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A low-cost patterning of electrodes was investigated looking forward to replacing conventional photolithography for the processing of low-operating voltage polymeric thin-film transistors. Hard silicon, etched by sulfur hexafluoride and oxygen gas mixture, and flexible polydimethylsiloxane imprinting molds were studied through atomic force microscopy (AFM) and field emission gun scanning electron microscopy. The higher the concentration of oxygen in reactive ion etching, the lower the etch rate, sidewall angle, and surface roughness. A concentration around 30 % at 100 mTorr, 65 W and 70 sccm was demonstrated as adequate for submicrometric channels, presenting a reduced etch rate of 176 nm/min. Imprinting with positive photoresist AZ1518 was compared to negative SU-8 2002 by optical microscopy and AFM. Conformal results were obtained only with the last resist by hot embossing at 120 °C and 1 kgf/cm2 for 2 min, followed by a 10 min post-baking at 100 °C. The patterning procedure was applied to define gold source and drain electrodes on oxide-covered substrates to produce bottom-gate bottom-contact transistors. Poly(3-hexylthiophene) (P3HT) devices were processed on high-κ titanium oxynitride (TiO x N y ) deposited by radiofrequency magnetron sputtering over indium tin oxide-covered glass to achieve low-voltage operation. Hole mobility on micrometric imprinted channels may approach amorphous silicon (~0.01 cm2/V s) and, since these devices operated at less than 5 V, they are not only suitable for electronic applications but also as sensors in aqueous media.  相似文献   
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Plasma powder surfacing is one of the latest processes for application of coatings, with control of dilution as its main feature. Surfacing with superduplex stainless steels is an interesting option for the construction and repair of equipment for applications in a highly corrosive environment, allowing the desired characteristics to be achieved: corrosion resistance and good mechanical properties. The aim of this work is to assess the ferrite content in the weld metal and the mechanical characteristics via microhardness profiles in surfacing of C-Mn steel pipes with deposition of UNS S32760 by plasma powder surfacing. Welding operations were carried out on pipes with deposition of SDSS, employing three welding heat input levels, varying the welding speed or the welding current. Then the geometry was analysed, the ferrite content in the weld metal was quantified and the microhardness profile was recorded. Variation in welding heat input caused changes in weld bead geometry, with variation in the welding current producing the most significant changes. Increase in heat input caused decrease in ferrite content of the weld metal. Regarding microhardness, only the condition with a higher level of welding current gave sufficiently high levels of microhardness in the weld metal.  相似文献   
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Changing the pore morphology of hydrogels can be an effective strategy to modulate their drug release profiles. Herein, Pluronic F127 was used to change the three-dimensional pore morphology of crosslinked poly(N-isopropylacrylamide-co-acrylic acid) (P[NIPAm-co-AAc]) hydrogels. F127 reduced the pore diameters from 20 ± 4 to 2.9 ± 0.4 μm and from 11 ± 1 to 1.4 ± 0.4 μm in hydrogels synthesized at 8 and 30°C, respectively. Small-angle X-ray scattering indicates that the segregation of the F127 during the polymerization process induces F127 phase transitions from unimers (at 8°C) or cubic-packed micelles (at 30°C) to a lamellar structure. P(NIPAm-co-AAc) hydrogels charged with S-nitrosoglutathione (GSNO), released nitric oxide (NO) spontaneously during hydration. The decrease in the pore diameter led to a twofold to threefold increase in the rate of water absorption and a fourfold to sixfold increase in the rate of NO release of the hydrogels. F127 can be used to change the pore morphology of P(NIPAm-co-AAc) hydrogels, with concomitant changes in their rate of hydration and NO release from GSNO, opening a new perspective for their use in topical NO delivery.  相似文献   
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Direct laser writing techniques are suitable for the high precision-patterning of 2D and 3D micro/nanostructures, featuring a variety of geometries and materials. Here, we demonstrated the use of laser-induced forward transfer with fs-pulses (fs-LIFT) to selectively transfer graphene oxide and poly(p-phenylene vinylene) patterns onto polymeric microstructures, fabricated by two-photon polymerization. The influence of different fs-LIFT experimental parameters on the width and height of the printed patterns was investigated. Upon optimum fs-LIFT parameters, we achieved homogeneous printed areas of both materials onto specific regions of the microstructures. Raman spectroscopy confirmed that fs-LIFT does not change the donor material upon transfer. Overall, this work demonstrates a promising strategy with precise printing capabilities, thus opening new opportunities for the development of photonic and optoelectronic devices.

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