Precisely Aligned Monolayer MoS2 Epitaxially Grown on h‐BN basal Plane

Control of the precise lattice alignment of monolayer molybdenum disulfide (MoS₂) on hexagonal boron nitride (h‐BN) is important for both fundamental and applied studies of this heterostructure but remains elusive. The growth of precisely aligned MoS₂ domains on the basal plane of h‐BN by a low‐pressure chemical vapor deposition technique is reported. Only relative rotation angles of 0° or 60° between MoS₂ and h‐BN basal plane are present. Domains with same orientation stitch and form single‐crystal, domains with different orientations stitch and from mirror grain boundaries. In this way, the grain boundary is minimized and a continuous film stitched by these two types of domains with only mirror grain boundaries is obtained. This growth strategy is also applicable to other 2D materials growth.     

Markov chain Monte Carlo in Bayesian models for testing gamma and lognormal S-type process qualities

The process capability index C_pu is widely used to measure S-type process quality. Many researchers have presented adaptive techniques for assessing the true C_pu assuming normality. However, the quality characteristic is often abnormal, and the derived techniques based on the normality assumption could mislead the manager into making uninformed decisions. Therefore, this study provides an alternative method for assessing C_pu of non-normal processes. The Markov chain Monte Carlo, an emerging popular statistical tool, is integrated into Bayesian models to seek the empirical posterior distributions of specific gamma and lognormal parameters. Afterwards, the lower credible interval bound of C_pu can be derived for testing the non-normal process quality. Simulations show that the proposed method is adaptive and has good performance in terms of coverage probability.     

墨水直写、喷墨打印和激光直写技术及其在微电子器件中的应用

直写技术是一种新型微加工技术,其加工过程不需模板并可在亚微米至厘米范围实现材料加工成型.墨水直写、喷墨打印和激光直写作为最常用的直写技术,具有强大的二维、三维成型能力和优异的成型精度,可实现金属、陶瓷、聚合物、水凝胶等复杂构型的程序化构筑,被广泛应用于微电子、组织工程、微流控等领域.阐述了这3种直写技术的构型原理和材料选择,重点介绍了其在微电子器件制造中的应用,讨论了当前研究的难点和热点问题,并对其未来发展趋势进行了展望.     

The Effect of Pulsed Sliding Surface Discharges on Supersonic Airflow past a Thin Wedge in Shock Tube

The influence of ~300-ns pulsed sliding surface discharges on supersonic airflow with M = 1.2–1.5 past a thin wedge has been studied in a shock tube at 0.12–0.14 kg/m³ gas density. It is established that inhomogeneity of the airflow-density field near the wedge leads to changes in the discharge current geometry and the structure of surface-discharge glow. The dynamics of discharge-initiated shock waves disturbing the quasi-stationary flow past the wedge was studied by the method of shadow visualization. It is shown that shock waves from intense surface-discharge channels in front of the wedge and behind its rear part can produce nonstationary action on the flow past the wedge surface, which lasts for up to 120 μs after the discharge pulse.     

Large capacitance and fast polarization response of thin electrolyte dielectrics by spin coating for two-dimensional MoS2 devices

Nano Research - A spin-coating method was applied to obtain thinner and smoother PEO/LiClO4 polymer electrolyte films (EFs) with a lower level of crystallization than those obtained using a...     

Integrated-optic array illuminator: a new design for guided-wave optical interconnections

An integrated array illuminator can be used not only as an opticalpower distributor for an array of guided-wave optic devices but also asa key element for guided-wave optical interconnections. We presenta new design for an integrated-optic array illuminator with focusingwaveguide diffractive doublet arrays. This integrated arrayilluminator allows independent optimizations of efficient and uniformoptical power distribution and focusing performance. Furthermore, the device can be fabricated with all-optical lithographic technologyand hence has the advantages of mass production with lowcost.