逆冲断层发育区火山岩裂缝分布模式

准噶尔盆地车排子地区石炭系内发育有多条逆冲断层和多样的火山岩,且火山岩储层中构造裂缝发育。为了研究逆冲断层发育区火山岩裂缝分布模式,以车排子地区石炭系火山岩为例,分析了裂缝在纵向上和平面上的分布特征,并引入裂缝分布范围的“质心”概念,定量研究了裂缝分布范围在三维空间中的变化特征,提出了逆冲断层发育区火山岩裂缝分布模式。研究认为：裂缝空间分布范围变化特征有4种类型：质心正向偏移+密度值变大型（Ⅰ型）、质心负向偏移+密度值变大型（Ⅱ型）、质心正向偏移+密度值减小型（Ⅲ型）、质心负向偏移+密度值减小型（Ⅳ型）。逆冲断层发育区火山岩裂缝具有条带状楔形质心偏移模式,该模式特点为：平面上,裂缝分布形态呈现条带状;纵向上,裂缝分布形态呈现楔形,同时受到火山岩岩性的影响,局部裂缝的分布范围变大;裂缝分布范围的“质心”会在断层和火山岩岩性的控制作用下发生偏移。裂缝分布范围的“质心”概念的引入,可为裂缝分布规律的研究提供一种新的思路和方法。     

考虑用户需求的配电网规划对象选优分析方法

针对目前配网规划中过于追求电网侧可靠性指标,但用户需求考虑、投资优先次序难以量化等问题,本文提出一种考虑用户需求的配电网规划对象选优分析方法。首先,从供电可靠性水平、用户需求和电网经济因素三个层面建立了一套配电网规划综合评价指标体系,在可靠性方面关注与期望水平的差距,用户需求方面关注用电体验,电网经济因素方面关注停电缺供电量;其次,通过改进型“拉开档次”法计算各配网综合评价值,并据此排序,在年度总投资一定时,以方案总体综合评价值最大为目标函数来实现配电网对象选优,以有效安排多个配网规划的优先顺序;最后,以韶关地区配网为例,验证了本文提出的配电网规划对象选优分析方法具有实际应用价值。     

吸收性薄膜波导的参数测量

介绍了一种用棱镜耦合法测量吸收性薄膜波导参数的一种方法，它是由测得棱镜底部反射光斑中模的吸收线位置来确定薄膜的折射率和厚度。结果表明，此方法无需进行大量的计算就能同时精确地测量薄膜的折射率和厚度。给了两种吸收不同的薄膜波导参数测量结果。     

集成光学用单模磁光波导薄膜

采用双层（ＢｉＡｌ）ＹＩＧ膜结构来制作单模磁光波导。通过改变外延生长工艺来调节两层薄膜的折射率，可在一定波导的厚度范围内实现单模传输。Ｘ射线衍射测量表明薄膜质量良好，且易磁化方向平行膜面，最后利用棱镜耦合，观察了波导中的暗ｍ线。     

连续Nd:YAG激光器中Cr~(4 ):YAG被动调Q的稳定性和功率的提高

Ｃｒ４＋ＹＡＧ用于连续ＮｄＹＡＧ激光器被动调Ｑ，激光横模结构和纵模结构以及激光泵浦速率起伏等是引起调Ｑ不稳定的重要因素，运用一定的技术可以使调Ｑ稳定性得到根本性改善；此外应考虑Ｃｒ４＋ＹＡＧ热效应及光学薄膜的激光损伤     

负载型复合载体及其镍基催化剂的性能

采用溶胶-凝胶法制备了负载型ZrO_2/Al_2O_3和ZrO_2/Al_2O_3-SiO_2复合载体,研究了不同复合载体对Ni基催化剂CO_2重整甲烷反应和性能的影响,并用XRD、IR、TPR、TPD和BET等方法对复合载体及催化剂进行了表征。结果表明,ZrO_2负载在基载体后比表面积、碱性、活性组分Ni的分散度和Ni与ZrO_2的相互作用增大。NiO在复合载体表面的分散容量与ZrO_2的负载量有关,ZrO_2的负载量为37．5%时NiO的分散容量达最高值(24．0%)。与Ni/ZrO_2相比,Ni/ZrO_2/Al_2O_3-SiO_2和Ni/ZrO_2/Al_2O_3催化剂对CO_2的吸附能力增大,CO_2吸附量增加,酸强度降低,CO_2重整CH_4反应活性提高,其中以Ni/ZrO_2/Al_2O_3催化剂的活性最好。     

A Bi‐Lineage Conducive Scaffold for Osteochondral Defect Regeneration

Because cartilage and bone tissues have different lineage‐specific biological properties, it is challenging to fabricate a single type of scaffold that can biologically fulfill the requirements for regeneration of these two lineages simultaneously within osteochondral defects. To overcome this challenge, a lithium‐containing mesoporous bioglass (Li‐MBG) scaffold is developed. The efficacy and mechanism of Li‐MBG for regeneration of osteochondral defects are systematically investigated. Histological and micro‐CT results show that Li‐MBG scaffolds significantly enhance the regeneration of subchondral bone and hyaline cartilage‐like tissues as compared to pure MBG scaffolds, upon implantation in rabbit osteochondral defects for 8 and 16 weeks. Further investigation demonstrates that the released Li+ ions from the Li‐MBG scaffolds may play a key role in stimulating the regeneration of osteochondral defects. The corresponding mechanistic pathways involve Li+ ions enhancing the proliferation and osteogenic differentiation of bone mesenchymal stem cells (BMSCs) through activation of the Wnt signalling pathway, as well as Li+ ions protecting chondrocytes and cartilage tissues from the inflammatory osteoarthritis (OA) environment through activation of autophagy. These findings suggest that the incorporation of Li+ ions into bioactive MBG scaffolds is a viable strategy for fabricating bi‐lineage conducive scaffolds that enhance regeneration of osteochondral defects.     

基于前推回代法和牛顿拉夫逊法的配电网潮流计算

针对牛顿拉夫逊法计算潮流时对节点电压初值的要求高的缺点,结合配电网为放射状网络的特征,提出基于前推回代法和牛顿拉夫逊法的配电网潮流计算,利用前推回代法第一次迭代的结果作为牛顿拉夫逊法的初值,能够满足牛顿拉夫逊法对初值的要求,且具有良好的收敛速度。最后,应用实例证明基于前推回代法和牛顿拉夫逊法的配电网潮流计算迭代次数少,收敛性好。     

辽河油田超稠油三元复合吞吐影响因素研究

针对辽河油田曙一区超稠油井吞吐轮次高、吞吐效果逐渐变差的特点,提出了超稠油三元复合吞吐采油工艺技术。通过11管人造岩心物理模拟驱替实验,开展了超稠油三元复合吞吐影响因素研究。实验结果表明：水蒸汽注入量、CO2注入量及表面活性剂使用质量分数对工艺效果均有影响。其研究结果对优化超稠油三元复合吞吐施工工艺及施工参数有重要的指导意义。     

Influence of the sputtering pressure on the properties of transparent conducting zirconium-doped zinc oxide films prepared by RF magnetron sputtering

Transparent conducting zirconium-doped zinc oxide films with high transparency and relatively low re-sistivity have been successfully prepared on water-cooled glass substrate by radio frequency magnetron sputtering at room temperature. The Ar sputtering pressure was varied from 0.5 to 3 Pa. The crystallinity increases and the electri-cal resistivity decreases when the sputtering pressure increases from 0.5 to 2.5 Pa. The cystallinity decreases and the electrical resistivity increases when the sputtering pressure increases from 2.5 to 3 Pa. When the sputtering pressure The deposited films are polycrystalline with a hexagonal structure and a preferred orientation perpendicular to the substrate.