Ultrafine-grained, and even nanostructured materials can be manufactured by ultra-high straining by equal-channel angular pressing (ECAP), high-pressure torsion (HPT), by machining, and through combinations, such as machining of ECAP specimens, HPT plus ECAP, and HPT of machining chips. This report describes the results of investigations of the microstructure and microtexture of pure aluminium and copper subjected to different deformation processes to high imposed strains. The microstructures, dislocation densities, and microhardness developed during combinations of different strain paths were investigated and all characteristics were analyzed by X-ray, transmission and scanning electron microscopy, and by orientation imaging microscopy. The influence of different processing routes is examined in terms of the accumulated strain and microstructure refinement. A saturation in grain refinement is also considered with reference to the occurrence of recovery during ultra-high strain deformation. 相似文献
Plasmonic Ag@ZnO core@shell nanoparticles are formed by synthesis inside helium droplets with subsequent deposition and controlled oxidation. The particle size and shape can be controlled from spherical sub-10 nm particles to larger elongated structures. An advantage of the method is the complete absence of solvents, precursors, and other chemical agents. The obtained particle morphology and elemental composition have been analyzed by scanning transmission electron microscopy (STEM) and energy dispersive X-ray spectroscopy (EDS). The results reveal that the produced particles form a closed and homogeneous ZnO layer around a 2–3 nm Ag core with a uniform thickness of (1.33 ± 0.15) nm and (1.63 ± 0.31) nm for spherical and wire-like particles, respectively. The results are supported by ultraviolet photoelectron spectroscopy (UPS), which indicates a fully oxidized shell layer for the particles studied by STEM. The plasmonic properties of the produced spherical Ag@ZnO core@shell particles are investigated by two-photon photoelectron (2PPE) spectroscopy. Upon excitation of the localized surface plasmon resonance in Ag at around 3 eV, plasmonic enhancement leads to the liberation of electrons with high kinetic energy. This is observed for both Ag and Ag@ZnO particles, showing that even if a Ag cluster is covered by the ZnO layer, a plasmonic enhancement can be observed by photoelectron spectroscopy.
The analysis of the Er-doped silica glass films (62%SiO2–30%B2O3–8%P2O5 + 0.2 wt%. Er2O3) etch mechanism in the CF4/O2 inductively coupled plasma was carried out using the combination of simplified models for plasma chemistry and etch kinetics.
As the O2 mixing ratio in the CF4/O2 plasma increases from 0% to 30%, the etch rate decreases monotonically in the range of 385–190 nm/min that contradicts with
the behavior of F atom density and flux. From the model-based analysis, it was found that, at low ion bombardment energies,
the etch process followed the formal kinetics of ion-assisted chemical reaction and was controlled by both neutral and ion
fluxes. 相似文献