Estimation of power density in IMPATT using different materials

ABSTRACT

The RF output power dissipated per unit area is calculated using Runge-Kutta method for the high-moderate-moderate-high (n⁺-n-p-p⁺) doping profile of double drift region (DDR)-based impact avalanche transit time (IMPATT) diode by taking different substrate at Ka band. Those substrates are silicon, gallium arsenide, germanium, wurtzite gallium nitride, indium phosphide and 4H-silicon carbide. A comparative study regarding power dissipation ability by the IMPATT using different material is being presented thereby modelling the DDR IMPATT diode in a one-dimensional structure. The IMPATT based on 4H-SiC element has highest power density in the order of 10¹⁰ Wm^?2 and the Si-based counterpart has lowest power density of order 10⁶ Wm^?2 throughout the Ka band. So, 4H-SiC-based IMPATT should be preferable over others for the power density preference based application. This result will be helpful to estimate the power density of the IMPATT for any doping profile and to select the proper element for the optimum design of the IMPATT as far as power density is concerned in the Ka band. Also, we have focused on variation of power density with different junction temperatures and modelled the heat sink with analysis of thermal resistances.     

基于投影寻踪的径向基函数网络在参考腾发量预测中的应用

径向基函数网络(RBFN)已广泛应用于参考腾发量预测等领域，但常用的K均值聚类和自组织特征映射等方法在求取径向基函数网络隐层节点中心时存在较大不足。针对这一问题，本文引入投影寻踪方法，在投影降维的基础上实现对大量高维数据的聚类，建立了基于投影寻踪的径向基函数网络模型，并将该模型应用于山西潇河灌区参考腾发量的预测，研究了不同气象因子输入对参考腾发量预测精度的影响。结果表明，基于投影寻踪的径向基函数网络具有较强的适用性，只需使用最高温度、最低温度、日照时数和旬序数作为输入因子，就能以较高的精度预测参考腾发量。     

大气状态下AFM阳极氧化加工Si的研究

Si纳米氧化线是构筑基于Si的纳米器件的基础。通过AFM针尖诱导阳极氧化加工的n型Si(100)的实验得到凸出的n型Si(100)氧化物高度和偏置电压成线性关系,与针尖扫描速度成负对数关系,并在前人的基础上深化了AFM针尖诱导氧化加工的机理和理论模型,得到了合适的加工条件为偏压8 V和扫描速度1μm/s。     

智能化中高压变频器实载试验平台的实现

中、高压变频器产量越来越多，但试验手段大多比较落后，一般采用带电机空转的方法。本文介绍了一个高压变频器试验平台，通过该平台可以对电压等级在3kV～10kV、功率在5000kW以下的变频器进行实载试验。     

数字电路中电源电压瞬间下降的成因及改进

通过分析数字集成芯片多输出中电源电压瞬间下降的原因,对常规驱动电路结构进行改进。改进后单输出电路的峰值电流降为原来的2/3,再通过优化版图的电源布线,能有效防止电源电压下降,使芯片正常稳定地工作。     

超级电容在手机电源中的应用

超级电容又称法拉电容,是指其容量为法拉级的电容。文章介绍了应用超级电容作为手机电池的总体思路并重点介绍了其充电电路、升压电路和控制电路的设计。该电池具有充电快、寿命长、免维护并且环保等特点。     

Improving narrow bandgap a-SiGe:H alloys grown by hot-wire chemical vapor deposition

We have improved the electronic properties of narrow-bandgap (Tauc gap below 1.5 eV) amorphous-silicon germanium alloys (a-SiGe:H) grown by hot-wire chemical vapor deposition (HWCVD) by lowering the substrate temperature and deposition rate. Prior to this work, we were unable to grow a-SiGe:H alloys with bandgaps below 1.5 eV that had photo-to-dark conductivity ratios comparable with our plasma-enhanced CVD (PECVD) grown materials [B.P. Nelson et al., Mater. Res. Soc. Symp. 507 (1998) 447]. Decreasing the filament diameter from our standard configuration of 0.5 mm to 0.38 or 0.25 mm provides first big improvements in the photoresponse of these alloys. Lowering the substrate temperature from our previous optimal temperatures (T_sub starting at 435 °C) to at 250 °C provides additional photo-to-dark conductivity ratio increasing by two orders of magnitude for growth conditions containing 20–30% GeH₄ in the gas phase (relative to the total GeH₄+SiH₄ flow).     

超高压大容量铝电解电容器的研制

分析了大功率设备用超高压大容量铝电解电容器的特点,通过研制工作电解液、制订制作工艺及零部件设计方案,研制出的超高压大容量铝电解电容器具有损耗角正切小(tgδ为0.25)、承受纹波电流能力强(100 Hz,2.12～27.8 A)及寿命长的特点,耐久性达到85℃,5 000 h。     

自对准双扩散MOS器件的阈值电压分析

文章提出了精确描述自对准双扩散MOS器件阀值电压的解析模型，给出了其沟道中杂质的二维分布和源结耗尽层宽度的计算方法；分析了边缘效应对氧化层电容的影响，借助电荷共事模型，建立了反映非均匀沟道中耗尽层电荷变化及其对开启电压影响的阀值电压模型；同时，借助二维仿真器，计算出自对准双扩散MOS器件的阈值电压，其值与解析值相吻合。     

The Person Reference Process in Spontaneous Trait Inferences.

Five studies examined whether spontaneous trait inferences uniquely reference the person who performed a trait-implying behavior. On each study trial in 5 studies, participants saw 2 faces and a behavioral sentence referring to one of them. Later, participants saw face-trait pairs and indicated whether they had seen the trait word in the sentence presented with the face. Participants falsely recognized implied traits more when these traits were paired with actors' faces than with control faces. This effect was replicated for a large set effaces (120), after a week delay between study and recognition test, when equal attention was paid to each face, and when the orientation of the face at recognition was different from the orientation at encoding. (PsycINFO Database Record (c) 2010 APA, all rights reserved)