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61.
The behaviour of hydrogen permeation and diffusion in amorphous alloy Ni68Cr7Si8B14Fe3 hasbeen investigated by an ultrahigh vacuum gas permeation technique. A comparison experimentwas carried out between the as-quenched and annealed States (400℃/2h) of the amorphousalloy. The results show that, for both states of the amorphous alloy in the temperature rangeof 200~350℃, the diffusivity and permeability of hydrogen are in agreement with Arrheniusrelationship, there does not exist H-trapping effect, and the activation energies of diffusion andpermeation almost keep the same. 相似文献
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OBJECTIVE: To evaluate the therapeutical mechanism of Bushen Shengxue Paste (BSSXP) on anemia. METHODS: Chronic renal failure induced anemia patients were treated with BSSXP, clinical manifestation, anemia and renal function as indicators were observed in patients. The erythropoietin (EPO) and inhibition of colony-forming unit-erythrocyte (CFU-E) in patients' serum were determined by CFU-E in vitro. RESULTS: The patients' symptoms, renal function and anemia were improved after administration with BSSXP 1-2 course. EPO in serum was slightly increased. The inhibition of CFU-E in patient's serum was significantly decreased. CONCLUSIONS: BSSXP could improve the anemia degree, its mechanism might be through clearing the inhibitor of CFU-E in serum. 相似文献
69.
For the first time, the surface metal on nonalloyed ohmic electrodes is found to significantly change the profiles of gate grooves, when resist openings are employed to monitor drain current during wet-chemical gate recess for sub-micron InAlAs/lnGaAs heterojunction field-effect transistors (HFETs). The surface metal of Ni enhances the etching rate in comparison with that in the absence of electrodes by a factor of 4 and 10, laterally and vertically, which is favorable to fabricate deep gate grooves with small side etching. The Pt surface metal, however, leads to preferential etching of InGaAs over InAlAs, which can be useful to realize large side etching. The existence of an electrochemistry-related etching component, which arises when the ohmic electrodes are present during recess etching, is considered to be responsible for these behaviors 相似文献
70.
Shihong XU Pengshou XU Mingrong JI Xianming LIU Maosheng MA Jingsheng ZHU Yuheng ZHANG Structure Research Laboratory University of Science Technology of China Hefei ChinaZhenjia XU Institute of Semiconductor Academia Sinica Beijing China 《材料科学技术学报》1993,9(6):437-440
The alkali-metal Na adsorption on Si(100)2×1 surface and its promoted oxidation and Si oxidegrowth have been investigated by means of thermal desorption,work function,Auger electronspectroscopy and photoemission electron spectroscopy.The experimental data showed that therewas a new state,interface electron state,near the Fermi level after the deposition of Na atoms.It wasfound that the presence of Na always caused an increase of the oxygen initial uptake whereas thepromotion of Si oxide growth was observed only at the coverage of Na greater than 0.5 ML.A newmechanism of Na-promoted Si oxide growth is suggested in this paper. 相似文献