High performance 35 nm gate length CMOS with NO oxynitride gate dielectric and Ni salicide

The 35 nm gate length CMOS devices with oxynitride gate dielectric and Ni salicide have been fabricated to study the feasibility of higher performance operation. Nitrogen concentration in gate oxynitride was optimized to reduce gate current I/sub g/ and to prevent boron penetration in the pFET. The thermal budget in the middle of the line (MOL) process was reduced enough to realize shallower junction depth in the S/D extension regions and to suppress gate poly-Si depletion. Finally, the current drives of 676 /spl mu/A//spl mu/m in nFET and 272 /spl mu/A//spl mu/m in pFET at V/sub dd/=0.85 V (at I/sub off/=100 nA//spl mu/m) were achieved and they are the best values for 35 nm gate length CMOS reported to date.     

Contact-Barrier Free,High Mobility,Dual-Gated Junctionless Transistor Using Tellurium Nanowire

The gate-all-around nanowire transistor, due to its extremely tight electrostatic control and vertical integration capability, is a highly promising candidate for sub-5 nm technology nodes. In particular, the junctionless nanowire transistors are highly scalable with reduced variability due to avoidance of steep source/drain junction formation by ion implantation. Here a dual-gated junctionless nanowire p-type field effect transistor is demonstrated using tellurium nanowire as the channel. The dangling-bond-free surface due to the unique helical crystal structure of the nanowire, coupled with an integration of dangling-bond-free, high quality hBN gate dielectric, allows for a phonon-limited field effect hole mobility of 570 cm² V⁻¹ s⁻¹ at 270 K, which is well above state-of-the-art strained Si hole mobility. By lowering the temperature, the mobility increases to 1390 cm² V⁻¹ s⁻¹ and becomes primarily limited by Coulomb scattering. The combination of an electron affinity of ≈ 4 eV and a small bandgap of tellurium provides zero Schottky barrier height for hole injection at the metal-contact interface, which is remarkable for reduction of contact resistance in a highly scaled transistor. Exploiting these properties, coupled with the dual-gated operation, we achieve a high drive current of 216 μA μm⁻¹ while maintaining an on-off ratio in excess of 2 × 10⁴. The findings have intriguing prospects for alternate channel material based next-generation electronics.     

An Improved Thin Wire Representation for FDTD Computations

We have shown that finite-difference time-domain (FDTD) electromagnetic computations for a conductor system having a radius smaller than 0.15Deltar or larger than 0.65 Deltar (Deltar is the lateral side length of cells employed), modeled using arbitrary-radius-wire representations proposed so far with a time increment determined from the upper limit of Courant's stability condition, result in numerical instability. A primary factor causing this numerical instability is that the speed of waves propagating in the radial direction from the wire in the immediate vicinity of the wire exceeds the speed of light, and therefore, Courant's condition is not satisfied there. It is further shown that for these cases, the arbitrary-radius-wire representation can be improved by modifying the material parameters for the axial field components closest to the wire as well as those for the radial electric and circulating magnetic field components. The improved wire representation is effective in representing a wire whose radius ranges from 0.0001Deltar to 0.9Deltar.     

Two-tone metal pattern transfer technique using a single mold surface

There is growing demand for a fine metal-patterning technique to fabricate devices of the next generation, such as patterned media, plasmon photonics, and nanoscale electrodes. Nanotransfer printing (nTP) using a nanoscale patterned stamp has recently received considerable attention because of its high throughput and high resolution. To increase the throughput of the process further, it will be necessary to be able to use the stamp repeatedly, because fabrication of the stamp is a comparatively lengthy process. However, after the first transfer process, residual metal in the concave areas of the stamp obstructs the continuation of the transfer process. We examined a two-tone metal pattern transfer technique using a single mold after the first transfer process. The obstructive gold pattern in the mold could be removed and obtained as a negative tone by using a layer of polymer as a transfer substrate.     

Mimic Drug Dosage Modulation for Neuroplasticity Based on Charge-Trap Layered Electronics

The human brain is often likened to an incredibly complex and intricate computer, rather than electrical devices, consisting of billions of neuronal cells connected by synapses. Different brain circuits are responsible for coordinating and performing specific functions. The reward pathway of the synaptic plasticity in the brain is strongly related to the features of both drug addiction and relief. In the current study, a synaptic device based on layered hafnium disulfide (HfS₂) is developed for the first time, to emulate the behavioral mechanisms of drug dosage modulation for neuroplasticity. A strong gate-dependent persistent photocurrent is observed, arising from the modulation of substrate-trapping events. By controlling the polarity of gate voltage, the basic functions of biological synapses are realized under a range of light spiking conditions. Furthermore, under the control of detrapping/trapping events at the HfS₂/SiO₂ interface, positive/negative correlations of the A_n/A₁ index, which significantly reflected the weight change of synaptic plasticity, are realized under the same stimulation conditions for the emulation of the drug-related addition/relief behaviors in the brain. The findings provide a new advance for mimicking human brain plasticity.     

Direct Growth of Germanene at Interfaces between Van der Waals Materials and Ag(111)

Germanene, a 2D honeycomb germanium crystal, is grown at graphene/Ag(111) and hexagonal boron nitride (h-BN)/Ag(111) interfaces by segregating germanium atoms. A simple annealing process in N₂ or H₂/Ar at ambient pressure leads to the formation of germanene, indicating that an ultrahigh-vacuum condition is not necessary. The grown germanene is stable in air and uniform over the entire area covered with a van der Waals (vdW) material. As an important finding, it is necessary to use a vdW material as a cap layer for the present germanene growth method since the use of an Al₂O₃ cap layer results in no germanene formation. The present study also proves that Raman spectroscopy in air is a powerful tool for characterizing germanene at the interfaces, which is concluded by multiple analyses including first-principles density functional theory calculations. The direct growth of h-BN-capped germanene on Ag(111), which is demonstrated in the present study, is considered to be a promising technique for the fabrication of future germanene-based electronic devices.     

Fabrication of carbon nanofibers using only ion beam irradiation to glassy carbon

Carbon nanofibers (CNFs) and carbon nanotubes (CNTs) are new carbon-based materials. However, the production of CNFs and CNTs is very difficult due to the complicated processes and high temperature involved. Therefore, a method of fabrication is required that enables high throughput at a low cost.Our previous study reported that oxygen ion beam energy of 500 eV applied to glassy carbon (GC) forms the finest pitch conical anti-reflection (AR) structures, and that an irradiation time of more than 24 min fabricates conical AR structures with heights of more than 250 nm. After the fabrication of the AR structures, irradiation by an argon ion (Ar⁺ beam changes the surface morphology, and oblique angle irradiation can form CNFs. Thus, we carried out oblique Ar⁺ beam irradiation on conical carbon protrusions on GC fabricated by oxygen ion beam irradiation. As a result, CNFs have been formed using oxygen and argon ion beam irradiation at room temperature. In addition, multi-wall CNT can be obtained by two-step ion beam irradiation.     

A Reliable All-2D Materials Artificial Synapse for High Energy-Efficient Neuromorphic Computing

High-performance artificial synaptic devices are indispensable for developing neuromorphic computing systems with high energy efficiency. However, the reliability and variability issues of existing devices such as nonlinear and asymmetric weight update are the major hurdles in their practical applications for energy-efficient neuromorphic computing. Here, a two-terminal floating-gate memory (2TFGM) based artificial synapse built from all-2D van der Waals materials is reported. The 2TFGM synaptic device exhibits excellent linear and symmetric weight update characteristics with high reliability and tunability. In particular, the high linearity and symmetric synaptic weight realized by simple programming with identical pulses can eliminate the additional latency and power consumption caused by the peripheral circuit design and achieve an ultralow energy consumption for the synapses in the neural network implementation. A large number of states up to ≈3000, high switching speed of 40 ns and low energy consumption of 18 fJ for a single pulse have been demonstrated experimentally. A high classification accuracy up to 97.7% (close to the software baseline of 98%) has been achieved in the Modified National Institute of Standards and Technology (MNIST) simulations based on the experimental data. These results demonstrate the potential of all-2D 2TFGM for high-speed and low-power neuromorphic computing.     

A highly integrated 40-MIPS (peak) 64-b RISC microprocessor

A 1-million transistor 64-b microprocessor has been fabricated using 0.8-μm double-metal CMOS technology. A 40-MIPS (million instructions per second) and 20-MFLOPS (million floating-point operations per second) peak performance at 40 MHz is realized by a self-clocked register file and two translation lookaside buffers (TLBs) with word-line transition detection circuits. The processor contains an integer unit based on the SPARC (scalable processor architecture) RISC (reduced instruction set computer) architecture, a floating-point unit (FPU) which executes IEEE-754 single- and double-precision floating-point operations a 6-KB three-way set-associative physical instruction cache, a 2-KB two-way set-associative physical data cache, a memory management unit that has two TLBs, and a bus control unit with an ECC (error-correcting code) circuit     

Proposals for wastewater treatment by applying flocculating activity of cross-linked poly-gamma-glutamic acid

Cross-linked poly-gamma-glutamic acid (C-L gamma-PGA) markedly purified polluted water collected from rivers and ponds by flocculation and precipitation. This effect of C-L gamma-PGA occasionally required pretreatment with polyaluminum chloride (PAC). Components of polluted water in rivers or ponds are generally thought to be clay minerals, microorganisms and chemical compounds. In this study, the flocculating activities of C-L gamma-PGA against suspensions of bentonite, diatomaceous earth, Escherichia coli and Mycrocystis aeruginosa, and against solutions of crystal violet and bisphenol A were investigated. The mode of action of C-L gamma-PGA is thought to be based on electrostatic interaction between flocculants, C-L gamma-PGA and PAC, and the surface of polluted water components, which may lead to neutralization of the zeta-potential of those components.