NMDA Receptor Modulation of Incidental Learning in Pavlovian Context Conditioning.

Rats exposed to a footshock show conditional fear when reexposed to the shock context. Immediate presentation of shock after placement in the context significantly reduces this fear. Preexposure to the context in the absence of shock, coupled with a minimum preshock interval during training, overcomes this immediate shock deficit. Because rats learn about the context during preexposure and express that learning after being reinforced, the context preexposure effect is an aversive analogue of latent learning. The authors examined the effect of the N-methyl-D-aspartate (NMDA) receptor antagonist D,L-2-amino-5-phosphovalerate (APV) on the facilitatory effect of context preexposure. Rats were preexposed to a chamber after APV administration. The next day they were placed in the same chamber without drug and received shock 35 s later. APV blocked the facilitatory effect of preexposure. Therefore NMDA receptors are important for contextual latent learning. (PsycINFO Database Record (c) 2010 APA, all rights reserved)     

与供应商的采购合作关系分析

对与供应商的采购合作关系进行了初步的分析，通过需求分析、选择供应商、正式建立合作关系、实施和加强合作关系4个过程展开，分别对筛选战略、供应管理计划流程、供应商的评估和选择、认证管理等关键问题进行初步分析，旨在使采购工作趋于完美。     

Inside Front Cover: The Elastic Properties and Plastic Behavior of Two‐Dimensional Polymer Structures Fabricated by Laser Interference Lithography (Adv. Funct. Mater. 10/2006)

The probing of the micromechanical properties within a two‐dimensional polymer structure with sixfold symmetry fabricated via interference lithography reveals a nonuniform spatial distribution in the elastic modulus “imprinted” with an interference pattern in work reported by Tsukruk, Thomas, and co‐workers on p. 1324. The image prepared by M. Lemieux and T. Gorishnyy shows how the interference pattern is formed by three laser beams and is transferred to the solid polymer structure. The elastic and plastic properties within a two‐dimensional polymer (SU8) structure with sixfold symmetry fabricated via interference lithography are presented. There is a nonuniform spatial distribution in the elastic modulus, with a higher elastic modulus obtained for nodes (brightest regions in the laser interference pattern) and a lower elastic modulus for beams (darkest regions in the laser interference pattern) of the photopatterned films. We suggest that such a nonuniformity and unusual plastic behavior are related to the variable material properties “imprinted” by the interference pattern.     

Nonlinear Propagation of Coupling Optical Pulse under Compton Scattering in Laser Medium

After considering Kerr nonlinear effect,group velocity dispersion of host and gain distribution of active particle in laser amplifying medium,a basic equation describing propagation of the coupling optical pulse under the multi-photon nonlinear Compton scattering in the laser amplifying medium has been deduced. Besides,the profile and power spectrum of a picosecond-level super-Gaussian coupling pulse in the laser amplifying medium have been discussed when its central frequency coincides with the gain peak frequency of the laser amplifying medium.     

基于高速分散的烟火药剂制备工艺

探索高速分散的烟火药剂制备工艺，分析了高速分散制备工艺中的安全性。在实际应用中，此种工艺所制备的烟火药剂有燃烧精度高的优点。     

光氯化制备对氯三氯甲苯的工艺条件研究

本研究了在内环流反应器中，以对氯甲苯为原料制备对氯三氯甲苯的新工艺，考察了不同氯气流量、不同氯化温度对对氯甲苯侧链光氯化反应的影响，得出了对氯甲苯的侧链光氯化反应规律。结合正交试验，得出了对氯甲苯侧链光氯化制备对氯三氯甲苯的较优工艺条件。     

Optimization of Selective Epitaxial Growth of Silicon in LPCVD

Selective epitaxial growth (SEG) of silicon has attracted considerable attention for its good electrical properties and advantages in building microstructures in high‐density devices. However, SEG problems, such as an unclear process window, selectivity loss, and nonuniformity have often made application difficult. In our study, we derived processing diagrams for SEG from thermodynamics on gas‐phase reactions so that we could predict the SEG process zone for low pressure chemical vapor deposition. In addition, with the help of both the concept of the effective supersaturation ratio and three kinds of E‐beam patterns, we evaluated and controlled selectivity loss and nonuniformity in SEG, which is affected by the loading effect. To optimize the SEG process, we propose two practical methods: One deals with cleaning the wafer, and the other involves inserting dummy active patterns into the wide insulator to prevent the silicon from nucleating.     

厚膜永磁阵列微致动器的磁路研究

研究了厚膜永磁阵列微致动器中的磁场分布，并研究了永磁阵列单元几何尺寸对微致动器电磁力的影响。结果表明，厚膜永磁阵列单元高宽比和磁体单元间隔对微致动器电磁力影响较大磁徕单元高宽比为0．7是一个比较合适的尺寸。