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排序方式: 共有10000条查询结果,搜索用时 15 毫秒
981.
Ferdinand P. Ferragu O. Lechien J.L. Lescop B. Magne S. Marty V. Rougeault S. Kotrotsios G. Neuman V. Depeursinge Y. Michel J.B. Van Uffelen M. Varelas D. Berthou H. Pierre G. Renouf C. Jarret B. Verbandt Y. Stevens W. Voet M.R.H. Toscano D. 《Lightwave Technology, Journal of》1995,13(7):1303-1313
Recent developments of stability control in mines, essentially based on Ge-doped fiber Bragg gratings (FBG) are reported including results about the different aspects of the system: accurate characterizations of FBG, sensor network topology and multiplexing method, user interface design and sensor packaging 相似文献
982.
2-D dopant profiling in VLSI devices using dopant-selectiveetching: an atomic force microscopy study
We report a detailed mapping of a 2-D dopant profile on a fully processed industrial sample with large dynamic range and high spatial resolution by utilizing a dopant-selective etching process and Atomic Force Microscopy. The experimental results show excellent agreement with those obtained from SRP and SIMS as corroborative methods. We also discuss the most critical factors which influence the applicability, reproducibility, and reliability of this method 相似文献
983.
984.
985.
986.
Bao X. Dhliwayo J. Heron N. Webb D.J. Jackson D.A. 《Lightwave Technology, Journal of》1995,13(7):1340-1348
Results are reported from recent research on the use of the Brillouin gain/loss mechanism for distributed sensing. A theoretical model of the interaction of the pulsed and CW beams is described and compared with experiments. Results from a system with a 51 km sensing length are presented. We finally investigate issues related to the variation within the sensing fiber of the polarizations of the two beams 相似文献
987.
Chun Hu Ji Zhao Li G.P. Liu P. Worley E. White J. Kjar R. 《Electron Device Letters, IEEE》1995,16(2):61-63
The effects of the plasma etching process induced gate oxide damages on device's low frequency noise behavior are investigated on MOSFET's fabricated with different field plate perimeter to gate area ratio antennas. Abnormal 1/f noise spectrum with a shoulder centered in the frequency range of 100 and to 1 kHz was frequently observed in small geometry devices, and it is attributable to a nonuniform distribution of oxide traps induced by plasma etching process 相似文献
988.
Feng M. Scherrer D. Kruse J. Apostolakis P.J. Middleton J.R. 《Electron Device Letters, IEEE》1995,16(4):139-141
We present experimental evidence that the noise figure (NF) and associated gain equal to those achieved with GaAs pseudomorphic high electron mobility transistors (GaAs p-HEMT's) can also be accomplished by ion implanted GaAs metal-semiconductor field-effect transistors (GaAs MESFET's). These measured noise figure results as a function of low temperature for GaAs MESFET's and p-HEMT's clearly suggest that the transport properties of the two-dimensional electron gas in HEMT's and p-HEMT's do not make a significant contribution to the noise reduction at high frequency operation of these devices 相似文献
989.
This paper describes a soft switching active snubber for an IGBT operating in a single switch unity power factor three-phase diode rectifier. The soft switching snubber circuit provides zero-voltage turn-off for the main switch. The high turn-off losses of the IGBT due to current tailing are reduced by zero-voltage switching. This allows the circuit to be operated at very high switching frequencies with regulated DC output voltage, high quality input current and unity input power factor. Simulation and experimental results are included 相似文献
990.
A family of differential latches has recently been proposed by Yuan and Svensson [1996]. The author shows that the proposed flip-flops using the dynamic slave latch suffer from a poor logic-level zero in the presence of glitches on the data inputs 相似文献