Effect of shape on the radiation-stimulated deformation of crystals

Translated from Atomnaya Énergiya, Vol. 66, No. 3, pp. 208–209, March, 1989.     

Phosphine-induced sterility in Ephestia cautella (Lepidoptera: Pyralidae)

The present study was conducted to explore the sterilizing effect of phosphine on Ephestia cautella. Three to four-day old pupae were exposed to 0, 0.007, 0.014, 0.021, 0.028, 0.035, 0.042 and 0.049 mg/l of phosphine for 24 h at room temperature. The normally developed adults of each treatment were pair mated and several physiological and genetical parameters were investigated. The results showed gradual increases with dose in pupal mortality and adult malformation. The crossing results showed no changes in adult longevity and mating frequency. However, consistent reduction was noted in the fecundity and fertility of normally emerged adults. Preliminary data indicated similar levels of inherited sterility in the F₁ adults raised from the above mentioned crosses.     

Micro-RBS characterisation of the chemical composition and particulate deposition on pulsed laser deposited Si1−xGex thin films

The formation and deposition of particulates by pulsed laser deposition of Si_1−xGe_x semiconductor alloy thin films are discussed. Using Rutherford backscattering spectrometry with micrometer lateral resolution (micro-RBS) the film composition was measured with high accuracy, even in the presence of particulates with a high areal density of 20,000–30,000 particulates per mm². We show that on impact of a particulate, the part of the thin film which is already deposited probably melts and its Ge content segregates to the surface.     

Methods for Estimating Theoretically the Influence of Ion Scattering and Reflection on the Isotopic Sensitivity of Static Magnetic Mass-Spectrometers

For purposes of optimizing ion-optical systems, analyzer construction, and pump placement in static magnetic mass-spectrometers for isotopic analysis of uranium compounds, a comparative analysis is made and a review is given of methods described in the literature for theoretical estimates of the influence of scattering and reflection of ions on the isotopic sensitivity. Conclusions which make it possible to solve the problem are drawn.     

Making combination drawing methods more efficient by controlling tool microroughness

Results are presented from extensive comparison studies of drawing operations performed with the use of drawplates whose working surfaces have an irregular or regular microroughness. Regularizing the microroughness of the working part of the drawplate makes it possible to control the dimensional accuracy of the resulting products within broad ranges of values.     

Calcium and phosphorus levels as indices of textured milk proteins being substituted for meat proteins

Textured milk proteins were tested in a meat model system with an exchange level of 34-87% of the meat proteins. The correlation between the substitution index and the calcium and phosphorus content was statistically significant.     

Modeling phosphorus in the upper Etowah River basin: identifying sources under uncertainty.

The Uniform Covering by Probabilistic Rejection (UCPR) algorithm was used, in conjunction with the Soil and Water Assessment Tool (SWAT) model, to identify P loads from point source and nonpoint source polluters in the upper Etowah River basin (UERB) in Georgia. The key findings of the research are as follows. The mean absolute error was preferred over the root mean square error as a search criterion for the UCPR algorithm when water quality observations are scarce. The undocumented P load from point sources in the UERB was consistently estimated as about 43 kg/d by the proposed method; but the method was not able to identify the broiler litter application rate to the poultry/beef operation pastures. Point sources (both documented and undocumented), poultry/beef operation pastures, and forests are the three major contributors of P. During 1992-1996, on average they accounted for 36.4, 31.7, and 17.2% of P load from the UERB, respectively.     

A comparative study on the effect of VUV radiation in plasma SiOx-coated polyimide and polypropylene films

Wettability of polyimide (PI) and polypropylene (PP) films have been improved using SiO_x-like thin layers deposited from a mixture of hexamethyldisiloxane (HMDSO) and oxygen in a microwave distributed electron cyclotron resonance plasma reactor. The films wettability evolution behaviors were evaluated through the results of contact angle measurements, atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The plasma depositions of SiO_x thin layers in presence of VUV radiation induce a contact angle decrease to about 7° and 35° for PI and PP films, respectively. XPS data showed that such difference in wettability is attributed to the increase of hydrophilic group's proportion at the surface of coated PI films due to VUV irradiation. AFM images showed that the PI surface topography remains relatively smooth when coated in presence of VUV radiation. However, in the case of PP films, AFM images revealed the growth of irregular structure due to a substrate etching effect supported by VUV radiation. For polymers coated without VUV irradiation, the deconvolution of the C1s peaks showed a significant decrease of CO bonds for both PI and PP substrates.     

La doping effects on intergrowth Bi2WO6–Bi3TiNbO9 ferroelectrics

La doping effects on intergrowth Bi₂WO₆–Bi₃TiNbO₉ ferroelectric ceramics were studied by X-ray diffraction, electron probe microanalysis and dielectric spectroscopy. It was found that the La³⁺ distribution, ferroelectric phase transition and dielectric relaxation behavior are apparently affected by La doping. With increasing La³⁺ content, the site of dopant ion varies, the grain growth of Bi₅TiNbWO₁₅ is restrained, the Curie temperature is reduced and broadened. Furthermore, two dielectric relaxation loss peaks were observed both in temperature and frequency spectra. The calculated relaxation parameters revealed the oxygen vacancy related to the relaxation process.