Production of fungal lipases using wheat bran and soybean bran and incorporation of sugarcane bagasse as a co-substrate in solid-state fermentation

Fungal strains were screened for lipase producing activities and 10 strains were classified as good producers. Aspergillus sp., Fusarium sp., and Penicillium sp. exhibited the highest activities when fermented in wheat bran (WB) and soybean bran (SB). No fungal growth was observed using sugarcane bagasse (CB). An experimental design was applied to incorporate CB into the fermentation process for lipase production by Aspergillus sp. and Penicillium sp., and to evaluate the best moisture content for the substrate. Strains studied achieved maximum lipase activities with 25% CB combined with 75% WB or SB at 40% moisture content. The highest lipase activities were observed for WB and SB, and for SB combined with CB using Aspergillus sp. Fermentation of 96 h was the optimum period for enzyme production.     

Photo-vulcanization using thiol-ene chemistry: Film formation,morphology and network characteristics of UV crosslinked rubber latices

The photo-vulcanization with versatile thiol-ene chemistry represents an innovative approach to crosslink diene-rubber materials both in latex and in solid film state. In this work, the structure of elastomer-based thiol-ene networks and the morphology after film formation are studied in detail using electron microscopic techniques, atomic force microscopy and multiple-quantum solid-state NMR spectroscopy. Additionally, film formation properties and corresponding macroscopic properties of photo-vulcanized natural rubber (NR) latex and its synthetic counterpart, isoprene rubber (IR) latex, are determined in dependence on the curing procedure (pre- and post-vulcanization). The results reveal that thiol-ene cured elastomers comprise homogenously distributed crosslinks with a low amount of short chain defects. Whilst photochemically pre-cured NR latex particles provide coherent films, the film formation and mechanical properties of IR are strongly governed by the crosslink density of the latex particles. In film state, photo-vulcanization promotes narrow crosslink distributions and excellent tensile properties of both NR and IR.     

电厂蒸汽回路系统中腐蚀损伤的决定论预测

局部腐蚀,包括点腐蚀、应力腐蚀开裂和腐蚀疲劳是导致电厂发电装置损伤的重要原因,它们诱发50%以上的意外停机事故。迄今,腐蚀破坏的预测一直沿用经验和统计的方法,但是,由于已证实该方法的适用性和其结果的准确性欠佳,故不宜作为例行检修规程的基础。本文提出了预测局部腐蚀损伤的决定论方法,并使用这个方法说明点腐蚀如何引发低压蒸汽轮机涡轮盘Wilson线下游部位的应力腐蚀开裂(SCC),我们的计算表明SCC的萌发与扩展对蒸汽小氧含量、冷凝液膜的环境和涡轮盘所承受的应力这三个因素敏感。     

Self-service reservation in the fieldforce

On-line service reservation is becoming increasingly popular in the service industry. As services become more complex, requiring co-ordination among individual actions, the planning for making service appointments is normally conducted manually by the operators, often resulting in slow responses to customers. To tackle this problem, we have developed a real-time service reservation portal that takes an order from a user and works out appointment options, based on the availability of enterprise resources, for the user to book on-line. The portal is capable of dealing with complex workflow appointing, supporting interactive fine-tuning in individual appointments, respecting customer preferences and work policies, monitoring progress of workflow, informing the customer of status changes in job scheduling, dispatching and execution, as well as handling exceptions automatically. We have integrated the portal, code-named FieldReserve, with other components in the BT fieldforce optimisation suite (FOS) that covers functions of resource planning, scheduling and execution for the fieldforce to demonstrate the feasibility and potential benefits of this technology. Benefits demonstrated are to provide customers with instant response of service reservation, to provide volume control on reservation, to break away from one-size-fits-all lead times for service fulfilment, to provide customers with equal access to service provision, and to bring transparency of service progress to customers. Currently, we are actively engaging with businesses and have obtained strong support to downstream the key values of this technology in commercial contexts.     

Improving etch selectivity and stability of novolak based negative resists by fluorine plasma treatment

Fluorine plasma treatment is applied to cross-link a novolak based negative tone optical resist (maN-2400) to achieve increased dry etching selectivity. Furthermore, fluorine plasma treatment is used to strengthen the same resist to keep it in place during a second lithography step on top of the first one. Using Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy, cross-linking and passivation of the resist during plasma treatment is demonstrated. In contrast to the application of a baking process after resist development, AFM images show that fluorine plasma treatment preserves the intrinsic structure of the resist.     

Selective removal technology using chemical etching and excimer assistance in precision recycle of color filter

Color filters are produced using semiconductor production techniques although problems with low yield remain to be addressed. This study presents a new means of selective removal using excimer irradiation, chemical etching, or electrochemical machining on the fifth generation TFT LCDs. The selective removal of microstructure layers from the color filter surface of an optoelectronic flat panel display, as well as complete removal of the ITO thin-films, RGB layer, or resin black matrix (BM) layer from the sub...