基于SPM技术的纳米信息存储薄膜的研究进展

扫描探针显微技术SPM可以在原子或分子尺度上对表面进行表征和修饰，应用SPM技术可以在薄膜表面形成纳米级的信息点阵，特别适合发展超高密度的信息存储，是一种非常有希望代替传统磁存储，光存储的纳米级存储技术，本文介绍了纳米信息存储薄膜的研究进展，并对其制备技术和读写机制进行了初步的探讨。     

Electron transport in InGaO3(ZnO)m (m=integer) studied using single-crystalline thin films and transparent MISFETs

We have investigated the characteristics of transparent metal-insulator-semiconductor field-effect transistors (MISFETs) fabricated using InGaO₃(ZnO)_m (m=integer) single-crystalline thin films as n-channel layers and amorphous alumina as gate insulator films. The MISFETs exhibit good characteristics such as insensitivity to visible light illumination, off-current as low as ∼1 nA with a positive threshold voltage of ∼3 V and on/off current ratio of 10⁵. The field-effect mobility increased from ∼1 to ∼10 cm² (V s)⁻¹ as the m-value increased. Room temperature Hall mobility also increased. However, unexpectedly these values were lower than the field-effect mobility. It is explained by existence of shallow localized state in the homologous compounds.     

聚四氟乙烯薄膜压敏胶粘带的研制

主要介绍了聚四氟乙烯薄膜和有机硅压敏胶制造压敏胶粘带的方法。     

溅射靶材的应用及制备初探

随着电子及信息产业突飞猛进的发展，世界溅射靶材的需求越来越多，本文介绍了靶材的发展概况、分类和应用情况，以及靶材的特性要求．探讨Ni-Cr合金靶材的制备工艺，结果表明，产品能满足靶材特性要求。     

分割电极片状压电致动器——(二)位移特性及狭缝宽度对其影响的实验研究

研究了悬臂梁式分割电极片状压电致动器的位移特性。理论分析表明，分割电极狭缝宽度会减小致动器自由端的位移输出，但当狭缝宽度小于致动器电极宽度的１０％时，可忽略狭缝宽度的影响。致动器端部位移的测试结果大于理论计算值。与现有磁头悬浮臂尺寸相近的致动器，在２０Ｖ～５０Ｖ的电压驱动下均可获得１μｍ～２μｍ的致动位移。对９８５０道／厘米的密度磁盘，该位移能覆盖至少一个磁道宽度，满足磁头定位两级伺服系统对第二级致动器位移的基本要求。     

钇铁石榴石薄膜材料的光吸收谱及Bi,Al掺入对谱的影响研究

采用单离子晶场跃迁模型，拟合出钇铁石榴石（ＹＩＧ）薄膜材料的光吸收谱，与实验谱吻合得较好。从实验和理论上分析了（ＢＩＡＩ）ＹＩＧ 薄膜材料的光吸收谱，结果表明，Ａｌ３＋离子的作用如同稀释剂一样，减小了光吸收，Ｂｉ３＋离子由于其强的自旋轨道耦合作用，增大了跃迁振子强度和跃迁线宽，从而增大了光吸收损耗，在此基础上所作的（ＢｉＡｌ）ＹＩＧ的理论谱与实验谱符合得较好。     

T_C≥400°C高温PTC陶瓷的研制

利用国产原料，采用传统的陶瓷材料制备工艺，研制了居里温度ＴＣ≥４００°Ｃ的高温ＰＴＣ陶瓷，制成了居里温度ＴＣ＝４１２°Ｃ，电阻Ｒ≤１０３Ω，ｌｇ（Ｒｍａｘ／Ｒｍｉｎ）＝４的高性能ＰＴＣ热敏陶瓷材料     

薄膜微型电源

介绍了新型的薄膜微型电源的工作原理、结构及制造工艺。     

High-pressure dc sputtering of High-Tc BPSCCO thin films withTc(0) above 100 K

High-T _c Bi(Pb)-Sr-Ca-Cu-O thin films have been made on single-crystal MgO substrates using high-pressure dc sputtering technique. X-ray studies confirm the crystallinity and highly oriented structure withc-axis perpendicular to the substrate. By optimizing the annealing schedule the formation of the high-T _c phase is stabilized. The best film exhibited superconducting transition temperature with zero-resistance temperature,T _c(0), as high as 101 K. Temperature dependence ofJ _c indicates the presence of Josephson-type weak links.     

超声波对化学镀Ni－Cr－P非晶态薄膜的金刚石性能的影响

研究了超声波对化学镀Ｎｉ－Ｃｒ－Ｐ非晶态薄膜的金刚石性能的影响。结果表明，超声波可使金刚石表面非晶态薄膜更加均匀和致密，从而提高了抗压强度，氧化温度和晶化后的强度。随超声波频率的增加，金刚石性能有增加的趋势。