A 4.5-GHz 130-nm 32-KB L0 cache with a leakage-tolerant self reverse-bias bitline scheme

This paper describes a 32-KB two-read, one-write ported L0 cache for 4.5-GHz operation in 1.2-V 130-nm dual-V/sub TH/ CMOS technology. The local bitline uses a leakage-tolerant self reverse-bias (SRB) scheme with nMOS source-follower pullup access transistors, while preserving robust full-swing operation. Gate-source underdrive of -220 mV on the bitline read-select transistors is established without external bias voltages or gate-oxide overstress. Device-level measurements in the 130-nm technology show 72/spl times/ bitline active leakage reduction, enabling low-V/sub TH/ usage, 40% bitline keeper downsizing, and 16 bitcells/bitline. 11% faster read delay and 2/spl times/ higher dc noise robustness are achieved compared with high-performance dual-V/sub TH/ bitline scheme. Sustained performance and robustness benefits of the SRB technique against conventional dynamic bitline with scaling to 100- and 70-nm technology is also presented.     

TD-SCDMA技术及市场分析

TD-SCDMA技术优势 2000年5月,在土耳其伊斯坦布尔召开的国际电联大会上,TD-SCDMA被国际电联接纳为第三代移动通信系统标准之一,这标志着中国在移动通信技术领域已经进入世界先进行列.     

Hydrogenated amorphous silicon thin-film transistor arrays fabricated by digital lithography

A jet-printed digital-lithographic method, in place of conventional photolithography, was used to fabricate 64 /spl times/ 64 pixel (300 /spl mu/m pitch) matrix addressing thin-film transistor (TFT) arrays. The average hydrogenated amorphous silicon TFT device within an array had a threshold voltage of /spl sim/3.5 V, carrier mobility of 0.7 cm/sup 2//V/spl middot/s, subthreshold slope of 0.76 V/decade, and an on/off ratio of 10/sup 8/.     

A NEW LARGE CAVITATION CHANNEL IN CHINA SHIP SCIENTIFIC RESEARCH CENTER

1 .　INTRODUCTIONIntherecentdecades ,itisrealizedthatitisquitenecessarytocarryouttestsathighReynoldsnumberwithalowbackgroundnoiselevelinordertomeetmoreandmoreurgentneedsofmodernnavyandmaritimeindustry .Anewlargecavita tionchannelisdevelopedinCSSRCfortestingcompletehull/ propulsor/appendagesarrange ments[1] .Itrepresentsoneofthelatestintechno logicallyadvancedlargecavitationtestfacilities.Inthefollowingsections ,thefeaturesandthefirsttestresultsofthechannelwillbedescribed .2 .　DICRIP…     

单晶高温合金DD3亚结构超细化定向凝固工艺研究EI

利用ＺＭ定向凝固装置研究了镍基单晶高温合金ＤＤ３在高温度梯度（７００～１２００Ｋ／ｃｍ）定向凝固条件下的微观组织演化特征及其对工艺参数的响应函数，结果表明：该合金在高界面温度梯度条件下，柱晶生长速度范围向高速区扩展，从而使单晶亚结构细化成为可能。所得单晶棒中亚结构一次间距可比传统ＨＲＳ法定向凝固籽晶中相应尺度减小５～１０倍。本文还对其组织演化机制进行了分析。     

Acoustical tomography based on the second-order Born transformperturbation approximation

Reconstruction algorithms and their numerical examples of acoustical tomography based on the second-order Born transform perturbation approximation are presented. The reconstruction algorithms in the second-order Born approximation are similar in form to those in the first-order Born approximation. Replacing the angular spectrum of the scattered wave in the first-order case by the result of applying a first-order operator to the angular spectrum of the scattered wave or applying a second-order operator to the angular spectrum of the incident wave leads to the second-order reconstruction algorithms. Also, comparisons of reconstruction algorithms of the first- and second-order Born approximations are given, and they show that the second-order Born approximation algorithms have a distinct advantage over the first-order approximations in many cases     

SiH4激光等离子体内H谱线的线型研究

本文利用OMA-Ⅲ系统测量了脉冲TEA CO_2激光诱发的SiH_4等离子体发光谱内H巴耳末系的H_α、H_β和H_γ线的线型及线宽。通过理论及实验分析,认为这些谱线的主要加宽机制为Stark加宽。由实验线型和理论线型的拟合得到等离子体的电子温度T≈40000K和电子密度N≈10~(17)cm~(-3)。