Influence of the silicon surface treatment by plasma etching and scratching on the nucleation of diamond grown in HFCVD - a comparative study

A comparative study for the nucleation of diamond was carried out using surface treatment like (i) surface scratching with 1 μm diamond paste and (ii) surface etching using chlorine plasma at different RF powers (50, 100 and 150 W). Atomic force microscopic study shows variation in roughness from 31 nm to 110 nm. Scratching results in random scratches, whereas plasma etches a surface uniformly. Scanning electron microscopic observations show well faceted crystallites with a predominance of angular shaped grains corresponding to 〈100〉 and 〈110〉 crystallite surfaces for the scratched as well as plasma etched substrate. Surface etching at 150 W plasma power results in a better growth in comparison with 50 and 100 W plasma powers. Chlorine-radical is found responsible for the changes in the growth morphology. Raman spectroscopy shows a sharp peak at 1,332 cm⁻¹ and a peak at ∼1,580 cm⁻¹ for both samples.     

Thermal Modeling of Tool-Work Interface during Friction Stir Welding Process

Russian Journal of Non-Ferrous Metals - Adequate heat input provided by the proper combination of friction stir welding (FSW) parameters is critical to sound welding. Optimum parameter setting...     

电机车变压器油箱制造工艺简述

介绍了ＪＱＦＰ－７７００／２５型电机车变压器油箱的基本结构及针对其结构特点制定的工艺程序和制造方法。     

Spectroscopic studies of sol–gel grown CdS nanocrystalline thin films for optoelectronic devices

CdS is one of the highly photosensitive candidate of II–VI group semiconductor material. Therefore CdS has variety of applications in optoelectronic devices. In this paper, we have fabricated CdS nanocrystalline thin film on ultrasonically cleaned glass substrates using the sol–gel spin coating method. The structural and surface morphologies of the CdS thin film were investigated by X-ray Diffraction (XRD) and Field Emission Scanning Electron Microscopy (FESEM) respectively. The surface morphology of thin films showed that the well covered substrate is without cracks, voids and hole. The round shape particle has been observed in SEM micrographs. The particles sizes of CdS nanocrystals from SEM were estimated to be～10–12 nm. Spectroscopic properties of thin films were investigated using the UV–vis spectroscopy, Photoluminescence and Raman spectroscopy. The optical band gap of the CdS thin film was estimated by UV–vis spectroscopy. The average transmittance of CdS thin film in the visible region of solar spectrum found to be～85%. Optical band gap of CdS thin film was calculated from transmittance spectrum ～2.71 eV which is higher than bulk CdS (2.40 eV) material. This confirms the blue shifting in band edge of CdS nanocrystalline thin films. PL spectrum of thin films showed that the fundamental band edge emission peak centred at 459 nm also recall as green band emission.     

Template replication for full wafer imprint lithography

Typically, the Step and Flash Imprint Lithography (S-FIL^TM) process uses field-to-field drop dispensing of UV-curable liquids for step-and-repeat patterning. Several applications, including patterned magnetic media, photonic crystals, and wire grid polarizers, are better served by a process that allows high-throughput, full-wafer patterning of sub-100 nm structures with modest alignment. Full-wafer imprinting requires a full-wafer template; however, creation of a wafer-scale imprint template with sub-100 nm structures is not feasible with direct-writing approaches. This paper describes a practical methodology for creating wafer-scale templates suitable for full-wafer imprinting of sub-100 nm structures.The wafer-scale template is replicated from a smaller area master template using the S-FIL step-and-repeat process. The pattern is repeated to accommodate the wafer substrate targeted for a particular application. The tone of the master template is maintained by employing an SFIL/R^TM (reverse tone) pattern transfer process. To create the replicate template, the patterns are imprinted onto a fused silica wafer that has been coated with chromium and an organic transfer layer. A silicon-containing resist, Silspin^TM, is spun on to planarize the organic monomer material. Following an etch back of the Silspin, the monomer and transfer layer are patterned using the Silspin as a hard mask. The Silspin and monomer stack then serves as a masking layer for the chromium and fused silica etches. The remaining monomer and chromium are then removed to create a conformal replicate template.     

Characterization and Studies on Hydro Dynamically Stable Operation of an Angular Jet SOG for COIL

Chemical oxygen-iodine Laser (COIL) is one of the fast emerging high power laser source for near Infrared (λ=1.315μm) laser generation. The heart of the system is the singlet oxygen generator (SOG) which is a pumping source for this laser. A Jet type SOG with a novel approach was designed and fabricated. Singlet oxygen was taken out of the SOG at an angle of 40° thus avoiding the carry over of droplets, which is one of the major drawbacks of horizontal system. The preliminary results have been reported in our earlier publication. The present paper discusses the performance of this generator for various operational conditions viz. diluent's gas nitrogen / helium, basic hydrogen peroxide composition, generator pressure and gas velocity. Further, conditions for the stable operation from generator as well as chlorine injection point of view have been identified.     

Poly(4-styrenesulfonic acid) doped polypyrrole/tungsten oxide/reduced graphene oxide nanocomposite films based surface acoustic wave sensors for NO sensing behavior

Poly(4-styrenesulfonic acid) (PSSA) doped polypyrrole (PPy)/tungsten oxide (WO₃)/reduced graphene oxide (rGO) hybrid nanocomposite have been successfully synthesized using appropriate amounts of PSSA, pyrrole monomer, WO₃, and rGO dispersed in aqueous solution through in situ chemical oxidation polymerization. Here, a simple spin coating method was used to fabricate a nitric oxide (NO) gas sensor composed of the aforementioned nanocomposite on a surface acoustic wave (SAW) resonator. This sensor can detect NO gas at concentrations of 1–110 parts per billion (ppb) at room temperature in dry air, with a sensitivity of 12 Hz/ppb and response and recovery times of <2 min. Moreover, its limit of detection (LOD) is 0.31 ppb for a signal to noise ratio of 3. It demonstrates repeatability, fast response, and recovery at room temperature. Moreover, its sensory performance remains highly stable over 30 days with only a 6.3% decrease in sensitivity. In addition, the sensor is highly selective for NO, even when nitrogen dioxide, ammonia, and carbon dioxide are applied as interfering gases. The inclusion of rGO (with large specific surface area) and the synergic effect of n-type WO₃ nanoparticles in the p-type PPy matrix (leading to p-n heterojunction region formation) possibly underlie the efficient sensing performance of our sensor.     

工频自动加压装置中的干扰及其抑制

主要对在实验室内进行工频耐压试验,试品击穿放电时所产生的严重干扰现象进行分析研究,提出了抑制干扰的方法。     

全绝缘有载调压变压器雷电冲击性能的改进

分析了线端调压全绝缘有载调压变压器的冲击分布,提出把高压绕组中部断开,调压绕组接在高压绕组中部,可以有效改善冲击性能,减小变压器主绝缘距离。