Novel photoresist stripping technology using steam-water mixture

A novel wet vapor photoresist stripping technology is developed as an alternative to dry plasma ashing and wet stripping.Experiments using this technology to strip hard baked SU-8 photoresist,aurum and chromium film are carried out.Then the images of stripping results are shown and the mechanism is analyzed and discussed. The most striking result of this experiment is that the spraying mixture of steam and water droplets can strip photoresist and even metal film with ease.     

基于EM78P419N单片机的消毒烘干机的设计

为了改善传统烘干机烘手时间长、易交叉感染、可靠性低等问题,进行了消毒干手机的设计。该设计利用红外技术检测信号,再将光信号转换成电信号送入EM78P419N单片机,通过单片机的处理后,启动电磁阀和滴水泵进行消毒。定时完成后,启动加热器和风扇进行烘干。整个过程完全自动控制,避免了交叉感染,手伸即喷,手离即停。同时,研制出的样品具有成本低、体积小、可靠性高、干手时间短等优点,在各类人员聚集或流动的场所应用广泛。     

Effect of deposition conditions on the physical properties of SnxSy thin films prepared by the spray pyrolysis technique

Tin sulfide thin films (Sn_xS_y) with an atomic ratio of y/x = 0.5 have been deposited on a glass substrate by spray pyrolysis. The effects of deposition parameters, such as spray solution rate (R), substrate temperature (T_s) and film thickness (t), on the structural, optical, thermo-electrical and photoconductivity related properties of the films have been studied. The precursor solution was prepared by dissolving tin chloride (SnCl₄, 5H₂O) and thiourea in propanol, and Sn_xS_y thin film was prepared with a mole ratio of y/x = 0.5. The prepared films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV-vis spectroscopy. It is indicated that the XRD patterns of Sn_xS_x films have amorphous and polycrystalline structures and the size of the grains has been changed from 7 to 16 nm. The optical gap of Sn_xS_x thin films is determined to be about 2.41 to 3.08 eV by a plot of the variation of (αhν)² versus hν related to the change of deposition conditions. The thermoelectric and photo-conductivity measurement results for the films show that these properties are depend considerably on the deposition parameters.     

Effect of Fe-doping on the structural and optical properties of ZnO thin films prepared by spray pyrolysis

Fe-doped ZnO thin films have been prepared by spray pyrolysis on glass substrates and the influence of Fe-doping concentration on the structural and optical properties of the films has been studied.The X-ray diffraction (XRD) analysis shows that Fe doping has a significant effect on crystalline quality,grain size and strain in the thin films.The best crystalline structure is obtained for 3 at%Fe doping as observed from scanning electron microscopy (SEM) and XRD.However,lower or higher Fe-doping degrades the crystalline quality in turn.Moreover,UV spectroscopy demonstrates the influence of Fe-incorporation on visible range transmittance of ZnO where the best transmittance is obtained for 3 at%doping.The results have been illustrated simultaneously focusing previous results obtained from literature.     

8031单片机在绝缘材料真空干燥中的应用

准确测定电工绝缘材料真空干燥过程中的含水量,并实现实时在线控制,在绝缘材料真空干燥工艺中具有重要的实践意义,本文论述以8031单片机为核心的微机系统对电工绝缘材料真空干燥过程中水分含量进行了实时在线监测的方法,并给出了硬件结构框图及软件流程图。     

工艺条件对PTCR热敏陶瓷喷雾造粒粉体性能的影响

采用压力喷雾造粒的方式对BaTiO3系PTCR热敏陶瓷粉体进行喷雾造粒处理,研究了喷雾造粒过程中浆料组成和雾化条件对粉体性能的影响。研究结果表明：喷雾造粒过程中浆料粘度过高,雾化条件控制不当,都会使喷雾造粒粉体颗粒的团聚程度增加,影响粉体的松装密度和流动性,对生坯成型及材料烧结不利,考虑到料浆中粘合剂含量、固体物含量的综合影响,添加适量的分散剂可以降低料浆的粘度,控制适当的雾化压力,选用合适的喷雾直径与涡旋片组合可以获得理想的粉体。     

喷镀热解制备SnO2：F透明导电热反射膜

SnCl_4·5H_2O和SnF_2的水溶液经超声振荡雾化后喷射到高温平板玻璃衬底上热解形成掺氟二氧化锡(记作SnO_2∶F)透明导电热反射膜。喷镀时的衬底温度对膜的微观结构起决定作用。衬底温度300℃时形成非晶膜,高于400℃时形成多晶膜且结晶度随衬底温度升高而提高。结晶度高的多晶膜导电率达10~3Ω~(-1)cm~(-1),镀有多晶膜的玻璃对可见光(0.3～0.8μm)的透过率比未镀膜的玻璃仅减少10％左右,而红外(2～10μm)反射率比未镀膜的玻璃提高近4倍。膜的这种电学和光学特性与结晶程度有明显的对应性。     

一种新的基于水蒸气和水混合流体去胶方法

随着半导体器件尺寸越来越小,光刻胶的剥离,尤其是对硬烘后和离子注入后的光刻胶剥离,被认为是现代半导体器件制造过程中最具挑战的工艺之一。本文提出了一种新的湿法去胶技术从而可以替代现有的湿法剥离工艺和等离子灰化工艺。并针对固化后的光刻胶以及金膜和铬膜,进行了相关实验。然后给出了光刻胶的剥离图片,并分析和讨论了该过程的机理。结果表明,利用水蒸气和水的混合流体射流清洗技术可以很容易去除固化后的光刻胶和金属膜。