降低过滤机滤饼水分和细粒煤脱水浅析

根据对选煤厂细粒煤样的实验室优化脱水试验、工业试验及分析结果 ,对真空系统、气水分离器和分配头实施了技术改造 ,细粒煤脱水系统的运行状况得到显著改善 :圆盘真空过滤机滤饼水分降到 2 0 %左右 ,脱饼率在 95 %以上 ,每年的直接经济效益可达 30 0多万元     

Nickel and chromium cycles: Stocks and flows project part IV

Nickel and chromium are essential ingredients in alloys increasingly important for energy-efficient, environmentally friendly modern technology. Quantitative assessment of the flows of these metals through the world economy from resource extraction to final disposal informs resource policy, energy planning, environmental science, and waste management. This article summarizes the worldwide technological cycles of nickel and chromium in 2000. Stainless steel is the major use of these metals, but they serve numerous other special needs, as in superalloys for high-temperature service, as plating materials, and in coinage. Because they are used primarily in alloys, novel recycling issues arise as their use becomes more widespread. “... the great New York and St. Louis double track, nickel plated railroad...” — Norwalk, Ohio, Chronicle 10 March 1881 announces arrival of surveyors for the future Nickel Plate Railway “Later [1911] I formed an alloy of Iron and Chromium, which showed remarkable resistance to rust and tarnish ... [It was] rediscovered by an Englishman named Brearley, in 1914.” —Elwood Haynes to Stephen F. Roberts, 17 January 1925     

Influence of the silicon surface treatment by plasma etching and scratching on the nucleation of diamond grown in HFCVD - a comparative study

A comparative study for the nucleation of diamond was carried out using surface treatment like (i) surface scratching with 1 μm diamond paste and (ii) surface etching using chlorine plasma at different RF powers (50, 100 and 150 W). Atomic force microscopic study shows variation in roughness from 31 nm to 110 nm. Scratching results in random scratches, whereas plasma etches a surface uniformly. Scanning electron microscopic observations show well faceted crystallites with a predominance of angular shaped grains corresponding to 〈100〉 and 〈110〉 crystallite surfaces for the scratched as well as plasma etched substrate. Surface etching at 150 W plasma power results in a better growth in comparison with 50 and 100 W plasma powers. Chlorine-radical is found responsible for the changes in the growth morphology. Raman spectroscopy shows a sharp peak at 1,332 cm⁻¹ and a peak at ∼1,580 cm⁻¹ for both samples.     

端羟基聚乳酸微球的制备与降解

以1,4-丁二醇和D,L-乳酸为原料,经缩合聚合法制备了端羟基聚乳酸,并用溶剂挥发法制备了端羟基聚乳酸微球.考察了乳化剂浓度、油水相比例及聚乳酸浓度对微球平均粒径和形貌的影响,并在pH=7.4缓冲溶液中进行了微球的降解.结果表明以二氯甲烷为溶剂,PVA作为乳化剂,室温和600r/min搅拌速度下可制得平均粒径0.5-1.0m的较均匀的、表面平滑的端羟基聚乳酸微球.随着在pH=7.4下降解时间增加,微球表面变得粗糙.     

纸张用有机硅抗水剂的制备

采用氨基硅油、十二烷基三甲氧基硅烷、甲基三乙氧基硅烷配成11种抗水剂,用于纸张的抗水处理.通过渗透法和接触角法测试发现,有机硅抗水剂对实验选择的9种纸张均有明显的抗水效果;其中采用氨基硅油配制的抗水剂效果最好,经其处理的生宣纸与空白样相比,接触角由完全润湿提高到125°,渗透时间由0提高到18 s.最佳应用工艺为:将氨基硅油配制成质量分数为2.041%的甲苯溶液,按照10g/m2的涂布量喷涂于纸张表面,自然晾干3～5天至恒定质量.