全文获取类型
收费全文 | 5448篇 |
免费 | 70篇 |
国内免费 | 8篇 |
专业分类
电工技术 | 281篇 |
综合类 | 12篇 |
化学工业 | 1007篇 |
金属工艺 | 118篇 |
机械仪表 | 98篇 |
建筑科学 | 95篇 |
能源动力 | 141篇 |
轻工业 | 487篇 |
水利工程 | 15篇 |
石油天然气 | 3篇 |
无线电 | 547篇 |
一般工业技术 | 884篇 |
冶金工业 | 1404篇 |
原子能技术 | 134篇 |
自动化技术 | 300篇 |
出版年
2023年 | 32篇 |
2022年 | 56篇 |
2021年 | 92篇 |
2020年 | 45篇 |
2019年 | 73篇 |
2018年 | 62篇 |
2017年 | 39篇 |
2016年 | 67篇 |
2015年 | 66篇 |
2014年 | 81篇 |
2013年 | 193篇 |
2012年 | 160篇 |
2011年 | 227篇 |
2010年 | 173篇 |
2009年 | 165篇 |
2008年 | 182篇 |
2007年 | 177篇 |
2006年 | 177篇 |
2005年 | 126篇 |
2004年 | 128篇 |
2003年 | 162篇 |
2002年 | 123篇 |
2001年 | 132篇 |
2000年 | 100篇 |
1999年 | 161篇 |
1998年 | 547篇 |
1997年 | 365篇 |
1996年 | 263篇 |
1995年 | 155篇 |
1994年 | 144篇 |
1993年 | 145篇 |
1992年 | 79篇 |
1991年 | 69篇 |
1990年 | 69篇 |
1989年 | 65篇 |
1988年 | 60篇 |
1987年 | 40篇 |
1986年 | 58篇 |
1985年 | 47篇 |
1984年 | 49篇 |
1983年 | 32篇 |
1982年 | 44篇 |
1981年 | 33篇 |
1980年 | 36篇 |
1979年 | 29篇 |
1978年 | 24篇 |
1977年 | 34篇 |
1976年 | 44篇 |
1975年 | 16篇 |
1973年 | 23篇 |
排序方式: 共有5526条查询结果,搜索用时 31 毫秒
71.
Takahashi T. Sekiguchi T. Takemura R. Narui S. Fujisawa H. Miyatake S. Morino M. Arai K. Yamada S. Shukuri S. Nakamura M. Tadaki Y. Kajigaya K. Kimura K. Itoh K. 《Solid-State Circuits, IEEE Journal of》2001,36(11):1721-1727
A multigigabit DRAM technology was developed that features a low-noise 6F2 open-bitline cell with fully utilized edge arrays, distributed overdriven sensing for operation below 1 V, and a highly reliable post-packaging repair scheme using a stacked-flash fuse. This technology, which can be used to fabricate a 0,13-μm 180-mm2 1-Gb DRAM assembled in a 400-mil package, was verified using a 57.6-mm2, 200-MHz array-cycle, 256-Mb test chip with 0.109-μm2 cells 相似文献
72.
An injection-mode InP optical switch array has been characterised at high frequency. A switched optical pulse settling anomaly, which limits the switching performance of the array, is associated with recombination and junction heating effects at the switch heterojunction interface. A simple model describing the effects is presented. Critical design parameters are also identified.<> 相似文献
73.
Usui T. Nasu H. Takahashi S. Shimizu N. Nishikawa T. Yoshimaru M. Shibata H. Wada M. Koike J. 《Electron Devices, IEEE Transactions on》2006,53(10):2492-2499
Copper (Cu) dual-damascene interconnects with a self-formed MnSi/sub x/O/sub y/ barrier layer were successfully fabricated. Transmission electron microscopy shows that approximately 2-nm thick and continuous MnSi/sub x/O/sub y/ layer was formed at the interface of Cu and dielectric SiO/sub 2/, and that no barrier was formed at the via bottom because no oxygen was at the via bottom during annealing. No leakage-current increase was observed, and electron energy loss analysis shows that no Cu was in SiO/sub 2/, suggesting that MnSi/sub x/O/sub y/ layer has sufficient barrier properties for Cu, and that the concept of self-forming barrier process works in Cu dual-damascene interconnects. Via chain yield of more than 90% and 50% reduction in via resistance were obtained as compared with physical vapor deposited tantalum barrier, because there is no barrier at the via bottom. In addition, no failure in the stress-induced voiding measurement was found even after a 1600-h testing. No failure in electromigration (EM) testing was found, as the electron flow is from the lower level interconnects through via up to upper level interconnects even after 1000-h testing. At least, four times EM lifetime improvement was obtained in the case of electron flow from upper level interconnect through via down to lower level interconnects. Significant EM lifetime improvement is due to no flux divergence site at the via bottom, resulting from there being no bottom barrier at the via. 相似文献
74.
Fujiyoshi T. Shiratake S. Nomura S. Nishikawa T. Kitasho Y. Arakida H. Okuda Y. Tsuboi Y. Hamada M. Hara H. Fujita T. Hatori F. Shimazawa T. Yahagi K. Takeda H. Murakata M. Minami F. Kawabe N. Kitahara T. Seta K. Takahashi M. Oowaki Y. Furuyama T. 《Solid-State Circuits, IEEE Journal of》2006,41(1):54-62
A single-chip H.264 and MPEG-4 audio-visual LSI for mobile applications including terrestrial digital broadcasting system (ISDB-T / DVB-H) with a module-wise, dynamic voltage/frequency scaling architecture is presented for the first time. This LSI can keep operating even during the voltage/frequency transition, so there is no performance overhead. It is realized through a dynamic deskewing system and an on-chip voltage regulator with slew rate control. By the combination with traditional low power techniques such as embedded DRAM and clock gating, it consumes only 63 mW in decoding QVGA H.264 video at 15 frames/sec and MPEG-4 AAC LC audio simultaneously. 相似文献
75.
J. Kannisto T. Takahashi J. Harju S. Heikkinen M. Helenius S. Matsuo B. Silverajan 《International Journal of Communication Systems》2015,28(15):2067-2081
Security service level agreements (SSLAs) provide a systematic way for end users at home or in the office to guarantee sufficient security level when doing business or exchanging sensitive personal or organizational data with an online service. In this paper, we propose an SSLA negotiation protocol that implements non‐repudiation with cryptographic identities and digital signatures and includes features that make it resistant to denial of service attacks. The basic version of the protocol does not rely on the use of a trusted third party, and it can be used for all kinds of simple negotiations. For the negotiation about SSLAs, the protocol provides an option to use an external knowledge base that may help the user in the selection of suitable security measures. We have implemented a prototype of the system, which uses JSON Web Signature for the message exchange and made some performance tests with it. The results show that the computational effort required by the cryptographic operations of the negotiation protocol remains at a reasonable level. Copyright © 2014 John Wiley & Sons, Ltd. 相似文献
76.
Atsushi Nakanishi Takashi Yasuda Kazuki Horita Hironori Takahashi 《Journal of Infrared, Millimeter and Terahertz Waves》2018,39(1):36-44
We measured the thermal dependencies of the refractive index and the absorption coefficient of high-resistivity silicon. We found that the refractive index varied slightly with temperature, and the absorption coefficient was very low and remained approximately constant as the temperature was changed. As a result, the conditions for terahertz propagation in silicon could be controlled by changing the refractive index without any absorption loss. As one application of this effect, we developed a terahertz time delay generator that can generate a terahertz time delay by changing the temperature of the medium through which the terahertz beam passes, without the need for any mechanical delay. We demonstrated generation of a terahertz time delay of approximately 6.6 ps. 相似文献
77.
Kawano M. Takahashi N. Kurita Y. Soejima K. Komuro M. Matsui S. 《Electron Devices, IEEE Transactions on》2008,55(7):1614-1620
A 3-D packaging technology is developed for stacked dynamic random access memory (DRAM) with through-silicon vias (TSVs). Eight different dry etchers were evaluated for deep Si etching. Highly doped poly-Si TSVs were used for vertical traces inside silicon and interconnection between DRAM chips to realize a DRAM-compatible process. Through optimization of process conditions and layout design, a fast poly-Si filling has been obtained. The entire packaging was carried out at the wafer level by using smart chip connection with feedthrough interposer (FTI) technology. A new bump and wiring structure for the FTI has also been developed for fine-pitch and low-cost bonding. Normal operation during DRAM read/write was confirmed on a 512-Mb DRAM with TSVs, with an I/F chip as a memory controller. Simulation and measurement of the transfer function of the FTI wiring showed a 3-Gb/s/pin data transfer capability. 相似文献
78.
Fujisawa H. Nakamura M. Takai Y. Koshikawa Y. Matano T. Narui S. Usuki N. Dono C. Miyatake S. Morino M. Arai K. Kubouchi S. Fujii I. Yoko H. Adachi T. 《Solid-State Circuits, IEEE Journal of》2005,40(4):862-869
This paper describes three circuit techniques for a DDR1/DDR2-compatible chip architecture designed for both high-speed and high-density DRAMs: 1) a dual-clock input-latch scheme, which reduces the excessive timing margin for random input commands by using a pair of latch circuits controlled by dual-phase one-shot clock signals, achieves a 0.9-ns reduction in cycle time from 3.05 to 2.15 ns; 2) a hybrid multi-oxide output buffer reduces the area penalty of the output buffer caused by compatible chip design from 1.35% to 0.3%; and 3) a quasi-shielded distributed data transfer scheme enables a 2.6-ns reduction in access time to 10.25 ns in both 2-b and 4-b prefetch operations. By using these techniques, we developed a 175.3-mm/sup 2/ 1-Gb SDRAM that operates as an 800-Mb/s/pin DDR2 or 400-Mb/s/pin DDR1. 相似文献
79.
As the density and operating speed of complementary metal oxide semiconductor (CMOS) circuits increases, dynamic power dissipation has become a critical concern in the design and development—of personal information systems and large computers. The reduction of supply voltage, node capacitance, and switching activity are common approaches used in conventional CMOS. In adiabatic switching circuits, the current flow through transistors can be significantly reduced by ensuring uniform charge transfer over the entire available time. This paper presents the simulation of this current in two-phase clocked adiabatic static CMOS logic (2PASCL) and conventional CMOS. From the SPICE simulations, at transition frequencies from 1 to 12 MHz, a 4×4-bit array 2PASCL multiplier shows a maximum reduction in power dissipation of 77% relative to that of a static CMOS. The measurement results of a 4×4-bit array 2PASCL multiplier demonstrate a 57% reduction compared to a 4×4-bit array two-phase clocked adiabatic dynamic CMOS logic (2PADCL). These results indicate that 2PASCL technology can be advantageous when applied to low-power digital devices operated at low frequencies, such as radio-frequency identification (RFID) tags, smart cards, and sensors. 相似文献
80.
Shuich Fujii Yuko Fukawa Hiroaki Takahashi Yosuke Inomata Kenichi Okada Kenji Fukui Katsuhiko Shirasawa 《Solar Energy Materials & Solar Cells》2001,65(1-4)
In 1996 a conversion efficiency of 17.1% had been obtained on 15 cm×15 cm mc-Si solar cell. In this paper, large-scale production technology of the high-efficiency processing will be discussed. Enlarging reactive ion etching (RIE) equipment size, technology of passivation, and fine contact grid with low resistance by screenprinted metallization, which is firing through PECVD SiN, have been investigated. 相似文献