自由曲面五坐标数控加工干涉检查

提出了一种新方法，用于环刀五坐标数控加工的干涉检查。该方法将干涉检查分为刀轴及侧刃干涉检查和端面干涉检查。首先将加工曲面分片，选取合适的初始点。然后利用自由曲面的微分特性，确定跟踪方向和步长，迅速计算出工件和刀具的最短距离，从而判断是否发生干涉。实验仿真表明，达到同样精度时，该算法计算效率远高于常规的三角面片法。     

流量比对等离子体基团分布和薄膜结构的影响

使用光强标定的发射光谱(AOES)测量了CHF3／C6H6混合气体的微波电子回旋共振(ECR)放电等离子体中基团的分布状态。实验发现随着CHF3流量的增加，成膜基团CF、CF2、CH等的相对密度增大，而刻蚀基团F的密度也会增加，从而使得a—C：F薄膜的沉积速率降低。同时红外吸收谱(IR)分析表明，在高CHF3流量下沉积的a—C：F薄膜中含有更高的C—F键成分。可见在a—C：F薄膜的制备中CHF3／(CHF3 C6H6)流量比是重要的控制参量。     

不倒翁式偏心防斜钻具的设计

目前所使用的各种钻具主要是靠钻具本身的重力来产生降斜力,在井斜角很小时,降斜力一般很小,在某些区块钻井时不能满足防斜要求。据此,设计了一种不倒翁式偏心防斜钻具。该钻具有1段钻铤,钻铤的两端各有1个偏心稳定器,钻铤外表面有一半圆形的偏心块,在钻铤和偏心块之间有轴承结构。利用不倒翁原理,当井斜超过一定值时,偏心块会在重力作用下自动停留在井眼低边,这样就可以将此处的钻柱顶到井眼的高边上去,从而产生一个很大的降斜力,使井斜得以有效控制。     

电荷耦合器件积分时间对微型成像系统成像质量的影响

在光圈固定的情况下，确定合适的积分时间对于提高微型电荷耦合器件(CCD)成像系统的成像质量，增强微型飞行器的侦察能力具有十分重要的意义。本文讨论了决定CCD积分时间的各种因素，重点研究了适用于微型飞行器的CCD成像系统的积分时间与像移的关系，并进一步推导了计算像移量的相关数学模型。利用该模型对不同积分时间内采集的运动图像进行了像质评价，结果表明，在保证曝光量的前提下，当像移量被限制在1个像素内时，可以获得相对理想的运动图像像质。     

Enhanced thermal stability of a sputtered titanium-nitride film as a diffusion barrier for capacitor-bottom electrodes

The effect of a thin RuO_x layer formed on the Ru/TiN/doped poly-Si/Si stack structure was compared with that on the RuO_x/TiN/doped poly-Si/Si stack structure over the post-deposition annealing temperature ranges of 450–600°C. The Ru/TiN/poly-Si/Si contact system exhibited linear behavior at forward bias with a small increase in the total resistance up to 600°C. The RuO_x/TiN/poly-Si/Si contact system exhibited nonlinear characteristics under forward bias at 450°C, which is attributed to no formation of a thin RuO_x layer at the RuO_x surface and porous-amorphous microstructure. In the former case, the addition of oxygen at the surface layer of the Ru film by pre-annealing leads to the formation of a thin RuO_x layer and chemically strong Ru-O bonds. This results from the retardation of oxygen diffusion caused by the discontinuity of diffusion paths. In particular, the RuO_x layer in a nonstoichiometric state is changed to the RuO₂-crystalline phase in a stoichiometric state after post-deposition annealing; this phase can act as an oxygen-capture layer. Therefore, it appears that the electrical properties of the Ru/TiN/poly-Si/Si contact system are better than those of the RuO_x/TiN/poly-Si/Si contact system.     

带隔板底水油藏油井临界产量计算公式

本给出了带隔板底水油藏油井的监界产量计算公式，它适用于所有带隔板底水油藏的油井。     

基于TC8830AF的智能语音卡结构与设计

本文描述一种基于８０３１单片机和ＴＣ８８３０ＡＦ语音处理器的ＰＣ机智能语音卡，通过软硬件设计解决了ＰＣ－８０３１－ＴＣ８８３０ＡＦ结构中的通讯问题。该语音卡在进行语音的合成、编辑和播放时，仅占用极少的ＰＣ机ＣＰＵ处理时间，能满足计算机系统进行实时语音合成的要求。     

GaN and AlGaN high-voltage rectifiers grown by metal-organic chemical-vapor deposition

In this paper, we report the study of the electrical characteristics of GaN and AlGaN vertical p-i-n junctions and Schottky rectifiers grown on both sapphire and SiC substrates by metal-organic chemical-vapor deposition. For GaN p-i-n rectifiers grown on SiC with a relatively thin “i” region of 2 μm, a breakdown voltage over 400 V, and forward voltage as low as 4.5 V at 100 A/cm² are exhibited for a 60-μm-diameter device. A GaN Schottky diode with a 2-μm-thick undoped layer exhibits a blocking voltage in excess of ∼230 V at a reverse-leakage current density below 1 mA/cm², and a forward-voltage drop of 3.5 V at a current density of 100 A/cm². It has been found that with the same device structure and process approach, the leakage current of a device grown on a SiC substrate is much lower than a device grown on a sapphire substrate. The use of Mg ion implantation for p-guard rings as planar-edge terminations in mesageometry GaN Schottky rectifiers has also been studied.