阳离子型偶联表面活性剂改性硝酸铵性能研究

对阳离子型偶联表面活性剂膨化处理的改性硝酸铵进行了电镜扫描、孔径与孔容分布、粒径分布、比表面积、抗吸湿结块性及爆炸性能的实验研究，结果表明：同普通硝酸铵相比，阳离子型偶联改性硝酸铵的晶形不规则，富含气孔；比表面积大，可达3869．56cm^2／g；95％有效孔径处于介孔范围，有较小的粒径范围，主要分布在10～1000μm范围内；并且有良好的抗吸湿结块性，改性硝酸铵的吸湿率比普通硝酸铵的吸湿率降低约60％，抗压破坏力仅为普通硝酸铵的1／6，用其制得的粉状工业炸药具有更好的物理性能和爆炸性能。     

无机物——聚醋酸乙烯复合乳液粒子结构及主要性能

本文对均聚醋酸乙烯乳液及其与无机物的混合物,无机物——聚醋酸乙烯复合乳液的粒子结构进行了比较,阐述了复合乳液的主要性能。     

Industrial TiO2 based nacreous pigments as functional building materials: Photocatalytic removal of NO

In this paper, the photocatalytic activity of industrial titanium dioxide (TiO₂) based nacreous pigments was researched as functional building materials for photocatalytic NO remove. Three industrial TiO₂ based nacreous pigments were selected to estimate the photocatalytic activity for NO remove. This study is a good proof that pearlescent pigments can eliminate NO, and its performance is positively correlated with its titanium dioxide content. And this research will widen the application of nacreous pigments in functional building materials, and provide a new way to eliminate in door nitric oxide pollution.     

硅压阻式气压高度计的设计与实现

采用硅压阻式压力传感器,以ATmega88PA为控制器设计了气压高度计。内嵌全温度范围的曲面拟合算法进行温度补偿及线性化处理,解决了压力传感器的温漂和非线性问题,并用海拔高度与气压的关系计算高度。测量结果通过RS-485接口发送给上位机。测试结果表明,该气压高度计压力测量误差优于0.50‰,分辨率为0.01 h Pa,线性度为0.999 9;标准大气环境下高度测量误差为0.16 m,线性度为0.999 8。该气压高度计具有质量小、功耗低、精度高、工作可靠等优点。     

影响裂解汽油二段加氢催化剂长周期运转因素及解决措施

从裂解汽油二段加氢催化剂性能、裂解汽油和操作条件等方面论述了影响该催化剂长周期运转的因素,并针对这些因素提出相应的措施,以达到延长催化剂运转周期的目的。     

OpenMDSP: Extending OpenMP to Program Multi-Core DSPs

Abstract Multi-core digital signal processors （DSPs） are widely used in wireless telecommunication, core network transcoding, industrial control, and audio/video processing technologies, among others. In comparison with general-purpose multi-processors, multi-core DSPs normally have a more complex memory hierarchy, such as on-chip core-local memory and non-cache-coherent shared memory. As a result, efficient multi-core DSP applications are very difficult to write. The current approach used to program multi-core DSPs is based on proprietary vendor software development kits （SDKs）, which only provide low-level, non-portable primitives. While it is acceptable to write coarse-grained task-level parallel code with these SDKs, writing fine-grained data parallel code with SDKs is a very tedious and error-prone approach. We believe that it is desirable to possess a high-level and portable parallel programming model for multi-core DSPs. In this paper, we propose OpenMDSP, an extension of OpenMP designed for multi-core DSPs. The goal of OpenMDSP is to fill the gap between the OpenMP memory model and the memory hierarchy of multi-core DSPs. We propose three classes of directives in OpenMDSP, including 1） data placement directives that allow programmers to control the placement of global variables conveniently, 2） distributed array directives that divide a whole array into sections and promote the sections into core-local memory to improve performance, and 3） stream access directives that promote big arrays into core-local memory section by section during parallel loop processing while hiding the latency of data movement by the direct memory access （DMA） of a DSP. We implement the compiler and runtime system for OpenMDSP on PreeScale MSC8156. The benchmarking results show that seven of nine benchmarks achieve a speedup of more than a factor of 5 when using six threads.     

计算思维影响下的应用型本科计算机基础教学改革探索

当前以计算思维能力培养为切入点的大学计算机课程改革工作已进入一个新的阶段,如何改革计算机基础教学以适应当前形势的发展,是计算机基础教学面临的挑战。以计算思维为导向,对应用型本科院校大学计算机基础课程的目标定位、教学内容、教学过程等教学环节作改革式探索。     

Experience in pressing standard brick from clays and kaolins in thermoplastic state

Conclusions The pressing of argillaceous raw material reduced to a thermoplastic state by heating produces ultradense refractory of high quality.Standard brick made of 50% Vladimirovka kaolin, 3-1 mm, and 50% Chasov-Yar clay finer than 0.5 mm, pressed to 100 kg/cm² and at about 1380°, containing 40% Al₂O₃, shows a high degree of slag resistance and spalling resistance, and has an apparent porosity of 3% bulk density 2.52 g/cm³.     

Integrated UV-based photo microreactor-distillation technology toward process intensification of continuous ultra-high-purity electronic-grade silicon tetrachloride manufacture

Ultra-high-purity silicon tetrachloride (SiCl₄) is demanded as an electronic-grade chemical to meet the stringent requirements of the rapidly developing semiconductor industry. The high requirement for ultra-high-purity SiCl₄ has created the need for a high-efficient process for reducing energy consumption as well as satisfying product quality. In this paper, a mass of production technology of ultra-high-purity SiCl₄ was successfully developed through chlorination reaction in the ultraviolet (UV)-based photo microreactor coupled with the distillation process. The influences of key operational parameters, including temperature, pressure, UV wavelength and light intensity on the product quality, especially for hydrogen-containing impurities, were quantified by the infrared transmittance of Fourier transform infrared spectroscopy (FT-IR) at 2185 cm^-1 and 2160 cm^-1 indicating that characteristic vibrational modes of Si—H bonds, as well as the operating conditions of distillation were also investigated as key factors for metal impurities removing. The advanced intensification of SiCl₄ manufactured by the integration of photo microreactor and distillation achieves the products with superior specifications higher than the standard commercial products.     

Integrated UV-based photo microreactor-distillation technology toward process intensification of continuous ultra-high-purity electronic-grade silicon tetrachloride manufacture

Ultra-high-purity silicon tetrachloride (SiCl₄) is demanded as an electronic-grade chemical to meet the stringent requirements of the rapidly developing semiconductor industry. The high requirement for ultra-high-purity SiCl₄ has created the need for a high-efficient process for reducing energy consumption as well as satisfying product quality. In this paper, a mass of production technology of ultra-high-purity SiCl₄ was successfully developed through chlorination reaction in the ultraviolet (UV)-based photo microreactor coupled with the distillation process. The influences of key operational parameters, including temperature, pressure, UV wavelength and light intensity on the product quality, especially for hydrogen-containing impurities, were quantified by the infrared transmittance of Fourier transform infrared spectroscopy (FT-IR) at 2185 cm⁻¹ and 2160 cm⁻¹ indicating that characteristic vibrational modes of SiH bonds, as well as the operating conditions of distillation were also investigated as key factors for metal impurities removing. The advanced intensification of SiCl₄ manufactured by the integration of photo microreactor and distillation achieves the products with superior specifications higher than the standard commercial products.