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Yi Song Huajie Zhou Qiuxia Xu Jun Luo Haizhou Yin Jiang Yan Huicai Zhong 《Journal of Electronic Materials》2011,40(7):1584-1612
The aggressive downscaling of complementary metal–oxide–semiconductor (CMOS) technology to the sub-21-nm technology node is
facing great challenges. Innovative technologies such as metal gate/high-k dielectric integration, source/drain engineering, mobility enhancement technology, new device architectures, and enhanced
quasiballistic transport channels serve as possible solutions for nanoscaled CMOS. Among them, mobility enhancement technology
is one of the most promising solutions for improving device performance. Technologies such as global and process-induced strain
technology, hybrid-orientation channels, and new high-mobility channels are thoroughly discussed from the perspective of technological
innovation and achievement. Uniaxial strain is superior to biaxial strain in extending metal–oxide–semiconductor field-effect
transistor (MOSFET) scaling for various reasons. Typical uniaxial technologies, such as embedded or raised SiGe or SiC source/drains,
Ge pre-amorphization source/drain extension technology, the stress memorization technique (SMT), and tensile or comprehensive
capping layers, stress liners, and contact etch-stop layers (CESLs) are discussed in detail. The initial integration of these
technologies and the associated reliability issues are also addressed. The hybrid-orientation channel is challenging due to
the complicated process flow and the generation of defects. Applying new high-mobility channels is an attractive method for
increasing carrier mobility; however, it is also challenging due to the introduction of new material systems. New processes
with new substrates either based on hybrid orientation or composed of group III–V semiconductors must be simplified, and costs
should be reduced. Different mobility enhancement technologies will have to be combined to boost device performance, but they
must be compatible with each other. The high mobility offered by mobility enhancement technologies makes these technologies
promising and an active area of device research down to the 21-nm technology node and beyond. 相似文献
63.
热力学研究得出:当系统残余压力为100~10 Pa时,SiO2与碳反应在1465~1353 K以上即可生成Si和CO;在1329~1225 K以上即可生成SiC和CO;SiO2和还原剂碳及氟化铝在1464~1353 K以上反应生成SiF4和CO及铝。实验考察了真空低价氟化法炼铝过程中SiO2的分布。XRD表明:SiO2在低价氟化法炼铝过程中有五种走向:(1)被还原成SiC,存在于残渣相;(2)被还原为单质硅,再与还原出的铁生成硅铁,存在于残渣相;(3)SiO2与冰晶石生成铝硅酸盐进入气相中;(4)SiO2与冰晶石生成气态SiF4,再与冰晶石分解的氟化钠形成Na2SiF6进入冷凝相;(5)形成气态低价氧化硅,再在合适温度下分解为单质硅进入冷凝相。 相似文献
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我国目前没有关于社会保障的基本法,也没有关于农村社会养老保险的单独立法.现有的关于农村养老保险问题的立法层级单一、位阶较低,制约了我国农村养老保险制度的完善及效用的发挥.完善农村社会养老保险制度,需要从完善立法开始. 相似文献
65.
为了探究英国红芸豆抗氧化肽组分的抗氧化作用,采用超滤、葡聚糖凝胶G-15层析技术对碱性蛋白酶酶解英国红芸豆抗氧化蛋白质制备的抗氧化产物进行分级,研究抗氧化活性较高的组分对H2O2损伤的PC12细胞的影响。结果表明:抗氧化肽组分BRKBAPC-2能缓解H2O2对PC12造成的细胞生长抑制作用,随着肽浓度的提高,细胞内活性氧(ROS)水平,丙二醛(MDA)含量及乳酸脱氢酶(LDH)胞外活力均有所降低,超氧化物歧化酶(SOD)、过氧化氢酶(CAT)活力以及还原型谷胱甘肽(GSH)含量均具有所提高,尤其BRKBAPC-2浓度为200 μg/mL时,ROS水平为32.53%,MDA含量为0.96 nmol/μg prot,LDH胞外活力为202.12 U/L,与模型组相比,均极显著降低(P<0.01);SOD活力为(555.48±3.64)U/mg prot,CAT活力为(14.77±1.30)U/mL,GSH含量为(140.88±8.19)μmol/g prot,与模型组相比,均极显著提高(P<0.01),此外,其可抑制线粒体膜电位的降低,改善细胞周期的阻滞情况,阻止细胞凋亡关键酶Caspase-3和Caspase-9的激活。可见,抗氧化肽组分BRKBAPC-2对H2O2引起的PC12细胞氧化损伤具有一定的保护作用。 相似文献
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The novel red-emitting phosphors K2Ba(MoO4)2: Eu3+, Sm3+ were prepared by solid-state reaction and their crystal structures, photo luminescent characteristics were investigated. The results show that all samples can be excited efficiently by UV (397 nm) and blue (466 nm) light, which are coupled well with the characteristic emission from UVLED and blue LED, respectively. A small amount of Sm3+, acting as a sensitizer, increased the energy absorption around 400 nm. In the Eu3+-Sm3+ co-doped system, both Eu3+ and Sm3+ f-f transition absorptions are observed in the excitation spectra, the intensities of the main emission line (5D0 → 7F2 transition of Eu3+ at 616 nm) are strengthened because of the energy transition from Sm3+ to Eu3+. The doping concentration of Eu3+-Sm3+ was optimized. The approach to charge compensation was used: Ba2+ → Eu3+/Sm3+ + X− (X = F, Cl, and Br), and the influence of charge compensation on the luminescent intensity of phosphors is investigated. 相似文献
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