Simulation and fabrication of submicron channel length DMOStransistors for analog applications

The use of an asymmetric MOS structure for superior analog circuit performance is considered. Results from the fabrication of 1-μm-gate length DMOS transistors show increases of up to 1.9 in transconductance, 10 in output resistance, and 8 in intrinsic gain when compared to NMOS structures of similar gate length and threshold voltage. Substrate current is also reduced by up to a factor of 10. This represents the first reported results of submicron channel length DMOS transistors. The standard 7° implantation angle has significant impact on DMOS fabrication and is shown to produce a usable asymmetric DMOS from an otherwise symmetric DMOS. An optimal implant energy and diffusion time are shown to exist for DMOS enhancement region formation. Two-dimensional process and device simulators have proved necessary to develop the DMOS process, as well as to qualitatively explain body effect reduction and threshold voltage determination. The DMOS process has successfully yielded experimental circuits including a single ended operational amplifier of folded cascode technology and a 101-state ring oscillator     

P-MOSFET's with ultra-shallow solid-phase-diffused drain structureproduced by diffusion from BSG gate-sidewall

A p-MOSFET structure with solid-phase diffused drain (SPDD) is proposed for future 0.1-μm and sub-0.1-μm devices. Highly doped ultrashallow p⁺ source and drain junctions have been obtained by solid-phase diffusion from a highly doped borosilicate glass (BSG) sidewall. The resulting shallow, high-concentration drain profile significantly improves short channel effects without increasing parasitic resistance. At the same time, an in situ highly-boron-doped LPCVD polysilicon gate is introduced to prevent the transconductance degradation which arises in ultrasmall p-MOSFETs with lower process temperature as a result of depletion formation in the p⁺-polysilicon gate. Excellent electrical characteristics and good hot-carrier reliability are achieved     

Scaling theory for double-gate SOI MOSFET's

A scaling theory for double-gate SOI MOSFETs, which gives guidance for device design (silicon thickness t_si; gate oxide thickness t_ox) that maintains a subthreshold factor for a given gate length is discussed. According to the theory, a device can be designed with a gate length of less than 0.1 μm while maintaining the ideal subthreshold factor. This is verified numerically with a two-dimensional device simulator     

Singlemode surface emitting laser using partial mirror disordering

A vertical cavity surface emitting semiconductor laser is described which uses zinc diffusion and partial disordering of the epitaxial output mirror to provide waveguiding for lateral mode control. Mode suppression ratios against higher order transverse modes as high as 36 dB have been observed.<>     

Triple-channel InP-based HEMT with highly nonlinear transconductance for nonlinear circuit applications

The authors report the development of a triple-channel HEMT with two undoped In/sub 0.53/Ga/sub 0.47/As layers and a spike-doped In/sub 0.52/Al/sub 0.48/As layer on InP, designed to have a strongly nonlinear transconductance. The effective electron velocity and the electron density in the InGaAs layers are higher than in the thick InAlAs layer resulting in a highly nonlinear transconductance device with the potential for improved performance in nonlinear microwave circuit applications, as compared with conventional MESFETs and HEMTs.<>     

4*4 directional coupler switch matrix with an InGaAlAs/InAlAs multiquantum well structure

A 4*4 directional coupler switch matrix is developed which uses, for the first time, the quantum confined Stark effect of InGaAlAs/InAlAs multiquantum well structures. The rearrangeable nonblocking 4*4 network with six 2*2 switches is shown to be perfectly functional with switching voltages between 5 and 6 V and crosstalk below -17 dB in all the operation states.<>     

Generalized concatenated codes for channels where unidirectionalbyte errors are predominant

Codes are considered for correction and detection of unidirectional byte errors. A code construction based on the generalized concatenated code construction is proposed. This construction gives a large number of efficient codes. For example, from this construction, a 72-input-bit encoder of the triple unidirectional 8-bit-byte error-correcting and fourfold unidirectional 8-bit-byte error-detecting code with a length of 112 bits and rate 9/14 is obtained, whereas the ordinary triple 8-bit-byte error-correcting and fourfold 8-bit-byte error-detecting code of the same length has only 56 information bits and is of rate 1/2. The proposed construction is generalized to one that gives efficient short-length codes     

Wideband and high-power compressively strained GaInAsP/InPmultiple-quantum-well ridge waveguide lasers emitting at 1.3 μm

Compressively strained 1.3-μm GaInAsP/InP multiple-quantum-well (MQW) ridge waveguide lasers were fabricated. Through optimizing the total well thickness, large bandwidth over 11 GHz was achieved, together with high quantum efficiency of about 0.48 W/A and high power output of 60 mW before rollover. The laser also showed less temperature sensitivity up to an elevated temperature of 85°C     

Highly efficient configuration of a Pr3+-doped fluoridefiber amplifier module with an optical circulator

A highly efficient Pr³⁺-doped fluoride fiber amplifier configuration with an optical circulator, in which the input signal light is amplified both forward and backward through a Pr³⁺-doped fluoride fiber, is investigated with a view to decreasing the drive current and improving the reliability of pump laser diodes (LD's). With this double-path configuration, a 25-dB signal gain is achieved at an LD drive current of 110 mA. This LD drive current is about half that needed for a conventional single-path configuration. It is also found that this double-path configuration provides a double-gain coefficient, a slightly low saturation power, and a slightly narrow spectral gain width     

Concentration-dependent 4I13/2 lifetimes inEr3+-doped fibers and Er3+-doped planar waveguides

We report on the concentration- and pump-dependent lifetimes of the spontaneous emission in Er³⁺-doped fibers and Er³⁺ -doped waveguides. In addition, we measure the concentration dependence of the 550-nm fluorescence due to excited state absorption (ESA)