IS—95CDMA系统的容量分析

容量的需求是推动ＣＤＭＡ数字蜂窝移动通信开发的主要动力。系统的容量受许多因素的影响，本文针对ＩＳ－９５ＣＤＭＡ系统在采用了功率控制、话音激活和扇区划分技术的情况下，对系统的容量进行了分析，同时也分析了功率控制精度对容量的影响。     

语音时域分割研究

在语音时域挑选剩余可懂度低的可用置换集合,置换集合是语音TDS系统中不可缺少的重要环节,本文给出了可用置换选取的条件、客观评价标准和方法。     

0.5级电子式电能表的设计与实现

本文论述了一种普及型电子式电能表的设计原理和实现方法，具体讨论了时分割乘法器和电流互感器的组成和误差分析，最后给出测试结果。     

高温过热器12Cr2MoWVTib（102）钢管的显微组织和相结构分析

本文对原始状态和在火力发电厂使用不同时间的高这热器１０２钢管进行了显微组织和相结构变化规律的探讨和研究。显微组织研究表明，１０２钢管在高温高压下长期运行过程中，使用温度对显微组织和碳化物相有明显影响，而使用时间对其影响不如温度影响强烈。碳化物颗粒图象分析表明，碳化物随着使用时间缓慢长大，而新的碳化物不沉淀，使颗粒总数不断增加，颗粒，间距逐渐缩小。Ｘ射线衍射数据证明，钢管在高温长期使用过程中，ＭＣ相     

Beam test of the CsI(Tl) calorimeter for the BELLE detector at the KEK-B factory

We studied the performance of a prototype electromagnetic calorimeter for the BELLE detector at the KEK proton synchrotron for an energy range of 0.25–3.5 GeV. The prototype consisted of an array of 6 × 5 CsI(Tl) crystals with 30 cm length (16.2 radiation lengths) and about 6 cm × 6 cm cross section. The scintillation light of each CsI(Tl) crystal was read out by two large-area PIN photodiodes and charge-sensitive preamplifiers attached at the rear face of the crystal. We measured the energy and position resolution for electrons and the e/π separation for two sets of matrix configurations: one corresponded to the center and the other to the edge of the barrel calorimeter. The overall performance measured by the test proves that the prototype calorimeter is satisfactory for the use in the BELLE detector.     

稀土Si_3N_4陶瓷材料中铝的络合滴定法测定

提出了强碱介质沉淀钇及有关杂质元素而与铝进行分离的方法。试液酸化后采用ＮａＦ析出法络合滴定测定铝。     

在（311）面上所生长的Al_xGa_（1－x）As／GaAs单量子阱特性

文章报道了用分子束外延（ＭＢＥ）法在６００℃和６５０℃下，在Ｓｉ掺杂的ＧａＡｓ衬底的（３１１）Ａ和（３１１）Ｂ面上成功地生长了高质量的ＡｌｘＧａ１－Ａｓ／ＧａＡｓ单量子阱材料。计算了光荧光（ＰＬ）峰值能量，并与实验作了比较。讨论了（３１１）Ａ和（３１１）Ｂ面上的不同生长特性。     

The effects of plasma etching induced gate oxide degradation onMOSFET's 1/f noise

The effects of the plasma etching process induced gate oxide damages on device's low frequency noise behavior are investigated on MOSFET's fabricated with different field plate perimeter to gate area ratio antennas. Abnormal 1/f noise spectrum with a shoulder centered in the frequency range of 100 and to 1 kHz was frequently observed in small geometry devices, and it is attributable to a nonuniform distribution of oxide traps induced by plasma etching process