关于深冲薄钢板中的夹杂和成形性的商榷

对深冲薄钢板大生产的全工艺过程进行了跟踪，研究了ＷＹ０８ＡｌＡ薄钢板中Ａｌ＿２Ｏ＿３的形成，形态以及它们对冷轧成品的深冲性能和冲压小件的冲压成形废品率的影响。     

旋波媒质基本参数的一种测试方法

本文提出了直接利用旋波材料板的Ｓ参数获得其基本参数的方法。通过自由空间测量旋波材料板的反射场和透射场，可以反演得到媒质的复介电常数、复磁导率、旋波量以及透射场的轴比和旋转角，测试程序简单，结果精度高。     

The effects of plasma etching induced gate oxide degradation onMOSFET's 1/f noise

The effects of the plasma etching process induced gate oxide damages on device's low frequency noise behavior are investigated on MOSFET's fabricated with different field plate perimeter to gate area ratio antennas. Abnormal 1/f noise spectrum with a shoulder centered in the frequency range of 100 and to 1 kHz was frequently observed in small geometry devices, and it is attributable to a nonuniform distribution of oxide traps induced by plasma etching process     

Construction and utilization of rock caverns in Singapore Part D: Two proposed cavern schemes

This paper considers cavern schemes for crude oil storage and warehouse-shelter facilities. The crude oil storage scheme, which consists of five caverns, provides a net storage capacity for crude oil of 800,000 m³; the total cost for the facility, including civil construction, mechanical and electrical instrumentation, is in the order of S$80–100 million. The warehouse-shelter scheme consists of five storage caverns with combined storage capacity of 210,000 m³, and a defence shelter with capacity of 2000 persons. The cost for the warehouse-shelter scheme is S$66 million, including all mechanical and electrical utilities, systems for ventilation, fire prevention and smoke extraction, and pump installations for discharging leakage water.     

科学决策精心管理建好汾河二库

山西省是水问题非常突出的省份，充分利用水资源并消除水患，修建汾河二库是必要的，汾河二库总库容１．３３亿ｍ＾３，大坝碾压混土重力坝。二库建成后，其效益是多方面的，主要表现为：（１）防洪效益；（２）供水效益；（３）改善环境及利于养业，在设计中，对库区渗漏坝选择，基建面的确定，坝体布置，ＲＣＣ施工方法及防渗等技术问题，进行了重点研究，此外，对汾河二库工程建设的主要特点，即干旱气候条件下大仓面，全碾压，高     

非晶硅基薄膜的等离子体刻蚀光发射谱检测

本文研究了采用锁定放大相干检测技术的等离子体光发射谱检测系统。用该系统检测了仅用CF4作为刻蚀气体刻蚀非晶硅基薄膜的等离子体光发射谱。分析了检测结果和刻蚀机理。     

实用语音传感器

介绍了利用MCS-96单片计算机构成实用语音传感器的电路设计方案和配合该系统研究的语音识别方法以及实验结果等。     

薄膜磁头磁轭制备工艺研究

本文重点讨论了用不同的工艺方法来制备薄膜磁头中的关键元件-磁轭。采用多次光刻的方法克服湿法工艺中磁性膜NiFe层的侧向钻蚀问题，从而实现对磁轭几何尺寸的精确控制，并对几种工艺方法的优缺点作了比较详细的分析。