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71.
I. N. Polandov V. K. Novik O. K. Gulish B. P. Bogomolov V. B. Morozov 《Measurement Techniques》1989,32(9):888-890
Translated from Izmeritel'naya Tekhnika, No. 9, pp. 34–35, September, 1989. 相似文献
72.
M. Polák M. Majoro F. Hanic J. Pitel M. Kedrová P. Kottman J. Talapa L. Vencel 《Journal of Superconductivity》1989,2(2):219-233
A method for contactless measurement of the shielding critical current density and its dependence on the external magnetic field is described and analyzed. The obtained values are compared with those measured resistively on two different samples. It is shown that the shielding critical current densityJ
cs
and the intergranular transport current densityJ
cr
are identical if the measurement conditions are similar. A degradation ofJ
cs
measured in the external field with AC ripple has been observed. 相似文献
73.
74.
A new method is described for transferring phase contrast in electron microscopy without artefacts due to oscillations of the phase contrast transfer function (PCTF). This is carried out by in situ image synthesis of two or three exposures transferred with complementary PCTF. The essence of the technique is to use optimized transfer attenuation functions to cut off the negative parts of PCTF. 相似文献
75.
P.W. Hawkes 《Ultramicroscopy》1985,17(2):151-156
Modifications of solid water and their transitions are described as they relate to cryo electron microscopy. In particular, the various amorphous states (amorphous polymorphs) as they exist below 100 K are extensively investigated. The “high-density” midification exhibits a lower viscosity than the “low-density” form. Differences are also observed in the mechanism of void formation due to electron irradiation: in the high-density form, voids are formed — not, however, in the low-density form. Together with the reaction to radiation damage, the physical properties of amorphous solid water are discussed with respect to embedding of organic specimens. Finally, the conditions and pitfalls associated with preparation of thin and entirely vitrified ice layers by shock-freezing are described. 相似文献
76.
Francois P.-L. Monerie M. Vassallo C. Durteste Y. Alard F.R. 《Lightwave Technology, Journal of》1989,7(3):500-513
Depending on the spectal width of the source illuminating an interferometer, measurement procedures can utilize either the whole interferogram, or only the fringe envelope, or only the fringe quick oscillations. With an ultraband spectrum source, a simplified adaptation of the methods of Fourier transform spectroscopy yields the variations of the test-fiber propagation constant over the whole wavelength-interval of the source. Chromatic dispersion can then be computed from a single interferogram. With narrower spectrum sources, only the fringe envelopes are utilized and yield measurements of mode delay, with application to chromatic and polarization mode dispersion. In this case, however, interferograms at several wavelengths are necessary. With even narrower spectrum sources, the fringe quick oscillations provide measurements of phase shifts, related to changes in the mode propagation constant, when outside perturbations are applied to the test fiber. A direct method for measuring the third-order nonlinear susceptibilities is discussed. In this case the outside perturbation is an intense pump laser field 相似文献
77.
78.
Tipton C.W. Bayne S.B. Griffin T.E. Scozzie C.J. Geil B. Agarwal A.K. Richmond J. 《Electron Device Letters, IEEE》2002,23(4):194-196
This paper reports on the first demonstration of a half-bridge power inverter constructed from silicon carbide gate turn-off thyristors (GTOs) operated in the conventional GTO mode. This circuit was characterized with input bus voltages of up to 600 VDC and 2 A (peak current density of 540 A/cm2) with resistive loads using a pulse-width modulated switching frequency of 2 kHz. We discuss the implications of the thyristor's electrical characteristics and the circuit topology on the overall operation of the half-bridge circuit. This work has determined the conservative critical rate of rise value of the off-state voltage to be 200 V/μs in these devices 相似文献
79.
80.