α-Fe_2O_3(SO_4~(2-),Sn)气敏电阻的温度响应特性

在气敏温度区域内研究了α-Fe_2O_3(SO_4~(2-),Sn)材料的电阻-温度特性,认为表面结构的变化导致温度特性出现峰值并呈现气敏性。可利用空气中电阻温度特性提供的信息改性或发现新的气敏材料。     

空间三重奏

设计的确是一项非常有趣的工作，就如同一位导演运用出色的技巧掌控有限的预算，为观众呈现令人回味的剧情，逼真的音效和异彩纷呈的视觉映像，这无疑是三个紧密相扣的环。     

Effect of polymerization conditions on o‐phenylenediamine and o‐phenetidine oxidative copolymers

A series of new o‐phenylenediamine (OPD)/o‐phenetidine (PHT) copolymers with partly phenazine‐like structures has been successfully synthesized at three polymerization temperatures by chemically oxidative polymerization in four different polymerization media. The molecular structures and properties of the resulting OPD/PHT polymers were investigated by IR, UV–vis and high‐resolution ¹H NMR spectroscopies, and DSC, in order to ascertain the effect of reaction temperature, comonomer ratio and acid medium. The copolymerization mechanism of OPD with PHT monomers has been proposed. It is found that the statistical OPD/PHT copolymer obtained at a temperature of 118 °C has a higher degree of polymerization than that obtained at 12–17 °C. The OPD content in the copolymers calculated from NMR spectroscopic analysis is higher than that in the feed OPD content, whereas the OPD content calculated from element analysis is slightly lower than the feed OPD content. It can be predicted that denitrogenation takes place in the OPD units during the polymerization process at OPD/PHT molar ratios of 90/10 and 100/0. These OPD/PHT copolymers exhibit a much better solubility than the OPD homopolymer, hence suggesting an incorporation of PHT units into the phenazine structure of the homopolymer. The thermal behavior of the copolymers was also studied. Copyright © 2004 Society of Chemical Industry     

热分析在PVA纤维预处理中的应用

用差热、热重法对原丝的热性能及由不同预处理方法所引起的PVA纤维的热行为变化进行了研究;并通过模拟脱水条件,用不同升温速率,求出了经不同预处理纤维的脱水反应活化能。结果表明,PVA原丝在230℃有一软化点,三种预处理都不同程度地影响了原丝的热效应变化;纤维在180～340℃主要为脱水反应;原丝及经脱水剂、O_3和O_3综合脱水剂处理的纤维,其脱水反应的表观活化能分别为:164.3kJ/mol,92.9kJ/mol,130.5kJ/mol和117.6kJ/mol。     

Nickel and chromium cycles: Stocks and flows project part IV

Nickel and chromium are essential ingredients in alloys increasingly important for energy-efficient, environmentally friendly modern technology. Quantitative assessment of the flows of these metals through the world economy from resource extraction to final disposal informs resource policy, energy planning, environmental science, and waste management. This article summarizes the worldwide technological cycles of nickel and chromium in 2000. Stainless steel is the major use of these metals, but they serve numerous other special needs, as in superalloys for high-temperature service, as plating materials, and in coinage. Because they are used primarily in alloys, novel recycling issues arise as their use becomes more widespread. “... the great New York and St. Louis double track, nickel plated railroad...” — Norwalk, Ohio, Chronicle 10 March 1881 announces arrival of surveyors for the future Nickel Plate Railway “Later [1911] I formed an alloy of Iron and Chromium, which showed remarkable resistance to rust and tarnish ... [It was] rediscovered by an Englishman named Brearley, in 1914.” —Elwood Haynes to Stephen F. Roberts, 17 January 1925     

跨越时空的瑞士USM模块式家具

USM模块式家具源自于瑞士．钢制的球是USM家具的主要连接器。球和钢管的精密结合是USM品牌的独创，由此就可演变出不同规格．不同造型的USM家具。     

Influence of the silicon surface treatment by plasma etching and scratching on the nucleation of diamond grown in HFCVD - a comparative study

A comparative study for the nucleation of diamond was carried out using surface treatment like (i) surface scratching with 1 μm diamond paste and (ii) surface etching using chlorine plasma at different RF powers (50, 100 and 150 W). Atomic force microscopic study shows variation in roughness from 31 nm to 110 nm. Scratching results in random scratches, whereas plasma etches a surface uniformly. Scanning electron microscopic observations show well faceted crystallites with a predominance of angular shaped grains corresponding to 〈100〉 and 〈110〉 crystallite surfaces for the scratched as well as plasma etched substrate. Surface etching at 150 W plasma power results in a better growth in comparison with 50 and 100 W plasma powers. Chlorine-radical is found responsible for the changes in the growth morphology. Raman spectroscopy shows a sharp peak at 1,332 cm⁻¹ and a peak at ∼1,580 cm⁻¹ for both samples.