电荷耦合器件积分时间对微型成像系统成像质量的影响

在光圈固定的情况下，确定合适的积分时间对于提高微型电荷耦合器件(CCD)成像系统的成像质量，增强微型飞行器的侦察能力具有十分重要的意义。本文讨论了决定CCD积分时间的各种因素，重点研究了适用于微型飞行器的CCD成像系统的积分时间与像移的关系，并进一步推导了计算像移量的相关数学模型。利用该模型对不同积分时间内采集的运动图像进行了像质评价，结果表明，在保证曝光量的前提下，当像移量被限制在1个像素内时，可以获得相对理想的运动图像像质。     

Enhanced thermal stability of a sputtered titanium-nitride film as a diffusion barrier for capacitor-bottom electrodes

The effect of a thin RuO_x layer formed on the Ru/TiN/doped poly-Si/Si stack structure was compared with that on the RuO_x/TiN/doped poly-Si/Si stack structure over the post-deposition annealing temperature ranges of 450–600°C. The Ru/TiN/poly-Si/Si contact system exhibited linear behavior at forward bias with a small increase in the total resistance up to 600°C. The RuO_x/TiN/poly-Si/Si contact system exhibited nonlinear characteristics under forward bias at 450°C, which is attributed to no formation of a thin RuO_x layer at the RuO_x surface and porous-amorphous microstructure. In the former case, the addition of oxygen at the surface layer of the Ru film by pre-annealing leads to the formation of a thin RuO_x layer and chemically strong Ru-O bonds. This results from the retardation of oxygen diffusion caused by the discontinuity of diffusion paths. In particular, the RuO_x layer in a nonstoichiometric state is changed to the RuO₂-crystalline phase in a stoichiometric state after post-deposition annealing; this phase can act as an oxygen-capture layer. Therefore, it appears that the electrical properties of the Ru/TiN/poly-Si/Si contact system are better than those of the RuO_x/TiN/poly-Si/Si contact system.     

带隔板底水油藏油井临界产量计算公式

本给出了带隔板底水油藏油井的监界产量计算公式，它适用于所有带隔板底水油藏的油井。     

基于TC8830AF的智能语音卡结构与设计

本文描述一种基于８０３１单片机和ＴＣ８８３０ＡＦ语音处理器的ＰＣ机智能语音卡，通过软硬件设计解决了ＰＣ－８０３１－ＴＣ８８３０ＡＦ结构中的通讯问题。该语音卡在进行语音的合成、编辑和播放时，仅占用极少的ＰＣ机ＣＰＵ处理时间，能满足计算机系统进行实时语音合成的要求。     

GaN and AlGaN high-voltage rectifiers grown by metal-organic chemical-vapor deposition

In this paper, we report the study of the electrical characteristics of GaN and AlGaN vertical p-i-n junctions and Schottky rectifiers grown on both sapphire and SiC substrates by metal-organic chemical-vapor deposition. For GaN p-i-n rectifiers grown on SiC with a relatively thin “i” region of 2 μm, a breakdown voltage over 400 V, and forward voltage as low as 4.5 V at 100 A/cm² are exhibited for a 60-μm-diameter device. A GaN Schottky diode with a 2-μm-thick undoped layer exhibits a blocking voltage in excess of ∼230 V at a reverse-leakage current density below 1 mA/cm², and a forward-voltage drop of 3.5 V at a current density of 100 A/cm². It has been found that with the same device structure and process approach, the leakage current of a device grown on a SiC substrate is much lower than a device grown on a sapphire substrate. The use of Mg ion implantation for p-guard rings as planar-edge terminations in mesageometry GaN Schottky rectifiers has also been studied.     

Formation and growth mechanism of TiC crystal in TiC_p/Ti composites

1　ＩＮＴＲＯＤＵＣＴＩＯＮＰａｒｔｉｃｌｅｓｒｅｉｎｆｏｒｃｅｄｔｉｔａｎｉｕｍａｌｌｏｙｍａｔｒｉｘｃｏｍｐｏｓｉｔｅｓ(ＴＭＣｐ)ｈａｖｅｗｉｄｅａｐｐｌｉｃａｔｉｏｎｆｉｅｌｄｓｆｏｒｔｈｅｉｒａｔｔｒａｃｔｉｖｅｈｉｇｈｓｐｅｃｉｆｉｃｓｔｒｅｎｇ     

超高分子量聚乙烯的辐照效应

通过密度测定和ＤＳＣ热分析，观测了超高分子量聚乙烯的辐射效应。实验结果表明：在吸收剂量０—１．１３ＭＧｙ范围内，密度随吸收剂量的增加而增大，熔化热和熔点也有所增加，特别是在低剂量范围内增加十分明显。以上结果都说明，超高分子量聚乙烯在辐照过程中，结晶在完善或有新的结晶形成     

Asymmetric dilation of multiwavelength cross-connect switches forlow-crosstalk WDM optical networks

We predict that, for wavelength division multiplexing optical-network applications, an asymmetrically dilated configuration of a 2×2 cross-connect is significantly better in terms of overall crosstalk when the levels of the bar-port crosstalk and the cross-port crosstalk are significantly different from each other, as is the case with optical-frequency filters which utilize grating-assisted coupling. As a verification, we present a simulation study with 2×2 polarization-diversified acousto-optic tunable filters. We present a recursive method to extend the principle of asymmetric dilation to larger-size cross-connect switches, and make a recommendation for an asymmetrically dilated 4×4 cross-connect configuration