The effect of sputter etching on the surface characteristics of dyed aramid fabrics

Three kinds of aramid fabrics, Technora (modified p-aramid), Conex (m-aramid) and Kevlar (p-aramid), were subjected to sputter etching and argon low-temperature plasma treatments after dyeing in black with disperse dyes. The depth of shade increased considerably on Technora and Kevlar with the sputter etching treatment, but not on Conex fabrics. Argon low-temperature plasma treatment had virtually no effect on the depth of shade on the aramid fabrics.     

Local disturbances preceding a running crack front in a viscoelastic solid

The local disturbances ahead of a running crack front in a viscoelastic solid were measured through noncontact electro-optical tools. It was observed that the very high local strain rate up to 200/sec exists even in the present quasistatic loading case. It may be concluded that the running crack propagation velocities, not the conventional average strain rates ranging from about 10^?4/sec to 10^?2/sec, govern the local disturbances, as the crack propagation velocities always exceed 200m/sec for both average strain rates, while the local strain rates observed do not show much differences between both average strain rate cases.     

Low-Temperature Synthesis of ZrC Powder by Cyclic Reaction of Mg in ZrO2–Mg–CH4

We investigated the conditions for low-temperature synthesis of ZrC fine powder from ZrO₂–Mg–CH₄. The synthesis utilizes a thermite-type reaction, with Mg as the reducing agent, and a reaction between Mg and CH₄ gas as a carbon source. The Mg/ZrO₂ molar ratio as well as the heating rate were varied. Because C can be continuously fed into the reaction group by the cyclic reaction of Mg through the formation and decomposition of Mg₂C₃ (2Mg + 3CH₄→ Mg₂C₃+ 6H₂→ 2Mg + 3C), a molar ratio of 2.2 for Mg/ZrO₂ was sufficient for the synthesis of single-phase ZrC. ZrC powders were synthesized under the following conditions: Mg/ZrO₂ molar ratio = 2.2, heating rate = 20°C/min, and temperature maintained at 750°C for 30 min. The amount of reaction heat produced in the reduction reaction of ZrO₂ by Mg depended on the Mg/ZrO₂ molar ratio, specifically, the amount of ZrO₂ contained. Moreover, the cyclic reaction of Mg-Mg₂C₃–Mg was influenced by the amount of reaction heat described above and by the heating rate. The ZrC fine powder showed little aggregation and high dispersibility.     

Copolymerization of ethanesultam with 2-methyl-2-oxazoline

Summary This paper describes the so-called No Catalyst Copolymerization between dioxo-1,1-thiazetidine-1,2(Ethanesultam; ESm) and 2-methyl-2-oxazoline. The copolymerization took place without any added initiator to produce copolymers of MeOZO and ESm. The structure of the copolymer was determined by the IR and NMR spectra, elemental analysis, as well as by the result of an alkaline hydrolysis of the copolymer. The reaction scheme of the copolymerization via zwitterion mechanism (Eq 3–5) was proposed.     

Bromine addition and successive amine substitution of mesoporous ethylenesilica: Reaction, characterizations and arsenate adsorption

Bromination and subsequent ethylenediamine substitution of the CC double bond in mesoporous ethylenesilica were carried out to explore the characteristics of this periodic mesoporous organosilica. The structures of the products (BrPMO and EDA–BrPMO, respectively) were analysed by IR, Br K-edge EXAFS and NMR spectroscopies, as well as X-ray diffraction and nitrogen adsorption. We showed (1) that the formulae of the two products that formed were [CHBrSiO_1.5]_0.45[CHSiO_1.5]_0.55 and [NH₂CH₂CH₂NHCHSiO_1.5]_0.05 [CHBrSiO_1.5]_0.40[CHSiO_1.5]_0.55, respectively, (2) that the addition of Br₂ at room temperature occurred on the CC double bonds with disturbing the framework structure, (3) that IR absorption band of CC bonds that reacted with Br₂ is significantly different from that of inactive CC bond, (4) that the length of the C–Br bond was considerably longer than in conventional alkyl bromides, and (5) that a large proportion of the ν(C–Br) band remained at the same position in the IR absorption spectrum after the ethylenediamine (EDA) substitution, while a new ν(C–Br) absorption also appeared. The mechanisms of these reactions are discussed at both the micro and mesoscopic levels.

Arsenate adsorption on EDA–BrPMO, in which the EDA is directly bound to the “surface” of the mesopores, was compared with adsorption on EDA–Pr–PMO, which was prepared by the direct synthesis of 3-chloropropyl-functionalized mesoporous ethanesilica followed by the substitution of Cl with EDA. The strength of the adsorption, as measured with the distribution coefficient, was greater for the former adsorbent than the latter. The origin of this difference was attributed to the distance between amino group and the surface.     

Pulsed Electric Current Sintering of Silicon Nitride

Pulsed electric current sintering (PECS) has been used to densify α-Si₃N₄ powder doped with oxide additives of Y₂O₃ and Al₂O₃. A full density (>99%) was achieved with virtually no transformation to β-phase, resulting in a microstructure with fine equiaxed grains. With further holding at the sintering temperature, the α-to-β phase transformation took place, concurrent with an exaggerated grain growth of a limited number of elongated β-grains in a fine-grained matrix, leading to a distinct bimodal grain size distribution. The average grain size was found to obey a cubic growth law, indicating that the growth is diffusion-controlled. In contrast, the densification by hot pressing was accompanied by a significant degree of the phase transformation, and the subsequent grain growth gave a broad normal size distribution. The apparent activation energy for the phase transformation was as high as 1000 kJ/mol for PECS, almost twice the value for hot pressing (∼500 kJ/mol), thereby causing the retention of α-phase during the densification by PECS.     

Semiconductor Passivation and Insulation Properties for Hydroxyl- and Fluoride-Free ZnO-SiO2-B2O3-Al2O3 Glasses Stabilized by Increased P2O5

F⁻- and OH⁻-free ZnO-B₂O₃-SiO₂-Al₂O₃-P₂O₅ glasses used for semiconductor-device passivation or insulation are investigated with regard to compositional dependencies for thermal expansion, viscosity points, and metal oxide semiconductor (MOS) capacitor properties. The experimental data show that thermal expansion increases, and flow points decrease, when P₂O₅ is substituted for B₂O₃. MOS capacitors passivated by OH⁻- and F⁻-free ZnO-based glasses exhibit normal capacitance-voltage curves.     

Chromium-nitride in situ composites with a compositional gradient formed by reactive DC plasma spraying

Nitrides of transition metals have good wear- and corrosion-resistant properties because of their high hardness and chemical stability. Chromium-nitride coatings can be deposited by ion plating; however, the thin thickness due to the slow deposition rate must be improved for severe wear-resistant applications. The main objective in this paper is to realize good structural control in the processing of chromiumnitride in situ composite coatings formed at a high deposition rate. They were synthesized by reactive low-pressure plasma spraying using elemental chromium powder as a spray material. The transferred arc between the gun electrode and the substrate was used to accelerate the nitriding reaction. The sprayed coatings consist of chromium, Cr₂N, and CrN, which have a composition gradient from the substrate interface to the surface. The volume fraction of Cr₂N increases with transferred arc current, and nonreacted chromium concurrently decreases, except close to the substrate. The CrN phase, however, only exists as a surface layer of 20 to 30 μm because it is decomposed to Cr₂N above 1420 K. The hardness of the composite coatings depends on the volume fraction of Cr₂N, and it increases to 1300 HV at a Cr₂N volume fraction of 0.98. The seizure stress with lubricant depends on the coating hardness. The maximum seizure stress of 24.9 MPa is obtained at a hardness of 1300 HV. The composite coatings also show a superior wear resistance. Hence, the Cr₂N in situ composite coatings synthesized by reactive plasma spraying with transferred arc are expected to be good candidates for wear-resistant applications.     

Surface nitridation of titanium metal by means of a gas tunnel type plasma jet

The surface nitridation of titanium was carried out at a low pressure in nitrogen atmosphere using a gas tunnel type plasma jet. The titanium nitride (TiN) film, 10 μm thick and 2000 HV, could be formed in 10 s. The structure of the TiN film was investigated by XRD. The Vickers hardness on the surface of the film was measured. The effects of deposition conditions on the properties of TiN films (TiN thickness,Vickers hardness, etc.) were investigated, and the advantage of this deposition method was identified from those results.     

Effects of blasting parameters on removability of residual grit

This article shows the quantitative evaluation of the residual grit on a blasted substrate, and the removability of the residual grit is examined. Carbon steel plates were blasted by white alumina grit with mean diameters of 338 to 1106 μm. The velocity and the number of grit particles were measured during blasting. The residual grit was removed from a substrate surface by the dissolution of the blasted substrate surface. A mixed acid solution was used as the dissolution solution. The residual grit weight was 7 to 17 g/m². The amount of the residual grit and the penetration depth of the embedded grit increased with increasing grit size. The penetration depth was 5 to 9% of the mean diameter of the grit. The residual grit weight and the penetration depth increased with the increase of the momentum of the grit particle. This article was originally published inBuilding on 100 Years of Success, Proceedings of the 2006 International Thermal Spray Conference (Seattle, WA), May 15–18, 2006, B.R. Marple, M.M. Hyland, Y.-Ch. Lau, R.S. Lima, and J. Voyer, Ed., ASM International, Materials Park, OH, 2006.