高纯锗探测器的快定时性能及其应用

为了将高纯锗（ＨＰＧｅ）探测器用于快定时的物理实验中，本实验研究厂影响高纯锗探测器定时谱仪时间性能的各种因素，找出了获得谱仪最小时间分辨的各种最佳参数。并建立了分辨时间为４．１９ｎｓ，能量分辨率为２０ｋｅＶ，微分非线性好于±２．０％，计效率可承受１２０×１０￣３ｓ￣（－１）的时间微分扰动角关联谱仪。利用此谱仪，以￣（２０４）Ｂｉ为探针核，研究了Ｂｉ系高温超导的微观机理，取得了较好的结果。     

高质量的一级光栅1．55μmDFB激光器

本文详细叙述了ＤＦＢ激光器的设计要点和新的工艺。采用一级全息光栅和二步液相外延法批量研制出高稳定单纵模工作的１．５５μｍ分布反馈激光器（ＤＦＢ—ＬＤ）。外延片成品率＞４０％。器件特性：２５℃时阈值电流２０ｍＡ，单面光功率＞１０ｍｗ，主边模抑制比ＳＭＳＲ达４３ｄＢ（λ／４相移光栅），谱线宽度△ν－２０ｄＢ＝０．３ｎｍ，调制速率＞１．８ＧＨｚ。可靠性测试显示：高温监测光谱稳定，２５°Ｃ时阈值退化率△Ｉｔｈ／ｔ＜０．３ｍＡ／ｋｈ，对应器件预估寿命将超过１０万ｈ。     

Methylaluminoxane/haloalkane as initiator system for styrene polymerization

Summary Styrene polymerization was initiated by methylaluminoxane in the presence of haloalkane. The propagating species are shown by trapping experiments and electron paramagnetic resonance to be both radicals and cations.     

Rugorous analysis of planar waveguides with two-dimensionally periodic layer

Rigorous analysis of planar waveguides with two-dimensionally periodic (2DP) layer is presented. Characteristic solutions in periodic layer are exactly represented by a double Fourier series known as the Floquet solutions. The vector amplitudes of space harmonics are proved to be governed by five-term recurrence relation in the operator-vector form for sinusoidal modulation. A general transmission-line network representation of two-dimensionally periodic medium and multiport network representation of uniform-periodic-medium interface are introduced. Any layered structures cascading with periodic ones can be analyzed. Numerical results based on the established theory are also presented to illustrate characteristics of 2DP medium and structure.     

空间三重奏

设计的确是一项非常有趣的工作，就如同一位导演运用出色的技巧掌控有限的预算，为观众呈现令人回味的剧情，逼真的音效和异彩纷呈的视觉映像，这无疑是三个紧密相扣的环。     

悬浮床加氢裂化油溶性催化剂与沥青质的作用

在高压釜反应器中对添加了油溶性 Ni 催化剂(UPC-O)和水溶性 Ni 催化剂(UPC-W)的辽河稠油常压渣油(LHAR)进行了悬浮床加氢裂化实验。通过元素分析和傅里叶变换红外光谱(FTIR)分析对抑制反应生焦效果好的 UPC-O 与 LHAR 沥青质的作用进行了研究。元素分析结果显示,在 LHAR 中加入 UPC-O1000μg/g,沥青质和脱沥青质油中 Ni 含量分别出476μg/g和110μg/g 增加到7 559μg/g 和1 024μg/g,表明 UPC-O 在沥青质中有富集的趋势。FTIR 表征结果显示,UPC-O 和沥青质发生了相互作用。UPC-O 可在沥青质原位硫化为活性组分,对沥青质在悬浮床加氢裂化反应中的缩合起到好的抑制作用。     

Nickel and chromium cycles: Stocks and flows project part IV

Nickel and chromium are essential ingredients in alloys increasingly important for energy-efficient, environmentally friendly modern technology. Quantitative assessment of the flows of these metals through the world economy from resource extraction to final disposal informs resource policy, energy planning, environmental science, and waste management. This article summarizes the worldwide technological cycles of nickel and chromium in 2000. Stainless steel is the major use of these metals, but they serve numerous other special needs, as in superalloys for high-temperature service, as plating materials, and in coinage. Because they are used primarily in alloys, novel recycling issues arise as their use becomes more widespread. “... the great New York and St. Louis double track, nickel plated railroad...” — Norwalk, Ohio, Chronicle 10 March 1881 announces arrival of surveyors for the future Nickel Plate Railway “Later [1911] I formed an alloy of Iron and Chromium, which showed remarkable resistance to rust and tarnish ... [It was] rediscovered by an Englishman named Brearley, in 1914.” —Elwood Haynes to Stephen F. Roberts, 17 January 1925     

Influence of the silicon surface treatment by plasma etching and scratching on the nucleation of diamond grown in HFCVD - a comparative study

A comparative study for the nucleation of diamond was carried out using surface treatment like (i) surface scratching with 1 μm diamond paste and (ii) surface etching using chlorine plasma at different RF powers (50, 100 and 150 W). Atomic force microscopic study shows variation in roughness from 31 nm to 110 nm. Scratching results in random scratches, whereas plasma etches a surface uniformly. Scanning electron microscopic observations show well faceted crystallites with a predominance of angular shaped grains corresponding to 〈100〉 and 〈110〉 crystallite surfaces for the scratched as well as plasma etched substrate. Surface etching at 150 W plasma power results in a better growth in comparison with 50 and 100 W plasma powers. Chlorine-radical is found responsible for the changes in the growth morphology. Raman spectroscopy shows a sharp peak at 1,332 cm⁻¹ and a peak at ∼1,580 cm⁻¹ for both samples.