Development of 170 GHz/500 kW gyrotron

A development of 170GHz/500kW level gyrotron was carried out as R&D work of ITER. The oscillation mode is TE_31,8. In a short pulse experiment, the maximum power of 750kW was achieved at 85kV/40A. The efficiency was 22%. In the depressed collector operation, 500kW/36%/50ms was obtained. The maximum efficiency of 40% was obtained at P_RF=470kW whereas the power decrease by the electron trapping was observed. Pulse extension was done up to 10s at P_RF=170kW with the depressed collector operation. The power was limited by the temperature increase of the output window.     

Experimental study on a quasi-optical mode converter for transforming the whispering-gallery mode into a circularly polarized hollow radiation beam

An experiment was carried out for transforming the 120 GHz-TE_12.2 whispering-gallery mode (WGM) into a circularly polarized hollow radiation beam. A hollow beam was formed by reflecting the WGM, which was radiated from a 16 mm radius circular waveguide cut, with an annular mirror having suitable local normal vectors. The experimentally observed field intensity profiles of the reflected wave were in good agreement with calculated results.     

Oxidation of Fe (II) in sulfuric acid solutions with dissolved molecular oxygen

The oxidation of Fe(II) with dissolved molecular oxygen was studied in sulfuric acid solutions containing 0.2 mol . dm^-3 FeSO₄ at temperatures ranging from 343 to 363 K. In solutions of sulfuric acid above 0.4 mol . dm^-3, the oxidation of Fe (II) was found to proceed through two parallel paths. In one path the reaction rate was proportional to both [Fe²⁺]² and po₂, exhibiting an activation energy of 51.6 . kJ mol^-1. In another path the reaction rate was proportional to [Fe²⁺]², [SO_4-], and po₂ with an activation energy of 144.6 kJ . mol^-1. A reaction mechanism in which the SO_4- ions play an important role was proposed for the oxidation of Fe(II). In dilute solutions of sulfuric acid below 0.4 mol . dm^-3, the rate of the oxidation reaction was found to be proportional to both [Fe(II)]² and Po₂, and was also affected by [H⁺] and [SO_2- ⁴]. The decrease in [H⁺] resulted in the increase of reaction rate. The discussion was further extended to the effect of Fe (III) on the oxidation reaction of Fe (II).     

Deposition rate dependence of coercivity in vaccum evaporated CoCr films

Deposition rate dependence of perpendicular coercivity Hcl in Cocr evaporated films at the deposition rate ranging from 0.4nm/s to 400nm/s is studied. Hcl increases with decreasing deposition rate as well as with increasing substrate temperature. A High Hcl over 500 Oe, which has ever been obtained only at a substrate temperature over 250°C when deposition rate is high(400nm/s), is obtained at a substrate temperature of 150°C under deposition rate of 2nm/s. "Shoulder" in the hysteresis loop disappears as Hcl exceeds 400 Oe. Therefore to decrease the deposition rate and to increase the substrate temperature have the same effect on Hcl. Saturation magnetization of the films with the same Cr concentration increases with decreasing deposition rate, and it is suggested that the degree of Cr segregation increases with decreasing deposition rate. Hcl is independent of the background pressure when the relative pressure, the quotient of (background pressure/deposition rate), is between 2×10^-8and 5×10^-6torr/(nm/s). From the results above, it is clarified that the difference of deposition rate between vacuum evaporation and sputtering is one of the major reasons for the difference of Hcl between the two.     

Preparation of Copper-Ruby Glasses by Sputtering: The Effect of Atmosphere on the Growth of Copper Particles

Copper-ruby glasses were prepared by the sputtering method and the effect of reducing treatment was examined. The reducing was carried out either during sputtering or heat treatment. Optical absorption was related to the growth of copper particles. The results are summarized as follows: (i) the volume fraction of copper particles in the glasses which are heat-treated in air increases with the addition of hydrogen in the sputtering gas. (ii) The copper particles do not grow larger than 8 nm by heat treatment in reducing atmosphere, whereas they grow as large as 12 nm in air. (iii) Reducing during heat treatment gives a pronounced effect only when sputtering was not carried out under reducing conditions. The origin of these phenomena was also discussed, considering the mechanism of nucleation and growth of copper particles.     

An Electronic Approach to Materials Design

A molecular orbital approach to materials design has recently made great progress. This approach is based on the electronic structure calculations by the DV-Xα cluster method. In this paper recent progress in this approachis reviewed. In particular     

Preparation and properties of transparent cellulose hydrogels

Highly transparent cellulose hydrogels with physical crosslinkage were prepared from nonaqueous organic cellulose solutions and viscose by coagulating and regenerating cellulose in an aqueous solution containing a water‐miscible organic solvent. Nonaqueous organic cellulose solutions used were LiCl/dimethylacetamide, paraformaldehyde/dimethyl sulfoxide, and triethylammonium chloride/dimethyl sulfoxide. Preparation conditions and physical properties of the transparent cellulose hydrogels were studied. The transparency of the cellulose hydrogels depended on the composition of the aqueous solution containing the organic solvent. Furthermore, transparent cellulose hydrogels from viscose showed high tensile strength. © 2003 Wiley Periodicals, Inc. J Appl Polym Sci 90: 3020–3025, 2003     

Prognostic factors in radiation-treated esophageal carcinoma

Prognostic factors in esophageal carcinoma treated with irradiation were examined. The prognosis of 111 patients without metastasis who had received more than 60 Gy was analyzed. Significant associations were found between survival rates and tumor length, stage, radioresponse of the primary tumor and the s.c. X-P classification based on barium contrast radiography; superficial type (tumor limited to the surface of the esophageal wall), tumorous type (solid mass without ulceration), Ul-A type (tumor with shallow ulceration with regular margin), Ul-B type (tumor with deep ulceration or irregular ulcer margin), and funneled type (tumor invading the esophageal wall in a scirrhous pattern). In multiple regression analysis, the X-P classification had the strongest correlation with survival and the survival rates of patients with the superficial type, the tumorous type and the s.c. Ul-A type were significantly higher than those of patients with the other tumor types (p < 0.001).     

The oxidation properties of fourth generation single-crystal nickel-based superalloys

The fourth-generation nickel-based single-crystal superalloys, which contain large amounts of refractory metals for strengthening and platinum group metals for topologically close-packed phase prevention, show excellent high-temperature strength. However, these alloying elements seem to decrease high-temperature oxidation resistance. In this study, nickel-based superalloys with various amounts of tantalum, rhenium, and ruthenium were examined in isothermal and cyclic exposures at 1,100°C to investigate the effect on the oxide growth rate and resistance to scale spallation. Ruthenium and rhenium were found to degrade the oxidation resistance by the vaporization of their oxide. Tantalum-rich oxide in the spinel layer acts to stabilize ruthenium and rhenium oxide in the scale. The addition of hafnium and yttrium is effective in improving the oxidation resistance of ruthenium-containing nickel-based superalloys.     

A high resolution negative working resist,LMR-UV,for g- and i-line lithography

LMR-UV (“low molecular weight resist for uv lithography”), a naphthoquinone-diazide sulfonic acid ester of a novolak resin, is a negative working resist. The mechanism of insolubilization of LMR-UV is based on the facts that the naphthoquinone-diazide moiety is decomposed to indenecarboxylic acid (polar compound) by photolysis upon UV irradiation and that the irradiated resist film insolubilizes in a non-polar developer. LMR-UV reliably forms 0.6 μm lines and spaces over a reflective substrate with steps by using a g-line stepper having a 0.35 NA lens. 0.6 μm-wide aluminum patterns over topography are obtained by use of g-line exposure and reactive ion etching. By use of an i-line aligner (NA = 0.42), LMR-UV resolves 0.25 μm space patterns with overhang profiles. The profiles are due to the large absorption coefficient of 3.8 μm^?1. 0.3 μm wide aluminum patterns are formed by i-line exposure and lift-off metallization.