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991.
激光诱导Al等离子体连续辐射研究 总被引:4,自引:2,他引:4
分析了Al等离子体连续辐射特征。根据连续辐射强度的同时分布,简要讨论了激光诱导等离子了体连续辐射的产生机理。我们认为激光诱导等离子体的连续辐射的主要机制提轫致辐射和复合辐射。在激光脉冲作用到靶上的瞬间,轫致辐射占主导地位,在等离子体演化初期,复合辐射和轫致辐射共同产生等离子体连续辐射,在等离子体演化后期,连续辐射主要是轫致辐射产生的。 相似文献
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在菲涅耳衍射与分数维傅立叶变换关系的理论基础上 ,给出了这一关系的另一表示方式 ,以此理论和透镜的分数维傅立叶变换特性分析了放大率大于 1和小于 1的单透镜成象系统。结果表明 ,作为菲涅耳衍射的分数维傅立叶变换可以与透镜的分数维傅立叶变换组成分数维傅立叶变换群 ,两次分数维傅立叶变换完成了一次成象过程 相似文献
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Plasma-induced charging damage in ultrathin (3-nm) gate oxides 总被引:3,自引:0,他引:3
Chi-Chun Chen Horng-Chih Lin Chun-Yen Chang Mong-Song Liang Chao-Hsin Chien Szu-Kang Hsien Tiao-Yuan Huang Tien-Sheng Chao 《Electron Devices, IEEE Transactions on》2000,47(7):1355-1360
Plasma-induced damage in various 3-nm-thick gate oxides (i.e., pure oxides and N2O-nitrided oxides) was investigated by subjecting both nMOS and pMOS antenna devices to a photoresist ashing step after metal pad definition. Both charge-to-breakdown and gate leakage current measurements indicated that large leakage current occurs at the wafer center as well as the wafer edge for pMOS devices, while only at the wafer center for nMOS devices. These interesting observations could be explained by the strong polarity dependence of ultra thin oxides in charge-to-breakdown measurements of nMOS devices. In addition, pMOS devices were found to be more susceptible to charging damage, which can be attributed to the intrinsic polarity dependence in tunneling current between nand p-MOSFETs. More importantly, our experimental results demonstrated that stress-induced leakage current (SILC) caused by plasma damage can be significantly suppressed in N2O-nitrided oxides, compared to pure oxides, especially for pMOS devices. Finally, nitrided oxides were also found to be more robust when subjected to high temperature stressing. Therefore, nitrided oxides appear to be very promising for reducing plasma charging damage in future ULSI technologies employing ultrathin gate oxides 相似文献
996.
Weifa Liang Xiaojun Shen 《Communications, IEEE Transactions on》2000,48(9):1571-1579
We address the problem of efficient circuit switching in wide area networks. The solution provided is based on finding optimal routes for lightpaths and semilightpaths. A lightpath is a fully optical transmission path, while a semilightpath is a transmission path constructed by chaining several lightpaths together, using wavelength conversion at their junctions. The problem thus is to find an optimal lightpath/semilightpath in the network in terms of the cost of wavelength conversion and the cost of using the wavelengths on links. In this paper, we first present an efficient algorithm for the problem which runs in time O(k2n+km+kn log(kn)), where n and m are the number of nodes and links in the network, and k is the number of wavelengths. We then analyze that the proposed algorithm requires O(d 2nk02+mk0 log n) time for a restricted version of the problem in which the number of available wavelengths for each link is bounded by k0 and k0=o(n), where d is the maximum in-degree or out-degree of the network. It is surprising to have found that the time complexity for this case is independent of k. It must be mentioned that our algorithm can be implemented efficiently in the distributed computing environment. The distributed version requires O(kn) time and O(km) messages. Compared with a previous O(k2n+kn2) time algorithm, our algorithm has the following advantages. (1) We take into account the physical topology of the network which makes our algorithm outperform the previous algorithm. In particular, when k is small [e.g., k=O(log n)] and m=O(n), our algorithm runs in time O(n log2 n), while the previous algorithm runs in time O(n log n). (2) Since our algorithm has high locality, it can be implemented on the network distributively 相似文献
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