreduced activity paralells a reduced rate of covalent modificationwith p-nitrophenacyl bromide of TAA-PLA₂ compared with His-PLA₂.Competitive inhibition gave comparable IC₅₀ values for WT-PLA₂,His-PLA₂ and TAA-PLA₂. These results indicate that the reductionin activity is not caused by a different affinity for the substrate,but more likely results from a reduced k_cat value in TAA-PLA₂.The enzymatic activities for native and mutant PLA₂s were measuredat different pH values. For WT-PLA₂ and His-PLA₂ the activityis optimal at pH 6 and is strongly deminished at acidic pH,with no observable activity at pH 3. In contrast, TAA-PLA₂ isas active at pH 3 as at pH 6. Most likely, the decrease in activityobserved for WT-PLA₂ and His-PLA₂ is caused by the protonationof the active site His48, which is the general base involvedin the activation of the nucleophilic water molecule. In TAA-PLA₂,however, the active site residue TAA48 is unprotonated at bothpH 3 and 6 as a result of the low pK_a of TAA compared with histidine.