化工重大技术装备工作"十五"的成绩与"十一五"的任务

重大技术装备的制造水平是一个国家综合实力的直接体现,因此从上个世纪八十年代初开始,历届国务院领导人均兼任国家重大技术装备领导小组组长,通过推进重大技术装备的发展,促进     

单齿泵削角的优化设计

给出了单齿泵削角的优化模型与计算实例，并对理论设计与实验进行了比较分析。     

液闪测氡中闪烁杯的氡气泄漏

本文简要介绍了液闪测氡中氡气自闪烁杯泄漏的实验结果。实验中对三种玻璃闪烁杯盖的密封性能作了检查,结果表明,这三种闪烁杯均不能满足液闪法测氡中对氡的密封要求。采用一层1mm 厚的橡胶垫片和一层0.01mm 厚的铝化聚脂膜作衬垫,代替原来的聚乙烯或纸板衬垫,解决了其中两种闪烁杯的氡气泄漏问题。建议在使用商品闪烁杯测氡时,应首先检查其对氡的密封性,必要时需采取补救措施,以保证测量结果的可靠性。     

Nd3+ Doped Silicate Glass Photonic Crystal Fiber with Random Hole Distributions

The fabrication of one kind of large core area Nd3 doped silicate glass photonic crystal fiber, and demonstration of the fiber's waveguidence properties were reported. This fiber owns a random air hole distribution in the cladding. The measured minimum loss of this kind of fiber is 10 dB·m-1 at 660 nm. These fibers can sustain only a single mode at least over wavelength ranging from 660 nm to 980 nm.     

均三甲苯胺的合成及其应用

介绍了均三甲苯胺的合成工艺、反应机理、国内外产品的质量指标、提高质量与收率的途径,并对产品的应用作了讨论。     

Nickel and chromium cycles: Stocks and flows project part IV

Nickel and chromium are essential ingredients in alloys increasingly important for energy-efficient, environmentally friendly modern technology. Quantitative assessment of the flows of these metals through the world economy from resource extraction to final disposal informs resource policy, energy planning, environmental science, and waste management. This article summarizes the worldwide technological cycles of nickel and chromium in 2000. Stainless steel is the major use of these metals, but they serve numerous other special needs, as in superalloys for high-temperature service, as plating materials, and in coinage. Because they are used primarily in alloys, novel recycling issues arise as their use becomes more widespread. “... the great New York and St. Louis double track, nickel plated railroad...” — Norwalk, Ohio, Chronicle 10 March 1881 announces arrival of surveyors for the future Nickel Plate Railway “Later [1911] I formed an alloy of Iron and Chromium, which showed remarkable resistance to rust and tarnish ... [It was] rediscovered by an Englishman named Brearley, in 1914.” —Elwood Haynes to Stephen F. Roberts, 17 January 1925     

Influence of the silicon surface treatment by plasma etching and scratching on the nucleation of diamond grown in HFCVD - a comparative study

A comparative study for the nucleation of diamond was carried out using surface treatment like (i) surface scratching with 1 μm diamond paste and (ii) surface etching using chlorine plasma at different RF powers (50, 100 and 150 W). Atomic force microscopic study shows variation in roughness from 31 nm to 110 nm. Scratching results in random scratches, whereas plasma etches a surface uniformly. Scanning electron microscopic observations show well faceted crystallites with a predominance of angular shaped grains corresponding to 〈100〉 and 〈110〉 crystallite surfaces for the scratched as well as plasma etched substrate. Surface etching at 150 W plasma power results in a better growth in comparison with 50 and 100 W plasma powers. Chlorine-radical is found responsible for the changes in the growth morphology. Raman spectroscopy shows a sharp peak at 1,332 cm⁻¹ and a peak at ∼1,580 cm⁻¹ for both samples.