Precision of quantization of the hall conductivity in a finite-size sample: Power law

A microscopic calculation of the conductivity in the integer quantum Hall effect (IQHE) mode is carried out. The precision of quantization is analyzed for finite-size samples. The precision of quantization shows a power-law dependence on the sample size. A new scaling parameter describing this dependence is introduced. It is also demonstrated that the precision of quantization linearly depends on the ratio between the amplitude of the disorder potential and the cyclotron energy. The data obtained are compared with the results of magnetotransport measurements in mesoscopic samples.     

Nanoscale Crystallization in Amorphous Fe–P–Mn Alloys

Mössbauer effect measurements and physicochemical analysis demonstrate that annealing of amorphous Fe–P–Mn alloys leads to the formation of a nanocrystalline structure.     

A Donor–Acceptor Polymer with a Peculiar Negative‐Charge‐“Trapping” Characteristic

Voltammetric and spectrophotometric measurements of poly(3,3″‐dipentoxy‐3′‐dicyanoethenyl‐2,2′:5′,2″‐terthiophene) (polyCN) films, in connection with other experimental evidence, reveal a normal oxidative, but a peculiar reductive behavior consisting of trapping of the negative charge during the cathodic scan. Another interesting property of polyCN films is the tendency to form strong intramolecular and intermolecular associations, probably charge‐transfer (CT) complexes. These properties could account for the fact that the photovoltaic performance does not improve when polyCN is blended with a polythiophene donor.     

An effective compact analyzer of electron spin polarization

A compact electron polarimeter employing the classical Mott scheme has been developed and tested. The device has an efficiency of about 5.6×10⁻⁴, a maximum count rate of 5×10⁵ cps, dimensions 15 cm (diameter) × 25 cm (length), and a working voltage of 40 kV. The polarimeter can operate for a long time under arbitrary vacuum conditions without maintenance, exhibiting no changes in the main working characteristics, and obeys all requirements to the electron spin polarization studies on the modern level.     

Surface effects in nanocrystalline silicon

Exposure to ammonia (NH₃) increases the dark current (DC) in nanocrystalline silicon. Light soaking (LS) for short periods also enhances the dark current, which remains at a high value for a long time. Pumping alone is unable to restore the initial annealed state, but annealing brings it back. The final state obtained by LS and NH₃ exposure depends on the order in which they are performed. Evaporated selenium (Se) deposited on nanocrystalline silicon decreases the DC. These effects cannot be explained entirely by the presence of a-Si : H alone, in our sample. DC and photoluminescence (PL) measurements indicate the presence of two types of center in our sample, which behave differently when exposed to NH₃.     

Planar lightwave integrated circuits with embedded actives for board and substrate level optical signal distribution

This paper explores design options for planar optical interconnections integrated onto boards, discusses fabrication options for both beam turning and embedded interconnections to optoelectronic devices, describes integration processes for creating embedded planar optical interconnections, and discusses measurement results for a number of integration schemes that have been demonstrated by the authors. In the area of optical interconnections with beams coupled to and from the board, the topics covered include integrated metal-coated polymer mirrors and volume holographic gratings for optical beam turning perpendicular to the board. Optical interconnections that utilize active thin film (approximately 1-5 /spl mu/m thick) optoelectronic components embedded in the board are also discussed, using both Si and high temperature FR-4 substrates. Both direct and evanescent coupling of optical signals into and out of the waveguide are discussed using embedded optical lasers and photodetectors.     

Measurement and Identification of the Parameters of SPICE-Models of a Bipolar Transistor

A method of measuring and identifying the static parameters of a bipolar transistor is considered. The characteristic of the transistor, from which the parameters of the model are determined, is chosen depending on what group the calculated parameters belong to. The characteristics are measured in such a way that the equations of the model describing them can be reduced to the simplest form.     

Control of polishing of diamond films using microactuation and an atmospheric pressure plasma

In this work, the diamond deposited by hot filament chemical vapor deposition (CVD) is polished using an atmospheric pressure plasma. In order to position the film relative to the plasma, a microactuator system is designed using a stack of domed piezoelectric actuators. A dynamic model based on the physical system is developed and the model parameters are measured experimentally. A system based on laser triangulation is used to measure the position of the diamond film relative to the plasma. Control techniques are used to reduce the oscillations during actuation and to eliminate the steady state positioning error. With the application of feedback control, the overshoot is reduced to 2% and the settling time is reduced to 0.3 s. A preliminary set of experiments is performed to relate process parameters to the final surface roughness of the diamond film. The parameters studied include the film's time of exposure to the plasma, the height of the film relative to the plasma, and the distance from the film to the center of the plasma. It is found that the optimum exposure time is 15 min and the reduction of surface roughness is greatest when the distance between the film and the plasma is at a minimum. The best results are obtained when the top of the film is even in elevation with the tip of the top electrode. The diamond film is translated laterally along the plasma. When feedback control is not used, there is no change in the surface roughness. With feedback control implemented, the surface roughness of the diamond film is reduced by 33%.     

X-ray or UV adjustment of MOS threshold voltage: Analytical and numerical modeling

A model is formulated that describes how radiation-induced charge accumulates in the gate oxide of a MOS structure and how it decays through tunneling and thermal emission. The model is used in a numerical analysis of the x-ray or UV adjustment of threshold voltage in MOS-circuit manufacture. The limits of this process technique are evaluated.