Ultraviolet-shielding and conductive double functional films coated on glass substrates by sol-gel process

Ultraviolet-shielding and conductive double functional films were composed of CeO2-TiO2 film and SnO2:Sb film deposited on glass substrates using sol-gel process.Ce(NO3)3·6H2O and Ti(C4H9O4),SnCl4 and SbCl3 were used as precursors of the two different functional films respectively.The CeO2-TiO2 films were deposited on glass substrates by sol-gel dip coating method,and then the SnO2:Sb films with different thickness were deposited on the pre-coated CeO2-TiO2 thin film glass substrates,finally,the substrates coated with double functional films were annealed at different temperatures.The optical and electrical properties of the CeO2-TiO2 films and the double films were measured by UV-Vis spectrometer and four probe resistance measuring instrument.The crystal structures and surface morphology of the films were characterized using XRD and optical microscope,respectively.The obtained results show that the ultraviolet-shielding rate of the glass substrates with CeO2-TiO2 films is not less than 90%,and transmittance in visible lights can reach 65%.With the thickness of the SnO2:Sb film increasing,its conductivity became better,and the surface resistance is about 260 Ω/ when the SnO2:Sb films were deposited 11 cycles of the dip on the pre-coated CeO2-TiO2 glass.The ultraviolet-shielding rate of the glass substrates with double functional films is higher than 97%,and the peak transmittance in the visible lights is 72%.Additionally,with increasing the heat treatment time,the Na+ of the glass substrates diffuses into the films,resulting in the particle size of SnO2 crystal smaller.     

磁控溅射功率对玻璃基DLC薄膜的结构和硬度的影响

用直流-射频磁控溅射镀膜工艺,在不同的溅射功率条件下,制备了玻璃/SiC/DLC(diamond-like carbon)薄膜.通过X射线衍射仪(XRD)、共焦显微拉曼光谱仪(Raman)、场发射扫描电子显微镜(SEM)、纳米显微硬度仪,研究了DLC薄膜的组织结构、物相组成、表面形貌、维氏硬度.结果表明,随着功率的增大,ID/IG值先增大后减小,薄膜硬度呈现先增大后减小的趋势;当溅射功率为200 W时,ID/IG值为0.56,镀膜玻璃的硬度值最大(830 HV),相比未镀膜的玻璃基片,硬度值增加了23.88％.     

同质缓冲层厚度对磁控溅射法制备玻璃基AZO薄膜的结构与光电性能影响

室温下在玻璃基片上用射频磁控溅射法制备了不同厚度的ZnOAl(AZO)缓冲层,并在该同质缓冲层上溅射生长了AZO薄膜.用XRD测试了薄膜结构,用四探针法测量了薄膜方块电阻,用紫外-可见光谱仪测试了薄膜透过率,用双光束红外分光光度计测试了薄膜在中红外范围内的红外反射率.并比较并分析了引入同质缓冲层前后薄膜结构与性能的变化.结果表明,与没有缓冲层的样品相比较,适当厚度的同质缓冲层能降低AZO薄膜中的残余应力,使薄膜晶粒尺寸变大,降低AZO薄膜的方块电阻,使薄膜的紫外截止边发生蓝移,增加薄膜的红外反射率,并不明显影响薄膜的可见光透过率.     

Sn离子注入PTC陶瓷表面研制气敏陶瓷材料

用脉冲金属离子束Sn注入BaTiO3PTC陶瓷的表面，结果表明：在低温空气中退火处理，注入层对CO有敏感特性。应用薄膜XRD、XPS、RBS对注入层结构分析表明，注入层对CO的敏感特性是由于注入层形成SnO2、BaSnO3等沉淀相引起的，同时还与离子注入引起的缺陷团有关。     

溶胶—凝胶法水解聚合反应的几个问题

本文综述了溶胶-凝胶法水解聚合反应中形成凝胶的化合物以及水解反应的机理和影响聚合物结构的因素,介绍了研究溶胶水解反应的方法.     

减反射可见光与反射近红外线双功能镀膜玻璃

采用溶胶-凝胶工艺,用提拉法在光伏玻璃上制备了玻璃/TiO2-SiO2/SnO2∶F/SiO2减反射可见光与反射近红外双功能膜。用拟合方法研究了TiO2掺量对TiO2-SiO2膜层折射率的影响、以及溶胶中水含量对SiO2膜层折射率的影响;研究了快速热处理温度对SnO2∶F膜结构和方块电阻的影响,用紫外-可见光谱(UV-Vis)测试了膜层的透射率,用扫描电镜(SEM)观察了膜层的表面形貌。结果表明,TiO2掺量可以使TiO2-SiO2膜层的折射率在1.49~1.97之间变化,SiO2溶胶中的水含量能够在膜面上形成微孔,降低SiO2膜层的折射率。通过优化工艺,制备出了在可见光范围平均透过率约为96%、1120nm波长近红外起始反射的双功能复合膜。对得到的结果进行了讨论。     

镀SiO_2膜玻璃基片上SnO_2∶Sb薄膜的溶胶-凝胶法制备及表征

用溶胶凝胶法在已镀SiO2膜的钠钙硅玻璃和没有镀SiO2的钠钙硅玻璃基片上镀制了锑掺杂摩尔分数为8.0%的二氧化锡薄膜。对不同热处理温度下薄膜样品的结构和性能进行了表征。结果表明:在673～823K范围内热处理60min时,薄膜以四方相金红石结构存在;随着热处理温度的提高,晶面衍射峰由宽化趋向尖锐,结晶逐渐完善;薄膜中的Sn以+4价的形式存在,掺杂的Sb以+5和+3价形式存在;当温度为673K和723K时,凝胶中的C没有完全燃尽,以C—O和CO形式存在于薄膜中。镀膜样品的可见光平均透过率随热处理温度的升高而增大;在热处理温度相同时,预先镀有SiO2膜的玻璃基片上制备的锑掺杂二氧化锡(ATO)薄膜的方块电阻较没有镀SiO2的小。     

铝矾土微观结构对硫铝酸盐熟料质量的影响

利用扫描电子显微镜（SEM）研究了两种铝矾土和用两种铝矾土配料煅烧的硫铝酸盐水泥熟料的微观结构形态，探索了铝矾土的微观结构对硫铝酸盐水泥熟料质量的影响，指出了铝矾土结构密度、硬度大造成生料易磨性差，是最终导致硫铝酸盐水泥快磷的主要原因。