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161.
162.
驱动AM-OLED的2-a-Si:H TFT的设计与制作 总被引:2,自引:1,他引:1
a-Si:H/SiNx:H TFT在长时间栅偏应力作用下,会产生阈值电压漂移,这主要是由绝缘层电荷注入和有源层亚稳态产生而引起的。针对电荷注入现象,文章首先通过控制源气体SiH4和NH3流量的不同,利用PECVD制作了不同N/Si比(0.87~1.68)的氮化硅绝缘材料,对其进行了椭偏、红外和光电子散射能谱(EDS)测试。制作了不同的MIS结构电容,对其进行老化实验和C-V测试分析,结果表明稍富氮(N/Si比稍大于标准Si3N4的化学计量比1.33)的氮化硅做成的M1S样品在老化前后C-V曲线偏移不是很明显,表明其缺陷态密度相对较小,能够有效减小半导体/绝缘层界面间的电荷注入。设计了驱动OLED的2-a-Si:H TFT像素电路及其阵列版图,优化了电路中的几个关键参数,即T1的W/L=2.5、T2的W/L=25和存储电容Cs=0.8pF。运用7PEP生产工艺,制作了13cm(5.2in)的TFT阵列样品。对TFT进行I-V特性测试,其开态电流为10μA,开关比为10^6;对AMOLED显示屏样品进行了静态驱动下的亮度测试,其最高亮度为341cd/m^2。 相似文献
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166.
高硬度耐磨电弧喷涂管状丝材的研究 总被引:2,自引:0,他引:2
利用自熔性合金与非晶态材料的特点,研制了Fe—B系管状丝材作为电弧喷涂材料,其形成的涂层具有良好的结合强度、低的孔隙率、高的硬度和耐磨损性能。 相似文献
167.
��This work gives the concept about oil-cut,gas-cut, kick,grave kick,blowout and failure in controlling blowout and summarizes the type of failure in controlling blowout,the objective and man-made reasons causing blowout and the measures to prevent and control well blowout. 相似文献
168.
Objective To study on the role of thymus transplantation for heart allograft in rats. Methods Vascularized heart-thymus combined transplantation was performed with microsurgical technique. Graft survival, histopathology,
level of IL-2, IL-4 and its mRNA expression in serum and cardiac grafts were investigated. Results Heart-thymus combined transplantation achieved effect in the prolongation of cardiac graft survival with short-term administration
of cyclosporine. Conclusions Vascularized thymus transplantation induced immune tolerance in thymectomized rats. 相似文献
169.
Beyene W.T. Xingchao Yuan Cheng N. Hao Shi 《Advanced Packaging, IEEE Transactions on》2004,27(1):34-44
With the rapid advance of silicon process technology, it is now possible to design input/output (I/O) circuits that operate at multigigabit data rates. As a result, accurate modeling and analysis of high-speed interconnect systems is essential to optimize the performance of the overall system. This paper describes the interconnect design, modeling, simulation, and characterization methodologies that are essential to achieve multigigabit data rates. It focuses on the physical layer verification and hardware correlation of functional systems and silicon to ensure robust system operation over 3.2Gb/s data rate using conventional low-cost packaging and printed circuit board (PCB) technologies. In order to capture conductor and dielectric losses, as well as other high-frequency effects of three-dimensional structures, accurate measurement-based simulation techniques that directly incorporate frequency-domain parameters from measurement or electromagnetic solver parameters into circuit simulation tools using fast Fourier transform (FFT) and bandlimiting windowing techniques are developed. Finally, simulation waveforms are correlated with prototypes at both component and system levels in both time and frequency domains. 相似文献
170.
The growth time, growth mode and the method of preparing the supported catalysts play an important role in the growth of single-walled nanotubes (SWNTs). Their effects on the chemical vapor deposition (CVD) growth of SWNTs with MgO-supported catalysts were investigated in this study. It is shown that the growth rate of SWNTs was large during the initial few minutes of growth, however the quality of the tubes was low owing to the formation of many defects. Long term growth may favor the formation of tubes with high quality and high yield, but the introduction of other forms of carbon (impurities) is also unavoidable. There was a balance between the increase in yield and quality and sacrifice of the purity during growth of SWNTs. MgO-supported catalysts prepared by the co-precipitation method were found to be more effective for the synthesis of SWNTs than those prepared by the widely used impregnation method. The size and dispersion state of the catalyst were found to be crucial in enhancing the growth of SWNTs. In addition, growth on the surface of SWNTs over nanosized catalyst films was shown to be more favorable for the synthesis of tube products with higher quality, yield and purity. 相似文献