Pore size control of porous silica by sol-gel process

Porous silica glass was prepared by sol-gel process from tetraethoxysilane (TEOS). The effects of solvents (water, ethanol), drying condition, heat treatment temperature on specific surface area and pore size distribution of porous silica were investigated. Gelation process accelerates with an increase of H₂O content, while retards with the increase of ethanol amount. Structure changes during heat treatment were studied by means of DTA, XRD. TEM micrographs show that the gel particles shrink after heated at 500°C, thus the average pore size decreases.     

Effect of processing history on the properties of Ag-based tapes

The Bi-system tapes and coils were prepared by the powder-in-tube method. The effect of processing and heat treatment on the properties of the tapes and coils was studied. It is found that the shearing stress produced by the rolling process may destroy the 2223 phase, and the destroyed 2223 phase cannot be recovered by heat treatment, whereas the pressing stress produced by the uniaxial pressing process only makes the 2223 phase grains break, and the broken 2223 phase can be closed by the heat treatment. TheJ _c values of the rolling samples, pressing sample, and the coil with a diameter of 35 mm are over 1.3×10⁴, 2.5×10⁴, and 4×10³ A/cm² (77 K, 0 T), respectively.     

传输线衰减常数与柱形谐振器Q值的关系

文中严格地讨论了任意截面形状，任意模式的柱形谐振腔Ｑ值与构成该谐振器的传输线衰减常数间的关系，给出了更一般的公式，推广了Ｄａｖｉｄｓｏｎ和Ｓｉｍ－ｍｏｎｄｓ＾［１］、Ｂａｒｌｏｗ和Ｃｕｌｌｅｎ＾［２］以及Ｙｅｈ和Ｓｈｉｍａｂｕｋｕｒｏ＾［３，４］的结果。     

淀积条件对GDa—SiNx薄膜电学特性的影响

本文讨论了用辉光放电法制备氮化硅薄膜时衬底温度、射频功率和气体流量比对薄膜的电导率、介电常数和击穿强度的影响。通过优化生长条件，制备了优质非晶氮化硅薄膜，其介电常数为７．５、击穿强度为５．５ＭＶ／ｃｍ、电导率为１０－１３（Ωｃｍ）－１。     

极尖断面为折线的四极透镜磁性能研究

对传统双曲线极尖的四极透镜进行了磁性能分析。在此基础上，提出了极尖断面为折线的四极透镜结构。磁场的数值分析以及测量结果表明：该结构产生的场梯度均匀，且具有磁场集中、磁场梯度高、便于加工和安装的对称性控制等优点。该结构的四极透镜已用于ＣＹＣＩＡＥ－３０回旋加速器和ＨＩ－１３串列加速器束流输运线之中     

The prospects of non-volatile phase-change RAM

Phase-change read-and-write memory (PRAM) is a promising memory that can solve the problems of conventional memory—scalability, read/write speed, and reliability. We will review the opportunities and technical challenges of PRAM. The most important challenge of PRAM is the reduction of the writing current. Various approaches to reduce the writing current will be reviewed and the prospects of PRAM are discussed.     

用于重离子核反应实验测量的纵向电场气体电离室

本文报道了一种新型的大动态范围，多叠层探测器系统组件之一的纵向电场气体电离室的构造，性能和在中能得离子核反应实验中的应用。