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991.
992.
Ferdinand P. Ferragu O. Lechien J.L. Lescop B. Magne S. Marty V. Rougeault S. Kotrotsios G. Neuman V. Depeursinge Y. Michel J.B. Van Uffelen M. Varelas D. Berthou H. Pierre G. Renouf C. Jarret B. Verbandt Y. Stevens W. Voet M.R.H. Toscano D. 《Lightwave Technology, Journal of》1995,13(7):1303-1313
Recent developments of stability control in mines, essentially based on Ge-doped fiber Bragg gratings (FBG) are reported including results about the different aspects of the system: accurate characterizations of FBG, sensor network topology and multiplexing method, user interface design and sensor packaging 相似文献
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T Rodriguez E Baumgarten R Fengler D Soumpasis G Henze 《Canadian Metallurgical Quarterly》1995,207(4):207-210
Nine children of the ALL-REZ BFM 87 and 90 trial received L-Asparginase (L-ASP) as a continuous infusion for 48-72 hs (i.e. 25 therapy cycles). Seven patients had had an allergic reaction towards an i.m. application (i.m., 29 therapy cycles). Two further patients got L-ASP initially as continuous infusion. The i.m. applications were carried out 19 times with Erwinia and 10 times with E. coli-Asparaginase, the continuous infusions 15 times with Erwinia and 10 times with E. coli-Asparaginase. In case of four patients continuous infusions of the same L-ASP type (E. coli or Erwinia) was well tolerated, after there had been an allergic reaction after i.m. application. Allergic reactions after i.m. application occurred during 10 courses as local painful erythema, during five courses as urticaria, during four courses as a general exanthema during one course as difficult breathing and during a further course as drop in blood pressure. After continuous infusion of L-ASP urticaria and difficult breathing occurred once and a transient exanthema two times. There was no anaphylactic reaction in any case. These data show that i.m. application of L-ASP causes no life-threatening side effects but allergic reactions (local pain and swelling) which clearly impaired general condition. Continuous infusion is a pharmacologically equivalent alternative with less impairment of the patients' general condition. 相似文献
997.
Chun Hu Ji Zhao Li G.P. Liu P. Worley E. White J. Kjar R. 《Electron Device Letters, IEEE》1995,16(2):61-63
The effects of the plasma etching process induced gate oxide damages on device's low frequency noise behavior are investigated on MOSFET's fabricated with different field plate perimeter to gate area ratio antennas. Abnormal 1/f noise spectrum with a shoulder centered in the frequency range of 100 and to 1 kHz was frequently observed in small geometry devices, and it is attributable to a nonuniform distribution of oxide traps induced by plasma etching process 相似文献
998.
A family of differential latches has recently been proposed by Yuan and Svensson [1996]. The author shows that the proposed flip-flops using the dynamic slave latch suffer from a poor logic-level zero in the presence of glitches on the data inputs 相似文献
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