Microprocessor-Based Control of an Ion Beam Deposition System

A microprocessor-based system with 32 A/D, 24 D/A, and 16 ac load controllers, has been designed and built to monitor and control an ion beam thin-film deposition system. The A/D and D/A channels have electrical isolation of 7.5 kV between channels and between input and output. The microprocessor system keeps the ion beam deposition parameters stable for extended periods of operation and it is proposed as a means to greatly simplify switching from one deposition species to another to grow thin multilayer or alloy films.     

Laboratory accreditation in the UK

Two complementary national laboratory accreditation schemes are run by the National Physical Laboratory (NPL) to provide official recognition of competent British laboratories and an assurance of quality to their customers. The first of these, the British Calibration Service (BCS), was set up in 1966 to accredit laboratories to calibrate instruments, gauges and reference materials. In 1981 the National Testing Laboratory Accreditation Scheme (NATLAS) was formed to extend the service to all kinds of testing. Both BCS and NATLAS form an integral part of the UK national measurement system and were combined to form the National Measurement Accreditation Service on 1 October 1985.     

8096/8098单片机集成开发系统

本集成开发环境集编辑、编译、调试和运行于一体,模拟了MCS-96系列单片机的指令系统,并给教学、实验、应用、科研和单片机的开发提供了强有力的手段。     

Dosimetric characteristic of VVR-M reactor with respect to tritium

Translated from Atomnaya Énergiya, Vol. 67, No. 2, pp. 111–113, August, 1989.     

测定钠中杂质的手动阻塞计的研究

文章介绍了测定钠中杂质浓度的手动阻塞计的原理、装置和实验结果。为了减少测量误差,我们研究了影响准确测定阻塞温度的因素,并且找到了减少测量误差的办法。在同样的杂质饱和温度下,该阻塞计测得的高、低阻塞温度所对应的杂质浓度差是很接近的。对氧其差值为1.03ppm;对氢为0.0763ppm。